Patents by Inventor Yanxia CUI

Yanxia CUI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11871648
    Abstract: This application relates to preparation of organic photomultiplication photodetectors, and more particularly to an organic photomultiplication photodetector with bi-directional bias response and a method for producing the same. The photodetector includes an anode layer, an anode modification layer, an interfacial modification layer, an active layer and a cathode layer arranged in sequence. The interfacial modification layer is made of Al2O3. The anode layer is made of indium tin oxide (ITO). The anode modification layer is made of poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)(PEDOT:PSS). The active layer is made of poly(3-hexylthiophene-2,5-diyl):[6,6]-phenyl-C70-butyric acid methyl ester (P3HT:PC70BM). The cathode layer is made of aluminum, silver or gold.
    Type: Grant
    Filed: December 6, 2021
    Date of Patent: January 9, 2024
    Assignee: Taiyuan University of Technology
    Inventors: Linlin Shi, Yanxia Cui, Guohui Li, Ye Zhang, Wenyan Wang, Ting Ji
  • Publication number: 20230317770
    Abstract: Disclosed is a high-resistance resistor based on silicon carbide. The resistor includes a semi-insulating 4H-SiC silicon carbide substrate, a silicon surface and a carbon surface of the silicon carbide substrate are provided with symmetrical atomic-thickness aluminum oxide insulating layers, thicknesses of the aluminum oxide insulating layers are 0.2 nm-2 nm, conductive metal electrodes are formed at two sides of the aluminum oxide insulating layers through evaporation, and thicknesses of the metal electrodes are 100 nm-500 nm. The present disclosure uses a high-resistance resistor based on silicon carbide that has the above structure, makes an ohmic contact electrode on a semi-insulating silicon carbide substrate, thus obtaining a resistor with a resistance of 100 T? or more, and satisfying requirements of the precision measurement industry.
    Type: Application
    Filed: August 11, 2022
    Publication date: October 5, 2023
    Applicants: Taiyuan University of Technology, Institute of New Materials and Chemical Engineering, Zhejiang University, Shanxi
    Inventors: Yuying XI, Yanxia CUI, Kun HU, Yuan TIAN, Guohui LI, Bingshe XU
  • Patent number: 11710801
    Abstract: The present application relates to semiconductor photodetectors, in particular to a silicon carbide-based UV-visible-NIR full-spectrum-responsive photodetector and a method for fabricating the same. The photodetector includes a silicon carbide substrate, and metal counter electrodes and a surface plasmon polariton nanostructure arranged thereon. The silicon carbide substrate and the metal counter electrodes constitute a metal-semiconductor-metal photodetector with coplanar electrodes. When the ultraviolet light is input, free carriers directly generated in silicon carbide are collected by an external circuit to generate electrical signals. When the visible light is input, hot carriers generated in the surface plasmon polariton nanostructure tunnel into the silicon carbide semiconductor to become free carriers to generate electrical signals.
    Type: Grant
    Filed: October 29, 2021
    Date of Patent: July 25, 2023
    Assignee: Taiyuan University of Technology
    Inventors: Yanxia Cui, Yaping Fan, Xianyong Yan, Guohui Li, Yuan Tian
  • Publication number: 20220093866
    Abstract: This application relates to preparation of organic photomultiplication photodetectors, and more particularly to an organic photomultiplication photodetector with bi-directional bias response and a method for producing the same. The photodetector includes an anode layer, an anode modification layer, an interfacial modification layer, an active layer and a cathode layer arranged in sequence. The interfacial modification layer is made of Al2O3. The anode layer is made of indium tin oxide (ITO). The anode modification layer is made of poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate)(PEDOTP SS). The active layer is made of poly(3-hexylthiophene-2,5-diyl):[6,6]-phenyl-C70-butyric acid methyl ester (P3HT:PC70BM). The cathode layer is made of aluminum, silver or gold.
    Type: Application
    Filed: December 6, 2021
    Publication date: March 24, 2022
    Inventors: Linlin SHI, Yanxia CUI, Guohui LI, Ye ZHANG, Wenyan WANG, Ting JI
  • Publication number: 20220052218
    Abstract: The present application relates to semiconductor photodetectors, in particular to a silicon carbide-based UV-visible-NIR full-spectrum-responsive photodetector and a method for fabricating the same. The photodetector includes a silicon carbide substrate, and metal counter electrodes and a surface plasmon polariton nanostructure arranged thereon. The silicon carbide substrate and the metal counter electrodes constitute a metal-semiconductor-metal photodetector with coplanar electrodes. When the ultraviolet light is input, free carriers directly generated in silicon carbide are collected by an external circuit to generate electrical signals. When the visible light is input, hot carriers generated in the surface plasmon polariton nanostructure tunnel into the silicon carbide semiconductor to become free carriers to generate electrical signals.
    Type: Application
    Filed: October 29, 2021
    Publication date: February 17, 2022
    Inventors: Yanxia CUI, Yaping FAN, Xianyong YAN, Guohui LI, Yuan TIAN