Patents by Inventor Yasuji Ishida

Yasuji Ishida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7194530
    Abstract: In an integrated management system for providing a network system having a plurality of computers with a security function and managing a plurality of target products, implementation of the management system itself is facilitated by providing the management system with setting information templates prepared for respective target products, a management program for managing setting information files of target products actually used in a target network, an edit program for editing setting information files, and an install program for installing setting information files created by using the management program and the edit program in respective target devices.
    Type: Grant
    Filed: August 7, 2002
    Date of Patent: March 20, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Kayashima, Hiromi Isokawa, Yasuji Ishida, Toru Senoo
  • Publication number: 20040118163
    Abstract: A thermal treatment apparatus includes a furnace of a refractory, a stage capable of carrying synthetic silica glass and moving between a first stage position for letting the synthetic silica glass into the furnace and a second stage position for letting the synthetic silica glass out of the furnace, a heat generator for heating the synthetic silica glass, and a driving section connected to the stage, for moving the stage between the first stage position and the second stage position. The thermal treatment apparatus also can include a rotational driving section for rotating the stage.
    Type: Application
    Filed: December 3, 2003
    Publication date: June 24, 2004
    Applicant: NIKON CORPORATION
    Inventors: Shouji Yajima, Hiroyuki Hiraiwa, Yasuji Ishida
  • Patent number: 6732546
    Abstract: A production method of synthetic silica glass according to the present invention comprises a first step of ejecting a silicon compound and a combustion gas containing oxygen and hydrogen from a burner to effect hydrolysis of the silicon compound in oxyhydrogen flame to produce fine particles of silica glass, and thereafter depositing and vitrifying the fine particles of silica glass on a target opposed to the burner to obtain a synthetic silica glass ingot; a second step of heating the synthetic silica glass ingot or the like obtained in the first step up to a first retention temperature of not less than 900° C., retaining the ingot or the like at the first retention temperature, and cooling the ingot or the like at a temperature decrease rate of not more than 10° C./h down to a temperature of not more than 500° C.; and a third step of heating the synthetic silica glass ingot or the like obtained in the second step up to a second retention temperature of not less than 500° C.
    Type: Grant
    Filed: March 28, 2001
    Date of Patent: May 11, 2004
    Assignee: Nikon Corporation
    Inventors: Shouji Yajima, Hiroyuki Hiraiwa, Yasuji Ishida
  • Publication number: 20030055939
    Abstract: In an integrated management system for providing a network system having a plurality of computers with a security function and managing a plurality of target products, implementation of the management system itself is facilitated by providing the management system with setting information templates prepared for respective target products, a management program for managing setting information files of target products actually used in a target network, an edit program for editing setting information files, and an install program for installing setting information files created by using the management program and the edit program in respective target devices.
    Type: Application
    Filed: August 7, 2002
    Publication date: March 20, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Makoto Kayashima, Hiromi Isokawa, Yasuji Ishida, Toru Senoo