Abstract: An integrated circuit package module includes an integrated circuit package device including a contact element, and a bonding system formed on the integrated circuit package device. The bonding system includes a bonding system substrate and a bonding element formed in the bonding system substrate and conductively coupled to the contact element of the integrated circuit package device. The bonding element includes (a) a conduction component conductively connected to the contact element, the conduction component formed from a first metal having a first melting point, and (b) a bonding component formed from a second metal having a second melting point lower than the first melting point of the first metal.

Abstract: Ferroelectric random access memory (FRAM) capacitors and methods of forming FRAM capacitors are provided. An FRAM capacitor may be formed between adjacent metal interconnect layers or between a silicided active layer (e.g., including MOSFET devices) and a first metal interconnect layer. The FRAM capacitor may be formed by a damascene process including forming a tub opening in a dielectric region, forming a cup-shaped bottom electrode, forming a cup-shaped ferroelectric element in an interior opening defined by the cup-shaped bottom electrode, and forming a top electrode in an interior opening defined by the cup-shaped ferroelectric element. The FRAM capacitor may form a component of an FRAM memory cell. For example, an FRAM memory cell may include one FRAM capacitor and one transistor (1T1C configuration) or two FRAM capacitors and two transistor (2T2C configuration).

Abstract: A method of forming a partially silicided element is provided. A silicided structure including a silicide layer on a base structure is formed. A dielectric region is formed over the silicided structure. The dielectric region is etched to form a contact opening exposing a first area of the silicide layer and a tub opening exposing a second area of the silicide layer. A conformal metal is deposited to (a) fill the contact opening to define a contact and (b) form a cup-shaped metal structure in the tub opening. Another etch is performed to remove the cup-shaped metal structure in the tub opening, to remove the underlying silicide layer second area and to expose an underlying area of the base structure, wherein the silicide layer first area remains intact. The base structure with the intact silicide layer first area and removed silicide layer second area defines the partially silicided element.

Abstract: An integrated resistor includes a resistor tub, a resistive element, and a dielectric liner. The resistor tub is formed from a conformal metal, and includes a laterally-extending tub base and vertically-extending tub sidewalls extending upwardly from the laterally-extending tub base, wherein the laterally-extending tub base and vertically-extending tub sidewalls define in a resistor tub interior opening. The dielectric liner is formed in the resistor tub interior opening. The resistive element is formed over the dielectric liner in the resistor tub interior opening, and includes a pair of resistor heads connected by a laterally-extending resistor body. The dielectric liner electrically insulates the resistive element from the resistor tub.

Abstract: A multi-capacitor module includes a stacked metal-insulator-metal (MIM) structure including a cup-shaped first electrode, a cup-shaped first insulator formed over the cup-shaped first electrode, a cup-shaped second electrode formed over the cup-shaped first insulator, a cup-shaped second insulator formed over the cup-shaped second electrode, a third electrode formed over the cup-shaped second insulator. The stacked MIM structure also includes a first sidewall spacer located between the cup-shaped first electrode and the cup-shaped second electrode, and a second sidewall spacer located between the cup-shaped second electrode and the third electrode. The cup-shaped first electrode, the cup-shaped second electrode, and the cup-shaped first insulator define a first capacitor, and the cup-shaped second electrode, the third electrode, and the cup-shaped second insulator define a second capacitor.

Abstract: A multi-capacitor module includes a nested metal-insulator-metal (MIM) structure including a cup-shaped first electrode, a cup-shaped first insulator formed over the cup-shaped first electrode, a cup-shaped second electrode formed over the cup-shaped first insulator, a cup-shaped second insulator formed over the cup-shaped second electrode, and a third electrode formed over the cup-shaped second insulator. The cup-shaped first electrode, the cup-shaped second electrode, and the cup-shaped first insulator define a first capacitor, and the cup-shaped second electrode, the third electrode, and the cup-shaped second insulator define a second capacitor physically nested in the first capacitor.

Abstract: A metal-insulator-metal (MIM) capacitor includes a bottom electrode, an insulator cup formed on the bottom electrode, a top electrode formed in an opening defined by the insulator cup, a top electrode connection element electrically connected to the top electrode, a vertically-extending bottom electrode contact electrically connected to the bottom electrode, and a bottom electrode connection element electrically connected to the vertically-extending bottom electrode contact. The bottom electrode is formed in a lower metal layer. The insulator cup is formed in a tub opening in a dielectric region and includes a laterally extending insulator cup base formed on the bottom electrode and a vertically-extending insulator cup sidewall extending upwardly from the laterally extending insulator cup base. The top electrode connection element and bottom electrode connection element are formed in an upper metal layer.

Abstract: A system includes a metal tub structure formed in an integrated circuit (IC) structure, a first metal component, and a second metal component. The first metal component is formed from a first metal. The first metal component is formed in an opening defined by the metal tub structure, and includes a first metal first junction element, a first metal second junction element, and a first metal bridge electrically connected to the first metal first junction element and the first metal second junction element. The second metal component is formed from a second metal different than the first metal, and includes a second metal first junction element electrically connected to the first metal first junction element to define a first thermocouple junction, and a second metal second junction element electrically connected to the first metal second junction element to define a second thermocouple junction.

Abstract: A thin film resistor (TFR) module may be formed in copper interconnect in an integrated circuit device. A pair of displacement-plated TFR heads may be formed by forming a pair of copper TFR head elements (e.g., damascene trench elements) spaced apart from each other in a dielectric region, and displacement plating a barrier region on each TFR head element to form a displacement-plated TFR head. A TFR element may be formed on the pair of displacement-plated TFR heads to define a conductive path between the pair of TFR head elements through the TFR element and through the displacement-plated barrier region on each metal TFR head. Conductive contacts may be formed connected to the pair of displacement-plated TFR heads. The displacement-plated barrier regions may protect the copper TFR heads from copper corrosion and/or diffusion, and may comprise CoWP, CoWB, Pd, CoP, Ni, Co, Ni—Co alloy, or other suitable material.

Abstract: A thin-film resistor (TFR) module is formed in an integrated circuit device. The TFR module includes a pair of metal TFR heads (e.g., copper damascene trench structures), a TFR element formed directly on the metal TFR heads to define a conductive path between the pair of TFR heads through the TFR element, and TFR contacts connected to the TFR heads. The TFR heads may be formed in a metal interconnect layer, along with various interconnect elements of the integrated circuit device. The TFR element may be formed by depositing and patterning a TFR element/diffusion barrier layer over the TFR heads and interconnect elements formed in the metal interconnect layer. The TFR element may be formed from a material that also provides a barrier against metal diffusion (e.g., copper diffusion) from each metal TFR head and interconnect element. For example, the TFR element may be formed from tantalum nitride (TaN).

Abstract: A thin film resistor (TFR) module includes a metal cup structure, a dielectric liner region, a TFR element, and a pair of TFR heads electrically connected to the TFR element. The metal cup structure includes a laterally-extending metal cup base and multiple metal cup sidewalls extending upwardly from the laterally-extending metal cup base. The dielectric liner region is formed in an opening defined by the metal cup structure. The TFR element is formed in an opening defined by the dielectric liner region, wherein the TFR element is insulated from the metal cup structure by the dielectric liner region.

Abstract: An array of metal-oxide-metal (MOM) capacitors formed in an integrated circuit (IC) structure may be used for evaluating misalignments between patterned layers of the IC structure. The array of MOM capacitors may be formed in a selected set of patterned layers, e.g., a via layer formed between a pair of metal interconnect layers. The MOM capacitors may be programmed with different patterned layer alignments (e.g., built in to photomasks or reticles used to form the patterned layers) to define an array of different alignments. When the MOM capacitors are formed on the wafer, the actual patterned layer alignments capacitors may differ from the programmed layer alignments due a process-related misalignment. The MOM capacitors may be subjected to electrical testing to identify this process-related misalignment, which may be used for initiating a correcting action, e.g., adjusting a manufacturing process or discarding misaligned IC structures or devices.

Abstract: A system-on-chip may include an inductor-capacitor oscillator monolithically integrated into the system-on-chip The inductor-capacitor oscillator may be configured to improve frequency stability and reduce noise when compared to a resistor-capacitor oscillator. Methods of making integrated oscillators may involve forming an inductor at least partially while forming a BEOL structure on a substrate. A capacitor supported on and/or embedded within the semiconductor material of the substrate may be formed before or while forming the BEOL structure. The inductor may be connected to the capacitor in parallel at least partially utilizing the BEOL structure to form an integrated inductor-capacitor oscillator.

Abstract: Ferroelectric random access memory (FRAM) capacitors and methods of forming FRAM capacitors are provided. An FRAM capacitor may be formed between adjacent metal interconnect layers or between a silicided active layer (e.g., including MOSFET devices) and a first metal interconnect layer. The FRAM capacitor may be formed by a damascene process including forming a tub opening in a dielectric region, forming a cup-shaped bottom electrode, forming a cup-shaped ferroelectric element in an interior opening defined by the cup-shaped bottom electrode, and forming a top electrode in an interior opening defined by the cup-shaped ferroelectric element. The FRAM capacitor may form a component of an FRAM memory cell. For example, an FRAM memory cell may include one FRAM capacitor and one transistor (1T1C configuration) or two FRAM capacitors and two transistor (2T2C configuration).

Abstract: A method of forming a metal-insulator-metal (MIM) capacitor with copper top and bottom plates may begin with a copper interconnect layer (e.g., Cu MTOP) including a copper structure defining the capacitor bottom plate. A passivation region is formed over the bottom plate, and a wide top plate opening is etched in the passivation region, to expose the bottom plate. A dielectric layer is deposited into the top plate opening and onto the exposed bottom plate. Narrow via opening(s) are then etched in the passivation region. The wide top plate opening and narrow via opening(s) are concurrently filled with copper to define a copper top plate and copper via(s) in contact with the bottom plate. A first aluminum bond pad is formed on the copper top plate, and a second aluminum bond pad is formed in contact with the copper via(s) to provide a conductive coupling to the bottom plate.

Abstract: A metal-insulator-metal (MIM) capacitor module is provided. The MIM capacitor module includes a bottom electrode base formed in a lower metal layer, a bottom electrode conductively coupled to the bottom electrode base, a planar insulator formed over the bottom electrode, and a top electrode formed in an upper metal layer over the insulator. The bottom electrode includes a cup-shaped bottom electrode component and a bottom electrode fill component formed in an interior opening defined by the cup-shaped bottom electrode component.

Abstract: A metal-insulator-metal (MIM) capacitor includes a bottom electrode cup, an insulator cup, and a top electrode. The bottom electrode cup includes a laterally-extending bottom electrode cup base, and a bottom electrode cup sidewall extending upwardly from the laterally-extending bottom electrode cup base. The insulator cup is formed in an opening defined by the bottom electrode cup, and includes a laterally-extending insulator cup base formed over the laterally-extending bottom electrode cup base, and an insulator cup sidewall extending upwardly from the laterally-extending insulator cup base. A dielectric sidewall spacer is located between the insulator cup sidewall and the bottom electrode cup sidewall. The top electrode is formed in an opening defined by the insulator cup.

Abstract: A low-resistance thick-wire integrated inductor may be formed in an integrated circuit (IC) device. The integrated inductor may include an elongated inductor wire defined by a metal layer stack including an upper metal layer, middle metal layer, and lower metal layer. The lower metal layer may be formed in a top copper interconnect layer, the upper metal layer may be formed in an aluminum bond pad layer, and the middle metal layer may comprise a copper tub region formed between the aluminum upper layer and copper lower layer. The wide copper region defining the middle layer of the metal layer stack may be formed concurrently with copper vias of interconnect structures in the IC device, e.g., by filling respective openings using copper electrochemical plating or other bottom-up fill process. The elongated inductor wire may be shaped in a spiral or other symmetrical or non-symmetrical shape.

Abstract: A metal-insulator-metal (MIM) capacitor module includes an outer electrode, an insulator, an inner electrode, an outer electrode extension structure, an inner electrode contact element, and an outer electrode contact element. The outer electrode includes a plurality of vertically-extending outer electrode sidewalls. The insulator is formed in an opening defined by the vertically-extending outer electrode sidewalls, and includes a plurality of vertically-extending insulator sidewalls. The inner electrode formed in an interior opening defined by the insulator. The outer electrode extension structure extends laterally from a particular vertically-extending outer electrode sidewall. The inner electrode contact element and outer electrode contact element are formed in a metal layer. The inner electrode contact element is electrically connected to the inner electrode, and the outer electrode contact element is electrically connected to the outer electrode extension structure.

Abstract: An array of metal-oxide-metal (MOM) capacitors formed in an integrated circuit (IC) structure may be used for evaluating misalignments between patterned layers of the IC structure. The array of MOM capacitors may be formed in a selected set of patterned layers, e.g., a via layer formed between a pair of metal interconnect layers. The MOM capacitors may be programmed with different patterned layer alignments (e.g., built in to photomasks or reticles used to form the patterned layers) to define an array of different alignments. When the MOM capacitors are formed on the wafer, the actual patterned layer alignments capacitors may differ from the programmed layer alignments due a process-related misalignment. The MOM capacitors may be subjected to electrical testing to identify this process-related misalignment, which may be used for initiating a correcting action, e.g., adjusting a manufacturing process or discarding misaligned IC structures or devices.