Abstract: The present invention aims at preventing deterioration of flatness of a substrate and contamination of a substrate-holding surface of a substrate holder, which are caused by a resist leaking into the back surface of the substrate. A substrate-holding surface of a substrate holder is provided with a first pair of grooves 31 and 32 extending from one end to the other along a scanning direction and a second pair of grooves 33 and 34 extending from one end to the other along a direction generally perpendicular to the scanning direction. The first and second grooves are positioned such that they make contact with the periphery of the substrate when the substrate is vertically or horizontally placed on the substrate holder. Even when a resist on a substrate leaks into the periphery of the back surface, the resist escapes into the grooves, thereby preventing deterioration of the flatness of the substrate or contamination of the substrate-holding surface.

Abstract: A wavelength monitor comprises a cylindrical lens configured to allow a laser beam emitted from a semiconductor laser to pass therethrough, first and second photodetectors configured to receive the laser beam through the cylindrical lens, and a wavelength filter disposed in an optical path between the semiconductor laser and the first photodetector.

Abstract: A dial gauge (1A) has stem bush (20) having a fitting (21) fitted to an inner wall of a stem (5) and having a predetermined clearance between a spindle (3), a holder (22) for slidably holding the spindle (3) while securing a predetermined clearance against the inner wall of the stem (5), and an elastically deformable connector (23) for connecting the fitting (21) and the holder (22), whereby an influence of deformation of the stem (5) and the fitting (21) on the holder (22) during clamping can be minimized, so that the dial gauge (1A) can be fixed to a supporting stand without deteriorating slidability of the spindle (3).

Abstract: The present invention aims at preventing deterioration of flatness of a substrate and contamination of a substrate-holding surface of a substrate holder, which are caused by a resist leaking into the back surface of the substrate.

Abstract: The present invention aims at reducing the number of scanning exposure and at enhancing throughput.

Abstract: A liquid crystal display device includes: an array substrate; a counter substrate facing the array substrate; and a liquid crystal layer interposed between the array substrate and the counter substrate, wherein the array substrate includes: a plurality of pixel electrodes arranged in a matrix in a display region; a plurality of gate lines; a plurality of source lines which cross the plurality of gate lines; an insulating layer provided between the plurality of gate lines and the plurality of source lines; a plurality of switching elements respectively connected to respective ones of the plurality of the gate lines, the plurality of source lines, and the plurality of pixel electrodes; and a short ring, a plurality of first inspection signal voltage input terminals and a plurality of depletion-type thin film transistors (DTFT) provided in a peripheral region adjacent the display region, and wherein each of the plurality of gate lines and the plurality of source lines is connected to the short ring via respectiv

Abstract: An isomer mixture of 4-trifluoromethyl-2-nitrobenzoic acid and 4-trifluoromethyl-3-nitrobenzoic acid, which is a novel compound, is obtained by nitrating a compound represented by ##STR1## (Z is COY or CY.sub.3, and Y is a halogen atom) with a nitrating agent comprising nitric acid and simultaneously hydrolyzing the radical Z. Each of the two isomers is easily isolated by treating the mixture with a basic neutralizing agent to obtain a solution containing the 2-nitro isomer and a precipitate containing the 3-nitro isomer.

Abstract: In order to effectively detect unwanted residual organic compounds such as photoresist pieces left on a semiconductor substrate after a photolithography step during its fabrication process, the substrate surface is irradiated by an ultraviolet light beam and the fluorescent light emitted by the residual organic compounds is detected by a light-receiving element and converted into an electrical signal.