Patents by Inventor Yasuhiko Asano

Yasuhiko Asano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10675754
    Abstract: A robot system includes a first robot and a second robot, and the second robot has a base, a shaft provided translationally along an axis direction of a first axis on the base, and an arm provided rotatably with respect to the shaft, and the first robot can perform work on a work object that can be carried by the second robot.
    Type: Grant
    Filed: February 2, 2018
    Date of Patent: June 9, 2020
    Assignee: Seiko Epson Corporation
    Inventors: Ichiro Aoyama, Yasuhiko Asano, Makoto Ishida, Shintaro Dobashi, Hiroyuki Miyano, Toru Igarashi
  • Publication number: 20180222041
    Abstract: A robot system includes a first robot and a second robot, and the second robot has a base, a shaft provided translationally along an axis direction of a first axis on the base, and an arm provided rotatably with respect to the shaft, and the first robot can perform work on a work object that can be carried by the second robot.
    Type: Application
    Filed: February 2, 2018
    Publication date: August 9, 2018
    Inventors: Ichiro AOYAMA, Yasuhiko ASANO, Makoto ISHIDA, Shintaro DOBASHI, Hiroyuki MIYANO, Toru IGARASHI
  • Patent number: 8297744
    Abstract: Provided herein is a functional liquid supply apparatus having: a plurality of sub tanks, a tank unit which replenishes the functional liquid to the plurality of sub tanks, an upstream side functional liquid channel of which an upstream side thereof is connected to the tank unit and a downstream side thereof is connected to each of the sub tanks, and a plurality of third opening and closing valves which replenish the functional liquid to each of the sub tanks by its' opening and closing operations. The tank unit 122 has a pair of main tanks, nitrogen gas supply units connected to the pair of the main tanks respectively, and a switching device which is capable of switching a pressurized liquid of the functional liquid fed from the pair of the main tanks alternatively.
    Type: Grant
    Filed: March 20, 2008
    Date of Patent: October 30, 2012
    Assignee: Seiko Epson Corporation
    Inventors: Takayuki Hayashi, Yasuhiko Asano
  • Publication number: 20080239029
    Abstract: Provided herein is a functional liquid supply apparatus having: a plurality of sub tanks, a tank unit which replenishes the functional liquid to the plurality of sub tanks, an upstream side functional liquid channel of which an upstream side thereof is connected to the tank unit and a downstream side thereof is connected to each of the sub tanks, and a plurality of third opening and closing valves which replenish the functional liquid to each of the sub tanks by its' opening and closing operations. The tank unit 122 has a pair of main tanks, nitrogen gas supply units connected to the pair of the main tanks respectively, and a switching device which is capable of switching a pressurized liquid of the functional liquid fed from the pair of the main tanks alternatively.
    Type: Application
    Filed: March 20, 2008
    Publication date: October 2, 2008
    Inventors: Takayuki Hayashi, Yasuhiko Asano
  • Patent number: 6158648
    Abstract: High frequency electrical discharge or nonpolar discharge using microwaves is generated in a gas that is introduced into a gas duct formed by a dielectric material, such as glass or ceramic. Surface treatment is applied to the components, which are under atmospheric pressure, by exposing them to the gas flow containing the active species generated by the above mentioned electrical discharge. Components are soldered before, during, or after the application of this surface treatment. The surface of the components is exposed to the active species by either directly exposing the components to the electrical discharge, or by blasting the reactive gas flow containing the active species at them. By selecting an appropriate gas for generating the active species, it is possible to improve the wettability of the surface of the component to be soldered, or to remove the organic substances or the oxide film.
    Type: Grant
    Filed: March 11, 1998
    Date of Patent: December 12, 2000
    Assignee: Seiko Epson Corporation
    Inventors: Yoshiaki Mori, Takuya Miyakawa, Yasuhiko Asano, Osamu Kurashina, Satoshi Miyamori, Yohei Kurashima, Makoto Anan
  • Patent number: 6086710
    Abstract: In a surface treatment apparatus (30) of the face type, a porous dielectric (37) is supported by the outer periphery portion of the supporting member (45) under the bottom surface of a porous electrode (32). The dielectric can be supported by the supporting member to permit the thermal expansion deformation of the dielectric by forming an upward inclined-face (47) and a downward inclined-face (43) on the supporting member (45) and the dielectric (37), respectively. Further, a discharge gas can be supplied uniformly to a discharge region (51) through the electrode (32) and the dielectric (37), both of which are porous. Many gas exhaust ports (41), by which the flow rate of the gas can be regulated, are provided around the discharge region (51). Thus, the gas is uniformly exhausted around the discharge region (51).
    Type: Grant
    Filed: December 6, 1996
    Date of Patent: July 11, 2000
    Assignee: Seiko Epson Corporation
    Inventors: Takeshi Miyashita, Takuya Miyakawa, Yasutugu Aoki, Isao Kubota, Osamu Kurashina, Yasuhiko Asano, Yoshio Oda, Yoshiaki Mori
  • Patent number: 5735451
    Abstract: High frequency electrical discharge or nonpolar discharge using microwaves is generated in a gas that is introduced into a gas duct formed by a dielectric material, such as glass or ceramic. Surface treatment is applied to components, which are under atmospheric pressure, by exposing them to the gas flow containing the active species generated by the above mentioned electrical discharge. The components are soldered before, during, or after the application of this surface treatment. The surface of the components is exposed to the active species by either directly exposing the components to the electrical discharge, or by directing the reactive gas flow containing the active species at the component surfaces. By selecting an appropriate gas for generating the active species, it is possible to improve the wettability of the surface of the component to be soldered, or to remove organic substances or oxide film surfaces.
    Type: Grant
    Filed: February 10, 1995
    Date of Patent: April 7, 1998
    Assignee: Seiko Epson Corporation
    Inventors: Yoshiaki Mori, Takuya Miyakawa, Yasuhiko Asano, Osamu Kurashina, Satoshi Miyamori, Yohei Kurashima, Makoto Anan