Abstract: A light is incident on a refractive diffraction grating 13, and is distributed for each of wavelengths at different angles to be outputted. A lens 14 converts the distributed lights into belt-shaped lights, and the belt-shaped lights are incident on a mirror substrate 15 having selective reflection regions 17-1 to 17-x. By moving the mirror substrate 15 toward a direction different from a distribution direction of the belt-shaped lights, only the light of any one of wavelengths is reflected. Then, the light returning to the refractive diffraction grating 13 is reflected to an incident direction of the original light. Accordingly, a tunable filter which is able to select a light of an arbitrary wavelength by moving the mirror substrate 15 can be realized.

Abstract: A wavelength selective light cross connect device 1A is configured of a route selector 10A including route selection elements 11-1 to 11-N, wavelength selector 20A, route selector 40A including route selection elements 41-1 to 41-M and controller 50A. The route selection elements 11-1 to 11-N select routes for WDM signals of N channels inputted to input routes Rin1 to RinN, and directs the WDM signals to the wavelength selector 20A. The wavelength selector 20A performs a selection operation to (N×M) WDM signals according to their wavelength, and outputs the signals. Wavelength selection elements 40-1 to 40-M receives different outputs obtained from the respective route selection elements via the wavelength selector 20A, selects routes and outputs the signals from output routes Rout1 to RoutM.

Abstract: In an optically variable filter array apparatus, WDM-signal light beams of m channels ranging in wavelength from ?1 to ?n from optical fibers 11-1 to 11-m enter wavelength dispersion element 17 through concave mirror 16. Wavelength dispersion element disperses incident light beams in different directions according to their wavelengths and direct them to a concave mirror 18. In concave mirror, light beams of different channels are turned into strip-like parallel light beams and developed over xy plane according to channel and wavelength. Wavelength selection element 19 has pixels arranged in lattice pattern, for bringing a pixel at a position corresponding to to-be-selected channel and wavelength into a reflective state. Light beams reflected from wavelength selection element pass through the same path to exit from optical fibers 15-1 to 15-m. By changing reflection characteristics of wavelength selection element on a pixel-by-pixel basis, desired wavelengths of given WDM light can be selected.

Abstract: In an optically variable filter array apparatus, WDM-signal light beams of m channels ranging in wavelength from ?1 to ?n from optical fibers 11-1 to 11-m enter wavelength dispersion element 17. Wavelength dispersion element 17 disperses incident light beams in different directions according to their wavelengths. In lens 18, light beams of different channels are turned into strip-like parallel light beams and developed over xy plane according to channel and wavelength. Wavelength selection element 19 has pixels arranged in lattice pattern, for bringing a pixel at a position corresponding to to-be-selected channel and wavelength into a reflective state. Light beams reflected from wavelength selection element 19 pass through the same path to exit from optical fibers 15-1 to 15-m. By changing reflection characteristics of wavelength selection element 19 on a pixel-by-pixel basis, characteristics of optical filter can be varied, so that desired wavelengths of given WDM light can be selected.

Abstract: A light from an optical fiber is incident on a dispersive element via an optical circulator and an optical fiber. The dispersive element disperses the incident light toward directions different depending on wavelength to apply the dispersed lights to a lens. The lens focuses the lights at positions different for each wavelength of the light. The patterning plate has desired reflection characteristics. The lights reflected on the patterning plate are multiplexed by the dispersive element through the identical path to be emitted from an optical fiber via the optical circulator. Desired characteristics can be obtained by arbitrarily changing a pattern with reflection characteristics of the patterning plate. In addition, a characteristic of the optical filter can be changed by moving the patterning plate.

Abstract: A light from an optical fiber is incident on a dispersive element via an optical circulator and an optical fiber. The dispersive element disperses the incident light toward directions different depending on wavelength to apply the dispersed lights to a lens. The lens focuses the lights at positions different for each wavelength of the light. The patterning plate has desired reflection characteristics. The lights reflected on the patterning plate are multiplexed by the dispersive element through the identical path to be emitted from an optical fiber via the optical circulator. Desired characteristics can be obtained by arbitrarily changing a pattern with reflection characteristics of the patterning plate. In addition, a characteristic of the optical filter can be changed by moving the patterning plate.

Abstract: A light is incident on a refractive diffraction grating 13, and is distributed for each of wavelengths at different angles to be outputted. A lens 14 converts the distributed lights into belt-shaped lights, and the belt-shaped lights are incident on a mirror substrate 15 having selective reflection regions 17-1 to 17-x. By moving the mirror substrate 15 toward a direction different from a distribution direction of the belt-shaped lights, only the light of any one of wavelengths is reflected. Then, the light returning to the refractive diffraction grating 13 is reflected to an incident direction of the original light. Accordingly, a tunable filter which is able to select a light of an arbitrary wavelength by moving the mirror substrate 15 can be realized.

Abstract: A manufacturing method for a planar lightwave circuit device. A lift-off mask layer is formed on a planar lightwave circuit composed of cores and a cladding. The lift-off mask layer is next exposed to light by using a mask having a plurality of first patterns respectively corresponding to the cores and a plurality of second patterns each formed on at least one side of each first pattern in spaced relationship therewith. A wiring pattern material layer is next deposited on the lift-off mask layer exposed above, and the lift-off mask layer is next stripped off to thereby form a plurality of real patterns respectively corresponding to the first patterns and a plurality of dummy patterns respectively corresponding to the second patterns, from the wiring pattern material layer.

Abstract: A manufacturing method for a planar lightwave circuit device. A lift-off mask layer is formed on a planar lightwave circuit composed of cores and a cladding. The lift-off mask layer is next exposed to light by using a mask having a plurality of first patterns respectively corresponding to the cores and a plurality of second patterns each formed on at least one side of each first pattern in spaced relationship therewith. A wiring pattern material layer is next deposited on the lift-off mask layer exposed above, and the lift-off mask layer is next stripped off to thereby form a plurality of real patterns respectively corresponding to the first patterns and a plurality of dummy patterns respectively corresponding to the second patterns, from the wiring pattern material layer.

Abstract: A manufacturing method for a planar lightwave circuit device. A lift-off mask layer is formed on a planar lightwave circuit composed of cores and a cladding. The lift-off mask layer is next exposed to light by using a mask having a plurality of first patterns respectively corresponding to the cores and a plurality of second patterns each formed on at least one side of each first pattern in spaced relationship therewith. A wiring pattern material layer is next deposited on the lift-off mask layer exposed above, and the lift-off mask layer is next stripped off to thereby form a plurality of real patterns respectively corresponding to the first patterns and a plurality of dummy patterns respectively corresponding to the second patterns, from the wiring pattern material layer.

Abstract: The invention is directed to providing a characteristic measuring method and characteristic measuring system of a WDM optical amplifier that enables high speed and accurate measurement of characteristics of an optical amplifier by a measuring system with a simple construction. To this end, with the characteristic measuring method of a WDM optical amplifier according to the invention, for example, a plurality of signal lights corresponding to respective signal light wavelengths in a measurement wavelength band are divided into groups for odd and even channel numbers, such that signal lights of adjacent wavelengths are in different groups, and the power of each signal light is adjusted such that the total power of the signal lights in each group is approximately equal to a preset reference value. Then, a WDM signal light containing the multiplexed signal lights is in turn input to the optical amplifier, and the spectrum of the output light spectrum the optical amplifier is input for each group.

Abstract: A manufacturing method for a planar lightwave circuit device. A lift-off mask layer is formed on a planar lightwave circuit composed of cores and a cladding. The lift-off mask layer is next exposed to light by using a mask having a plurality of first patterns respectively corresponding to the cores and a plurality of second patterns each formed on at least one side of each first pattern in spaced relationship therewith. A wiring pattern material layer is next deposited on the lift-off mask layer exposed above, and the lift-off mask layer is next stripped off to thereby form a plurality of real patterns respectively corresponding to the first patterns and a plurality of dummy patterns respectively corresponding to the second patterns, from the wiring pattern material layer.

Abstract: The invention is directed to providing a characteristic measuring method and characteristic measuring system of a WDM optical amplifier that enables high speed and accurate measurement of characteristics of an optical amplifier by a measuring system with a simple construction. To this end, with the characteristic measuring method of a WDM optical amplifier according to the invention, for example, a plurality of signal lights corresponding to respective signal light wavelengths in a measurement wavelength band are divided into groups for odd and even channel numbers, such that signal lights of adjacent wavelengths are in different groups, and the power of each signal light is adjusted such that the total power of the signal lights in each group is approximately equal to a preset reference value. Then, a WDM signal light containing the multiplexed signal lights is in turn input to the optical amplifier, and the spectrum of the output light spectrum the optical amplifier is input for each group.