Abstract: The present invention relates to the use of fungicidally active carboxamides for seed treatment, for corresponding seed dressings comprising these carboxamides, to a process for controlling phytopathogenic fungi by treating the seed with fungicidally active carboxamides, and also to seed which has been treated with the fungicidally active carboxamides.

Abstract: Compounds of the formula (I), wherein Z represents C—R7 or N, and R5 represents alkyl that may be optionally substituted, alkenyl, alkynyl, cycloalkyl or alkoxycarbonylamino, are useful as agricultural and horticultural fungicides.

Abstract: The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.

Abstract: The present invention relates to the use of fungicidally active carboxamides for seed treatment, for corresponding seed dressings comprising these carboxamides, to a process for controlling phytopathogenic fungi by treating the seed with fungicidally active carboxamides, and also to seed which has been treated with the fungicidally active carboxamides.

Abstract: Compounds of the formula (I), wherein Z represents C—R7 or N, and R represents alkyl that may be optionally substituted, alkenyl, alkynyl, cycloalkyl or alkoxycarbonylamino, are useful as agricultural and horticultural fungicides.

Abstract: This invention relates to an agrohorticultural fungicide containing benzylpyrimidine derivatives represented by the formula wherein R1, R2, R3, R4, R5, and R6 are as defined in the disclosure.

Abstract: The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.

Abstract: An exposure apparatus for exposing a substrate with an image of a pattern formed on a mask, including an illumination system or irradiation for illuminating or irradiating the mask with exposure light. A projection optical system is included for projecting, onto the substrate, an image of the pattern illuminated by the exposure light. The mask is securely supported on a movable mask stage. In one example, a mask holder is provided for supporting the mask from below. A pressing member is also included for applying, from above, a prescribed force to the mask, outside of the points supported by the mask holder.

Abstract: The present invention relates to novel isothiazole derivatives of the formula wherein A represents a group selected from in which R1, R2, R3, R4, and R5 have the meanings given in the specification, to processes for the preparation of the novel compounds, and to their use as microbicides.

Abstract: Novel isothiazole derivatives of the formula (I) wherein A represents a group selected from (1), (2) and (3) in which R1, R2, R3, R4 and R5 have the meanings given in the specification processes for the preparation of the novel compounds and their use as microbicides.

Abstract: An exposure apparatus for exposing a substrate with an image of a pattern formed on a mask, including an illumination system or irradiation for illuminating or irradiating the mask with exposure light. A projection optical system is included for projecting, onto the substrate, an image of the pattern illuminated by the exposure light. The mask is securely supported on a movable mask stage. In one example, a mask holder is provided for supporting the mask from below. A pressing member is also included for applying, from above, a prescribed force to the mask, outside of the points supported by the mask holder.

Abstract: An exposure apparatus for exposing a substrate with an image of a pattern formed on a mask, including an illumination system or irradiation for illuminating or irradiating the mask with exposure light. A projection optical system is included for projecting, onto the substrate, an image of the pattern illuminated by the exposure light. The mask is securely supported on a movable mask stage. In one example, a mask holder is provided for supporting the mask from below. A pressing member is also included for applying, from above, a prescribed force to the mask, outside of the points supported by the mask holder.

Abstract: Novel isothiazolecarboxylic acid derivatives of the formula (I), in which A, Q, Z and k have the meanings mentioned in the specification, processes for the preparation of the new compounds and their use as microbicides.

Abstract: Isothiazolecarboxamides of the formula: wherein X, Y, R1, R2, R3 and R4 have the meanings given in the specification, may be used as microbicides.

Abstract: Isothiazolecarboxamides of the formula: 1

Abstract: The invention provides nickel hydroxide secondary particles comprising agglomerates of primary particles of nickel hydroxide in the shape of a triangular prism or a triangular plate having a surface or a outer face in the form of a substantially equilateral triangle each side of which substantially equilateral triangle has a length of 1 to 10 &mgr;m. The invention further provides lithium nickel composite oxide secondary particles comprised of agglomerates of primary particles having a large particle diameter by mixing the nickel hydroxide secondary particles with a lithium compound and sintering the resulting mixture at a temperature of 600° C. to 1000° C. in an oxidative atmosphere.

Abstract: Novel 1,2,3-benzothiadiazole derivatives of the formula ##STR1## in which Het has the meanings set forth in the specification,and addition products thereof with an acid or metal salt are very effective for the control of undesired microorganisms.Novel intermediates of the formulae ##STR2## in which Het.sup.1 and R.sup.5 have the meanings given in the specification.

Abstract: Novel 1,2,3-benzothiadiazole derivatives of the formula ##STR1## in which Het has the meanings set forth in the specification,and addition products thereof with an acid or metal salt are very effective for the control of undesired microorganisms.Novel intermediates of the formulae ##STR2## in which Het.sup.1 and R.sup.5 have the meanings given in the specification.

Abstract: A shredding machine which comprises a pair of juxtaposed cutting rollers for shredding paper material, a paper feed tray movable between lowered and elevated positions and adapted to support thereon the paper material to be shredded, a feed roller assembly for feeding the paper material from the paper feed tray towards the cutting rollers, a protective cover supported for movement between closed and opened positions and for covering a space above the paper feed tray when in the closed position; and a control for moving the paper feed tray from the elevated position towards the lowered position in response to the movement of the protective cover from the closed position towards the opened position.

Abstract: A copying machine exposure adjustment device, including an operation panel that converts user operations into digital signals, a digital operation circuit that processes operational data from the operation panel and computes exposure data, a D/A converter that converts exposure data sequentially transmitted from the digital operation circuit into analog exposure data, a copy-lamp control circuit that adjusts the light volume of a copying lamp in response to the exposure data from the D/A converter, an image density circuit that detects light reflected from the original document, and a data correction circuit that corrects the exposure data from the D/A converter in response to the image density data from the image density detector circuit while the automatic exposure mode is in operation.