Abstract: A photoresist baking apparatus is provided. The photoresist baking apparatus comprises a baking chamber including an inlet, an outlet and a cover sealed connected thereon. The cover is applied to guide the hot air entering the baking chamber and includes a heating device for maintaining the temperature of the hot air. The heating device is disposed on the cover for heating the hot air flowing to the cover and maintaining the temperature of the hot air to be consistent when the hot air flowing to the outlet, thereby to prevent from the photoresist volatile condensing and dripping due to decreased temperature after the photoresist volatile contacting the cover and affecting the product quality, and to guarantee the temperature homogeneity inside the baking chamber.

Abstract: The present disclosure discloses a TFT array substrate, wherein the TFT array substrate is arranged with at least a base substrate, a thin film transistor layer, and a passivation layer and a pixel electrode layer on the thin film transistor layer; at least a via hole is formed on the passivation layer, supporters are arranged in the via hole, and the supporters have a same horizontal surface for supporting a lower surface of a CF substrate assembled with the TFT array substrate. The disclosure also discloses a corresponding manufacturing method and a liquid crystal display panel. The embodiment of the present disclosure can reduce the height difference of the via holes in the surface of the TFT array substrate, improve the thickness uniformity and flatness of the alignment film, so as to improve the display effect of the liquid crystal display panel.

Abstract: A photoresist baking apparatus is provided. The photoresist baking apparatus comprises a baking chamber including an inlet, an outlet and a cover sealed connected thereon. The cover is applied to guide the hot air entering the baking chamber and includes a heating device for maintaining the temperature of the hot air. The heating device is disposed on the cover for heating the hot air flowing to the cover and maintaining the temperature of the hot air to be consistent when the hot air flowing to the outlet, thereby to prevent from the photoresist volatile condensing and dripping due to decreased temperature after the photoresist volatile contacting the cover and affecting the product quality, and to guarantee the temperature homogeneity inside the baking chamber.

Abstract: A lift device and a lift system are provided, which comprises: a carrying mechanism including a guiding hole; a lift pin passing through inside the guiding hole; a carrying base, which is connected to the lift pin, wherein when the carrying base is moved upward, the lift pin is moved upward and inside the guiding hole; and a magnetic control device, which is used to send a magnetic control signal, so as to move the lift pin downward. By the lift pin being moved downward and magnetically sucked, a bad process problem and a break risk can be avoided.

Abstract: A lift device and a lift system are provided, which comprises: a carrying mechanism including a guiding hole; a lift pin passing through inside the guiding hole; a carrying base, which is connected to the lift pin, wherein when the carrying base is moved upward, the lift pin is moved upward and inside the guiding hole; and a magnetic control device, which is used to send a magnetic control signal, so as to move the lift pin downward. By the lift pin being moved downward and magnetically sucked, a bad process problem and a break risk can be avoided.

Abstract: The present invention provides a dual-arm type robotic arm and its method of transporting panels, and mainly has a first robotic arm and a second robotic arm which simultaneously extend into a processing equipment. When the second robotic arm takes out a second panel from the processing equipment, the first robotic arm simultaneously executes a stabilization operation and executes a fastening-suction release operation of a carried first panel. Then, the first robotic arm is lowered for placing the first panel in the processing equipment. Thus, the present invention can prevent from occurring a breakage risk of the first panel during being placed, and save the operation time during the first robotic arm waits to be stable and then release the fastening-suction.