Patents by Inventor Yanping LAN

Yanping LAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240112027
    Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for performing neural architecture search for machine learning models. In one aspect, a method comprises receiving training data for a machine learning, generating a plurality of candidate neural networks for performing the machine learning task, wherein each candidate neural network comprises a plurality of instances of a layer block composed of a plurality of layers, for each candidate neural network, selecting a respective type for each of the plurality of layers from a set of layer types that comprises, training the candidate neural network and evaluating performance scores for the trained candidate neural networks as applied to the machine learning task, and determining a final neural network for performing the machine learning task based at least on the performance scores for the candidate neural networks.
    Type: Application
    Filed: September 28, 2023
    Publication date: April 4, 2024
    Inventors: Yanqi Zhou, Yanping Huang, Yifeng Lu, Andrew M. Dai, Siamak Shakeri, Zhifeng Chen, James Laudon, Quoc V. Le, Da Huang, Nan Du, David Richard So, Daiyi Peng, Yingwei Cui, Jeffrey Adgate Dean, Chang Lan
  • Publication number: 20190015929
    Abstract: A laser annealing device and methods for annealing using the device are disclosed. The laser annealing device includes: a laser light source system (3); a laser adjusting system (4) that is connected to the laser light source system and is disposed above a wafer (1); a temperature monitoring system (5) that is disposed above the wafer (1) and configured to measure in real time a temperature at a location of the surface of the wafer at which a light spot is formed; and a central control system (6) in connection with each of the laser light source system, the laser adjusting system, the temperature monitoring system and a wafer table (2). The wafer is jointly annealed by laser beams from several independent lasers (31) in the laser light source system, which have different wavelengths and cooperate in a mutually complementary manner, with a selected optimum set of process parameters. As a result, an optimum annealing temperature can be achieved and surface pattern effects can be effectively reduced.
    Type: Application
    Filed: December 28, 2016
    Publication date: January 17, 2019
    Inventors: Guodong CUI, Yanping LAN, Mingying MA, Chunfeng SONG, Gang SUN