Patents by Inventor Yasufumi Tsubakihara

Yasufumi Tsubakihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for producing sputtering target
    Patent number: 6074279
    Abstract: The surface to be sputtered of a sputtering target is blasted with a blasting material in the form of a finely divided powder having particle diameters falling within the range of 10 to 500 .mu.m to remove impurities staining the surface to be sputtered. This blasting treatment is suitable especially for a sputtering surface having a raised portion thereon. Preferably the blasting treatment is effected in two stages: in the first stage, a blasting material powder with particle diameters of 50 to 500 .mu.m is used and, in the second stage, a blasting material powder with particle diameters of 10 to 110 .mu.m is used. The blast-treated surface has a uniform, isotropic and reduced surface roughness.
    Type: Grant
    Filed: February 27, 1998
    Date of Patent: June 13, 2000
    Assignee: Tosoh Corporation
    Inventors: Ryoji Yoshimura, Yasufumi Tsubakihara, Kentaro Utsumi