Abstract: A substrate processing system is provided with an ozone generator capable of generating an ozone-containing gas by discharging electricity in an oxygen-containing gas, and a plurality of processing chambers each capable of holding substrates therein to process the substrates by the ozone-containing gas supplied thereto. A flow regulator control an oxygen-containing gas supplied to the ozone generator. A controller controls the flow regulator to control the flow rate of the ozone-containing gas to be supplied to the processing chamber or chambers from the ozone generator through the control of the flow rate of the oxygen-containing gas supplied to the ozone generator.

Abstract: A substrate processing system is provided with an ozone generator capable of generating an ozone-containing gas by discharging electricity in an oxygen-containing gas, and a plurality of processing chambers each capable of holding substrates therein to process the substrates by the ozone-containing gas supplied thereto. A flow regulator control an oxygen-containing gas supplied to the ozone generator. A controller controls the flow regulator to control the flow rate of the ozone-containing gas to be supplied to the processing chamber or chambers from the ozone generator through the control of the flow rate of the oxygen-containing gas supplied to the ozone generator.

Abstract: A substrate processing system is provided with an ozone generator capable of generating an ozone-containing gas by discharging electricity in an oxygen-containing gas, and a plurality of processing chambers each capable of holding substrates therein to process the substrates by the ozone-containing gas supplied thereto. A flow regulator control an oxygen-containing gas supplied to the ozone generator. A controller controls the flow regulator to control the flow rate of the ozone-containing gas to be supplied to the processing chamber or chambers from the ozone generator through the control of the flow rate of the oxygen-containing gas supplied to the ozone generator.

Abstract: A substrate processing apparatus and a substrate processing method are provided wherein particles etc. adhering to a substrate after processing can be reduced.

Abstract: An action mechanism is provided in which the longitudinal direction of a keyboard body having a keyboard portion at its one end, a middle part or the other end thereof is swingably held and, at the same time, a base of a hammer body is pivotally attached to the opposite side or the same direction side of the keyboard portion across the holding point of the keyboard body. A beak-like projecting piece is protrudingly provided in a base end of the hammer body, and at the same time, an engaging stepped portion is formed in an escapement member that is always biased toward the beak-like projecting piece of the hamner body. The pivotally attached portion of the hammer body pivots in accordance with a movement of the keyboard body by a key striking operation of the keyboard portion. At the same time, the beak-like projecting piece of the hammer body and the engaging stepped portion of the escapement member engage with each other so that the hammer body performs a pivotal operation.

Abstract: An action mechanism 601 inside a keyboard musical instrument of the present invention is the jumping-up style, and has a configuration in which a beak-like projecting piece 631 is protrudingly provided in a base end portion of a hammer body 607, an engaging stepped portion 641 is formed in an escapement member 609 that is always biased toward the beak-like projecting piece 631 of the hammer body 607, a pivotally attached portion of the hammer body 607 pivots in the striking direction in accordance with a striking operation, and at the same time, the beak-like projecting piece 631 and the engaging stepped portion 641 engage, and the hammer body 607 performs a striking pivotal operation against a sound source body 605.

Abstract: An action mechanism 1 inside a keyboard musical instrument of the present invention is the jumping-up style, and has a configuration in which a beak-like projecting piece 19 is protrudingly provided in a base end portion of a hammer body 9, an engaging stepped portion 31 is formed in an escapement member 11 that is always biased toward the beak-like projecting piece 19 of the hammer body 9, a pivotally attached portion of the hammer body 9 pivots in the striking direction in accordance with a striking operation, and at the same time, the beak-like projecting piece 19 and the engaging stepped portion 31 engage, and the hammer body 9 performs a striking pivotal operation against a sound source body 7.