Patents by Inventor Yasuhiro Mikawa

Yasuhiro Mikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8431333
    Abstract: A photosensitive composition remover used for removal of an uncured photosensitive composition, which remover includes 1 to 80 percent by mass of at least one type of aromatic hydrocarbon having 9 carbon atoms or more within the molecule. The photosensitive composition remover further includes an aprotic polar solvent and/or another solvent other than aprotic polar solvents. The photosensitive composition remover is effective for removal of an uncured photosensitive composition film deposited at the periphery, edges, or back of a substrate or removal of an uncured photosensitive composition deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate, a semiconductor wafer, or the like.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: April 30, 2013
    Assignee: Showa Denko K.K.
    Inventors: Masato Kaneda, Yasuhiro Mikawa, Koji Shimizu, Kouichi Terao
  • Publication number: 20120094888
    Abstract: A photosensitive composition remover used for removal of an uncured photosensitive composition, which remover includes 1 to 80 percent by mass of at least one type of aromatic hydrocarbon having 9 carbon atoms or more within the molecule. The photosensitive composition remover further includes an aprotic polar solvent and/or another solvent other than aprotic polar solvents. The photosensitive composition remover is effective for removal of an uncured photosensitive composition film deposited at the periphery, edges, or back of a substrate or removal of an uncured photosensitive composition deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate, a semiconductor wafer, or the like.
    Type: Application
    Filed: September 23, 2011
    Publication date: April 19, 2012
    Applicant: SHOWA DENKO K.K.
    Inventors: Masato KANEDA, Yasuhiro MIKAWA, Koji SHIMIZU, Kouichi TERAO
  • Patent number: 8153357
    Abstract: A photosensitive composition remover used for removal of an uncured photosensitive composition, which remover comprises 1 to 80 percent by mass of at least one type of aromatic hydrocarbon having 9 carbon atoms or more within the molecule. The photosensitive composition remover further comprises an aprotic polar solvent and/or another solvent other than aprotic polar solvents. The photosensitive composition remover is effective for removal of an uncured photosensitive composition film deposited at the periphery, edges, or back of a substrate or removal of an uncured photosensitive composition deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate, a semiconductor wafer, or the like. It is preferably used for removal of a photosensitive composition containing a pigment.
    Type: Grant
    Filed: December 14, 2004
    Date of Patent: April 10, 2012
    Assignee: Showa Denko K.K.
    Inventors: Masato Kaneda, Yasuhiro Mikawa, Koji Shimizu, Kouichi Terao
  • Publication number: 20080167210
    Abstract: A removing solution for photosensitive composition for removal of a pigment-containing photosensitive composition, the solution comprising an alkyleneglycol monoalkyl ether and an aromatic hydrocarbon, as well as one or more solvents selected from among alkyleneglycol monoalkyl ether carboxylic acid esters, alkoxycarboxylic acid esters, alicyclic ketones and acetic acid esters. There is provided a photosensitive composition removing solution with excellent photosensitive composition removal performance.
    Type: Application
    Filed: February 9, 2006
    Publication date: July 10, 2008
    Applicant: SHOWA DENKO K.K.
    Inventors: Masato Kaneda, Yasuhiro Mikawa, Kouichi Terao
  • Publication number: 20070161530
    Abstract: A photosensitive composition remover used for removal of an uncured photosensitive composition, which remover comprises 1 to 80 percent by mass of at least one type of aromatic hydrocarbon having 9 carbon atoms or more within the molecule. The photosensitive composition remover further comprises an aprotic polar solvent and/or another solvent other than aprotic polar solvents. The photosensitive composition remover is effective for removal of an uncured photosensitive composition film deposited at the periphery, edges, or back of a substrate or removal of an uncured photosensitive composition deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate, a semiconductor wafer, or the like. It is preferably used for removal of a photosensitive composition containing a pigment in a process for forming a photosensitive composition film on a substrate in the process of production of a liquid crystal or an organic EL display.
    Type: Application
    Filed: December 14, 2004
    Publication date: July 12, 2007
    Inventors: Masato Kaneda, Yasuhiro Mikawa, Koji Shimizu
  • Patent number: 5395895
    Abstract: A thermally reversible crosslinked resin composition comprising a specific ethylenic copolymer, a specific polyhydric alcohol and a specific reaction promoter and a molded article produced by utilizing the resin composition are disclosed. Because the resin composition and the molded article have a high reaction rate of dissociation of the crosslinking during heating and a high reaction rate of formation of the crosslinking during cooling, they can be utilized for various applications, such as melt molding and the like, as the the thermally reversible crosslinked resin composition and the thermally reversible crosslinked molded article which are substantially valuable for commercial application.
    Type: Grant
    Filed: June 17, 1993
    Date of Patent: March 7, 1995
    Assignee: Showa Denko K.K.
    Inventors: Hirotaka Tagoshi, Yasuhiro Mikawa, Masahiro Ueno, Shintaro Inazawa, Katsuaki Tsutsumi, Hiroyuki Hagi, Yukio Okamoto