Patents by Inventor Yasumasa Kawabe
Yasumasa Kawabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Positive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol group
Patent number: 5494773Abstract: A positive photoresist composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound is described, wherein the alkali-soluble novolak resin contains a novolak resin to be obtained by condensing a mixture of (a) at least one phenol represented by the following formula (1) and at least one compound represented by the following formula (2) and (b) at least one aldehyde: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different and each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group or an arylcarbonyl group; R.sub.4, R.sub.5, R.sub.6 and R.sub.7 are the same or different and each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkenyl group, an aryl group or an aralkyl group; and n represents an integer of from 4 to 7.Type: GrantFiled: March 6, 1995Date of Patent: February 27, 1996Assignee: Fuji Photo Film Co., Ltd.Inventors: Shiro Tan, Yasumasa Kawabe, Tadayoshi Kokubo -
Patent number: 5429905Abstract: The present invention relates to a positive-working photoresist composition comprising at least one of the 1,2-naphthoquinonediazido-5- sulfonic acid ester of a polyhydroxy compound represented by formula (1) and the 1,2-naphthoquinonediazido-4-sulfonic acid ester of a polyhydroxy compound represented by formula (1): ##STR1## wherein R represents a hydrogen atom, a hydroxy group, a halogen atom, a nitro group, an alkyl group having from 1 to 6 carbon atoms, an aryl group, or an alkenyl group; and R.sub.1 to R.sub.15, which may be the same or different, each represents a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group having from 1 to 6 carbon atoms, an alkoxy group, or a substituted or unsubstituted cycloalkyl group, with the proviso that at least one of R.sub.1 to R.sub.15 is a substituted or unsubstituted cycloalkyl group.Type: GrantFiled: April 13, 1994Date of Patent: July 4, 1995Assignee: Fuji Photo Film Co., Ltd.Inventors: Shiro Tan, Yasumasa Kawabe, Tadayoshi Kokubo
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Patent number: 5360692Abstract: There is disclosed a positive type photoresist composition comprising an alkali-soluble resin, a compound having a 1,2-naphthoquinonediazido group, and at least one light absorbing agent selected from the group consisting of the compounds represented by the following formulae [I] and [II], the content of said light absorbing agent being in the range of 0.1 to 10% by weight based on the total solid content of the composition: ##STR1## wherein X represents a hydrogen atom, a halogen atom, an alkyl group, an aralkyl group, an alkoxy group, an acyl group, or an aryl group; Y represents a single bond, an alkylene group, --O--, --S--, --SO.sub.2 --or ##STR2## R represents a hydrogen atom, an alkyl group, or an aralkyl group; m represents an integer from 1 to 3; and n represents an integer from 1 to 4. The content of light absorbing agent in said composition is in the range of from 0.3% by weight to 5% by weight, based on the total solid content of the composition.Type: GrantFiled: June 3, 1993Date of Patent: November 1, 1994Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasumasa Kawabe, Kazuya Uenishi, Tadayoshi Kokubo
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Patent number: 5340683Abstract: A PS plate comprises a surface-grained and anodized aluminum plate provided thereon with a light-sensitive layer of a composition comprising a light-sensitive substance and an alkali-soluble resin wherein the light-sensitive substance is a 1,2-naphthoquinonediazide-5- (or -4-) sulfonic acid ester of a polyhydroxy compound of formula (I): ##STR1## wherein substituents R.sub.1 to R.sub.4 may be same or different and each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group or an alkenyl group; R.sub.5 and R.sub.6 each represents a hydrogen atom, an alkyl group or a group: ##STR2## a and c each represents 0-1 and b represents 0-4. The PS plate permits the complete removal of any pasting mark and has a high development latitude.Type: GrantFiled: July 7, 1993Date of Patent: August 23, 1994Assignee: Fuji Photo Film Co., Ltd.Inventors: Syunichi Kondo, Akira Nagashima, Yasumasa Kawabe
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Patent number: 5340688Abstract: Disclosed is a novel positive type photoresist composition comprising a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic ester of a member selected from the group consisting of the polyhydroxy compounds represented by the following formula (I), (II) or (III) and an alkali-soluble resin: ##STR1## wherein the variables of Formula I are defined in the specification; ##STR2## wherein the variables of Formula II are defined in the specification; ##STR3## wherein the variables of Formula III are defined in the specification.Type: GrantFiled: February 10, 1993Date of Patent: August 23, 1994Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasumasa Kawabe, Toshiaki Aoai, Tadayoshi Kokubo
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Patent number: 5324619Abstract: A composition, useful for its excellent resolution, sensitivity, development properties, and heat resistance, having an alkali soluble resin and a quinonediazide compound as essential ingredients, and further containing at least one polyhydroxy compound represented by the following formula (I) or (II): ##STR1## wherein R's, which may be the same or different, each represents a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group, an alkoxy group or --CH.sub.2 N--(--CH.sub.2 COOH).sub.2 ; X represents a --C(.dbd.O)-- group or an --SO.sub.2 -- group; m is an integer of 1 to 3; and n is an integer of 1 to 4.Type: GrantFiled: March 25, 1992Date of Patent: June 28, 1994Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasumasa Kawabe, Kazuya Uenishi, Tadayoshi Kokubo
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Patent number: 5324618Abstract: Disclosed is a positive type photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a compound represented by the following general formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 which may be the same or different and in which four groups for each group may be different from each other at the same time, each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, a nitro group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group, an arylcarbonyl group, an acyloxy group, an acyl group, an aryloxy group or an aralkoxy group; a, b, d and e each represents 0 or an integer 1 to 3; and c represents 0 or 1, with the proviso that a, b, c, d and e satisfy the relationship (a+b+c+d+e.gtoreq.2), at least one of a and d is 1 or more and at least one of b and e is 1 or more.Type: GrantFiled: December 3, 1992Date of Patent: June 28, 1994Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasumasa Kawabe, Shiro Tan, Tadayoshi Kokubo
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Patent number: 5318875Abstract: A positive photoresist composition includes an alkali-soluble resin, a quinonediazide compound and a compound selected from the group consisting of compounds represented by formulae (I), (II) and (III): ##STR1## wherein R.sub.1 to R.sub.27, which may be the same or different, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group, nitro group, alkenyl group, aryl group, aralkyl group, alkoxycarbonyl group, arylcarbonyl group, acyloxy group, acyl group, aryloxy group or aralkoxy group; ##STR2## wherein R.sub.31 represents an organic group, single bond, ##STR3## R.sub.32 represents a hydrogen atom, monovalent organic group or ##STR4## R.sub.33 to R.sub.37, which may be the same or different, and in which not all four groups for each of R.sub.33 to R.sub.37 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group, with the proviso that at least one of R.sub.33 to R.sub.Type: GrantFiled: February 10, 1993Date of Patent: June 7, 1994Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasumasa Kawabe, Toshiaki Aoai, Tadayoshi Kokubo, Shiro Tan
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Patent number: 5290658Abstract: A positive photoresist composition is provided, which comprises an alkali-soluble novolak resin and at least one light-sensitive material represented by formula (III), ##STR1## wherein R.sub.27 and R.sub.28 may be the same or different and which represents --OH, ##STR2## R.sub.29 and R.sub.33 may be the same or different and each represents --H, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryloxy group, a substituted or unsubstituted aralkyloxy group, a substituted or unsubstituted acyl group, a substituted or unsubstituted acyloxy group, a halogen, a nitro group, a cyano group, ##STR3## R.sub.34 to R.sub.Type: GrantFiled: April 24, 1992Date of Patent: March 1, 1994Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuya Uenishi, Yasumasa Kawabe, Tadayoshi Kokubo
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Patent number: 5153096Abstract: A positive type photoresist composition comprising at least one light-sensitive material, as defined herein, and an alkali-soluble novolak resin, has a high resolving power, particularly when used in semiconductor devices, accurately reproduces mask dimensions over a wide photomask line width range, from a resist pattern in a cross-sectional form having a high aspect ratio in a pattern having a line width of no greater than 1 .mu.m, has a wide developing latitude and excellent heat resistance.Type: GrantFiled: March 18, 1991Date of Patent: October 6, 1992Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuya Uenishi, Yasumasa Kawabe, Tadayoshi Kokubo
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Patent number: 5130224Abstract: A positive-working photoresist composition is disclosed comprising an alkali-soluble resin and a 1,2-naphthoquinonediazido group-containing compound, and further contains at least one light absorber selected from the group consisting of the azo compounds represented by the following formulae (I), (II), (III), (IV), (V) and (VI) in a proportion of from about 0.1 to about 10% by weight based on the total solid content of the photoresist composition, and is useful for forming a fine pattern of excellent quality even on a substrate with unevenness or high reflectivity: ##STR1## wherein R.sub.1 represents a hydrogen atom or a lower alkyl group; and X represents a sulfur atom or an oxygen atom; ##STR2## wherein R.sub.2 represents a hydroxyl group or a di(lower alkyl)amino group; R.sub.3 and R.sub.4 each represents a hydrogen atom or a carboxyl group, provided that at least one of R.sub.3 and R.sub.4 represents a carboxyl group; and R.sub.Type: GrantFiled: February 28, 1990Date of Patent: July 14, 1992Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasumasa Kawabe, Tadayoshi Kokubo
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Patent number: 5089373Abstract: A positive photoresist composition containing the combination of at least one alkali-soluble novolak resin and at least one light-sensitive compound represented by formula (I): ##STR1## wherein each of R.sub.1 to R.sub.10, which may be the same or different, represents hydrogen, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkylester group, a substituted or unsubstituted arylester group, a substituted or unsubstituted aralkylester group, a substituted or unsubstituted alkylsulfonylester group, a substituted or unsubstituted arylsulfonylester group, ##STR2## provided that at least one of R.sub.1 to R.sub.10 represents ##STR3## where R.sub.17 represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group; and at least two of R.sub.1 to R.sub.Type: GrantFiled: June 7, 1989Date of Patent: February 18, 1992Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuya Uenishi, Yasumasa Kawabe, Tadayoshi Kokubo
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Patent number: 5030550Abstract: A positive photoresist developer containing a basic compound and from 10 to 10,000 ppm of a non-ionic surfactant represented by formula (I): ##STR1## wherein X represents an oxyethylene group; Y represents an oxypropylene group; R represents hydrogen, an alkyl group containing from 1 to 8 carbon atoms, R', or ##STR2## R' represents --O--(X).sub.m (Y).sub.n --H; R" represents R' of an alkyl group containing l carbon atoms; m and n each is an integer from 1 to 50, provided that m:n is from 20:80 to 80:20; p is 0 or 1, and q and s each is o or an integer from 1 to 4, provided that p+q+s=4; and l is an integer from 1 to 4; and r is an integer from 1 to 8, provided that l+r is an integer of 9 or more. The developer has superior art in forming properties, and prevents film residues, surface layer peeling, and film reduction.Type: GrantFiled: April 6, 1989Date of Patent: July 9, 1991Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasumasa Kawabe, Hiroshi Matsumoto, Tadayoshi Kokubo
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Patent number: 4894311Abstract: A positive-working photoresist composition containing an alkali-soluble novolak resin and a photosensitive compound represented by the formula ##STR1## wherein D.sub.1 and D.sub.2, which may be the same or different, each represents a 1,2-naphthoquinonediazido-5-sulfonyl group or a 1,2-naphthoquinonediazido-4-sulfonyl group; R.sub.1 and R.sub.2, which may be the same or different, each represents an alkoxy group, or an alkyl ester group; and a, b, c, and d each is 0 or an integer from 1 to 5, provided that (a+b).gtoreq.1 and (c+d).gtoreq.1.The photoresist composition is excellent in sensitivity and resolving power and forms a resist pattern having good sectional shape and high heat resistance on, for example, a semiconductor. The photoresist composition is also applicable for forming a resist pattern having a line width of less than 1 .mu.m.Type: GrantFiled: October 29, 1987Date of Patent: January 16, 1990Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuya Uenishi, Yasumasa Kawabe, Tadayoshi Kokubo
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Patent number: 4871645Abstract: A positive-working photoresist composition is disclosed. The composition comprises a light-sensitive compound represented by general formula (A) and an alkali-soluble novolak resin. ##STR1## wherein R.sub.a, R.sub.b, R.sub.c, R.sub.d, R.sub.e and R.sub.f, which may be the same or different, each represents H, --X--R.sub.1, ##STR2## provided that among the six substituents represented by R.sub.a to R.sub.f, the number of the substituents representing H is a real number of more than 0 and not more than 3 calculated in terms of average value per molecule of the light-sensitive compound, the number of the substituents representing --X--R.sub.1 is a real number of not less than 0.3 calculated in terms of average value per molecule of the light-sensitive compound, and the number of the substituents representing ##STR3## is a real number of not less than 2.5 caluclated in terms of average value per molecule of the light-sensitive compound; X represents a simple bond, ##STR4## R.sub.Type: GrantFiled: June 6, 1988Date of Patent: October 3, 1989Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuya Uenishi, Tadayoshi Kokubo, Yasumasa Kawabe
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Patent number: 4863828Abstract: A positive-working photoresist composition is disclosed, which comprises a light-sensitive substance of 1,2-naphthoquinonediazide-4- and/or -5-sulfonate of 2,3,4,3',4',5'-hexahydroxybenzophenone and an alkali-soluble novolak resin dissolved in ethyl lactate or methyl lactate.Type: GrantFiled: January 20, 1988Date of Patent: September 5, 1989Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasumasa Kawabe, Kazuya Uenishi, Tadayoshi Kokubo
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Patent number: 4244690Abstract: According to this invention, there is provided an improved method of dyeing fibrous products characterized in that, in the dyeing of fibrous products using an oxidation-reduction dyeing type dye and an aqueous alkali solution of thiourea dioxide as a reducing solution, the reduction of the dye with the said aqueous alkali solution of thiourea dioxide is carried out in the presence of one or more substances selected from the group consisting of saturated aliphatic ketones having 3 to 10 carbon atoms, saturated aliphatic ketocarboxylic acids having 3 to 10 carbon atoms and alicyclic ketones having 3 to 10 carbon atoms.Type: GrantFiled: February 15, 1979Date of Patent: January 13, 1981Assignee: Tokai Denka Kogyo Kabushiki KaishaInventors: Kanji Sato, Kazuyoshi Kushibe, Masaru Nishii, Yasuhiro Kanaya, Yasumasa Kawabe
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Patent number: 4240791Abstract: According to this invention, there is provided a method of dyeing fibrous products characterized in that, in the dyeing of fibrous products using an oxidation-reduction dyeing type dye and an aqueous alkali solution of thiourea dioxide as a reducing solution, the reduction of the dye with the said aqueous alkali solution of thiourea dioxide is carried out in the presence of one or more dialdehyde compounds selected from dialdehyde compounds represented by the general formulaOHC--R--CHO (I)in which R is a saturated or unsaturated aliphatic or aromatic organic compound radical.Type: GrantFiled: February 15, 1979Date of Patent: December 23, 1980Assignee: Tokai Denka Kogyo Kabushiki KaishaInventors: Kanji Sato, Kazuyoshi Kushibe, Masaru Nishii, Yasuhiro Kanaya, Yasumasa Kawabe
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Patent number: 4197256Abstract: According to this invention, there is provided a method of stabilizing an alkaline aqueous solution of thiourea dioxide characterized in that one or more substances selected from the group consisting of aliphatic ketones, alicyclic ketones and aliphatic dialdehydes are added to the said alkaline aqueous solution of thiourea dioxide.Type: GrantFiled: February 15, 1979Date of Patent: April 8, 1980Assignee: Tokai Denka Kogyo Kabushiki KaishaInventors: Kanji Sato, Kazuyoshi Kushibe, Masaru Nishii, Yasuhiro Kanaya, Yasumasa Kawabe
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Patent number: 3948795Abstract: This invention provides a method for activating peroxides, particularly hydrogen peroxide or hydrogen peroxide adducts and for thereby furnishing the said peroxides with excellent bleaching effects, cleaning effects, and sterilizing effects at low temperatures, by adding to the said peroxides an aromatic compound containing in the molecule one or several groups represented by the formula ##EQU1## wherein R is a substituted or unsubstituted monovalent aromatic group and X is either CO or SO.sub.2. The activation according to this invention is preferably carried out in an aqueous solution at a pH value ranging from 7 to 11, at a temperature below 40.degree.C.Type: GrantFiled: December 21, 1973Date of Patent: April 6, 1976Assignee: Tokai Denka Kogyo Kabushiki KaishaInventors: Yasumasa Kawabe, Masaaki Suzuki