Patents by Inventor Yasuhisa Narutomi

Yasuhisa Narutomi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plate making processing for using negative working light-sensitive lithographic plate requiring no dampening solution
    Patent number: 4642283
    Abstract: A negative working light-sensitive lithographic plate requiring no dampening solution and a plate making process are described, the negative working light-sensitive lithographic plate comprising a support having, in sequence, on said support, (A) a light-sensitive layer containing (1) an o-quinonediazide compound and (2) a coupling component which causes a diazo coupling reaction under a basic environment, and (B) a silicone rubber layer, and the plate making process comprising imagewise exposing the negative working light-sensitive lithographic plate and developing said exposed plate to obtain a lithographic plate requiring no dampening solution, wherein a step of processing with base is carried out after imagewise exposure.
    Type: Grant
    Filed: March 14, 1985
    Date of Patent: February 10, 1987
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroshi Takahashi, Yasuhisa Narutomi, Yoshimasa Aotani, Keisuke Shiba
  • Photosensitive diazonium compound containing composition and article with .beta.-hydroxyalkyl acrylate or methacrylate
    Patent number: 4275138
    Abstract: A photosensitive composition is prepared comprising a diazonium compound and a polymer containing at least 50% by weight of the recurring unit represented by the following general formula (I): ##STR1## wherein R.sub.1 represents hydrogen atom or methyl group, R.sub.2 represents hydrogen atom or a methyl, ethyl or chloromethyl group and n is an integer of 1 to 10.
    Type: Grant
    Filed: September 14, 1976
    Date of Patent: June 23, 1981
    Assignees: Fuji Photo Film Co., Ltd., National Patent Development Corp.
    Inventors: Nobuyuki Kita, Yasuhisa Narutomi
  • Photosensitive diazo lithographic printing plate with oxalic acid as stabilizer
    Patent number: 4172729
    Abstract: A photosensitive diazo composition for a pre-sensitized lithographic plate which exhibits an extended shelf life as well as improved printing performance, the composition comprising (a) a diazonium compound, (b) an organic high molecular weight binder, and (c) from about 0.1 to about 5% by weight of oxalic acid or a salt thereof.
    Type: Grant
    Filed: June 28, 1977
    Date of Patent: October 30, 1979
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasuhisa Narutomi, Kesanao Kobayashi, Teruo Mori
  • Photosensitive composition
    Patent number: 4123276
    Abstract: A photosensitive composition is prepared comprising (a) a copolymer having an acid value of 10 to 100 and containing structural units represented by the following general formula I ##STR1## where R.sub.1 represents a hydrogen atom or methyl group, R.sub.2 represents a hydrogen atom, methyl group, ethyl group or chloromethyl group, and n is an integer of from 1 to 10, inclusive, and structural units represented by the following general formula II ##STR2## where, in the formula, R.sub.3 represents a hydrogen atom or methyl group, and(b) a diazo compound and, optionally,(c) a resin having hydrophilic groups.
    Type: Grant
    Filed: January 18, 1977
    Date of Patent: October 31, 1978
    Assignees: Fuji Photo Film Co., Ltd., National Patent Development Corporation
    Inventors: Nobuyuki Kita, Yasuhisa Narutomi