Patents by Inventor Yasuo Enatsu

Yasuo Enatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10272708
    Abstract: An embodiment of the present invention provides a thermosensitive recording material and a method for manufacturing the same. The thermosensitive recording material includes, on a support, a thermosensitive recording layer containing a polyvinyl alcohol and a color development component; and a protective layer containing a resin component, in this order from the support side. At least one of the thermosensitive recording layer or the protective layer further contains a styrene-isoprene resin.
    Type: Grant
    Filed: October 24, 2017
    Date of Patent: April 30, 2019
    Assignee: FUJIFILM CORPORATION
    Inventors: Masayoshi Fujita, Yasuo Enatsu, Yoshihisa Hashi
  • Publication number: 20180043717
    Abstract: An embodiment of the present invention provides a thermosensitive recording material and a method for manufacturing the same. The thermosensitive recording material includes, on a support, a thermosensitive recording layer containing a polyvinyl alcohol and a color development component; and a protective layer containing a resin component, in this order from the support side. At least one of the thermosensitive recording layer or the protective layer further contains a styrene-isoprene resin.
    Type: Application
    Filed: October 24, 2017
    Publication date: February 15, 2018
    Inventors: Masayoshi FUJITA, Yasuo ENATSU, Yoshihisa HASHI
  • Patent number: 8986828
    Abstract: A multilayer film (10) is provided with a hard coat layer (12) and a film base (11) formed from a polymer compound. A heat shrinkage factor of the film base (11) (170° C., 10 minutes) is in a range from 0.05% to 3.0%. The hard coat layer (12) is formed by applying a coating liquid (33) containing a compound represented by a general formula (1), tetraalkoxysilane, acid water with pH in a range from 2 to 6, and a water-soluble hardening agent. An amount of the acid water is in a range from 60 to 2000 pts. wt. relative to a total amount 100 pts. wt. of the compound represented by the general formula (1) and tetraalkoxysilane. In the general formula (1), “R1” is an organic group having 1 to 15 carbons and containing no amino group. “R2” is a methyl group or ethyl group, “R3” is an alkyl group having 1 to 3 carbons, and “n” is zero or 1. (1) R1R2nSi(OR3)3-n.
    Type: Grant
    Filed: February 16, 2010
    Date of Patent: March 24, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Naoya Imamura, Yasuo Enatsu, Mitsunori Hachisuka
  • Publication number: 20120034449
    Abstract: A multilayer film (10) is provided with a hard coat layer (12) and a film base (11) formed from a polymer compound. A heat shrinkage factor of the film base (11) (170° C., 10 minutes) is in a range from 0.05% to 3.0%. The hard coat layer (12) is formed by applying a coating liquid (33) containing a compound represented by a general formula (1), tetraalkoxysilane, acid water with pH in a range from 2 to 6, and a water-soluble hardening agent. An amount of the acid water is in a range from 60 to 2000 pts. wt. relative to a total amount 100 pts. wt. of the compound represented by the general formula (1) and tetraalkoxysilane. In the general formula (1), “R1” is an organic group having 1 to 15 carbons and containing no amino group. “R2” is a methyl group or ethyl group, “R3” is an alkyl group having 1 to 3 carbons, and “n” is zero or 1.
    Type: Application
    Filed: February 16, 2010
    Publication date: February 9, 2012
    Inventors: Naoya Imamura, Yasuo Enatsu, Mitsunori Hachisuka