Abstract: An apparatus (100) for fabricating a semiconductor thin film includes: substrate surface pretreatment means (101) for pretreating a surface of a substrate; organic layer coating means (102) for coating, with an organic layer, the substrate thus pretreated; focused light irradiation means (103) for irradiating, with focused light, the substrate coated with the organic layer, and for forming a growth-mask layer while controlling layer thickness; first thin film growth means (104) for selectively growing a semiconductor thin film over an area around the growth-mask layer; substrate surface treatment means (105) for, after exposing the surface of the substrate by removing the growth-mask layer, modifying the exposed surface of the substrate; and second thin film growth means (106) for further growing the semiconductor thin film and growing a semiconductor thin film over the modified surface of the substrate.

Abstract: An apparatus (100) for fabricating a semiconductor thin film includes: substrate surface pretreatment means (101) for pretreating a surface of a substrate; organic layer coating means (102) for coating, with an organic layer, the substrate thus pretreated; focused light irradiation means (103) for irradiating, with focused light, the substrate coated with the organic layer, and for forming a growth-mask layer while controlling layer thickness; first thin film growth means (104) for selectively growing a semiconductor thin film over an area around the growth-mask layer; substrate surface treatment means (105) for, after exposing the surface of the substrate by removing the growth-mask layer, modifying the exposed surface of the substrate; and second thin film growth means (106) for further growing the semiconductor thin film and growing a semiconductor thin film over the modified surface of the substrate.

Abstract: A material includes various encrypted information such as product type information, product history information and authentication judging information by using an information presenting substance exhibiting line spectrums and associated with certain encrypted information corresponding to the line spectrums. Line spectrum of the information presenting substance is detected by irradiating electromagnetic waves to the material. Since the line spectrum is narrow in half-width and strong in light emitting intensity, the distinctiveness is high and therefore the encrypted information included in the material can be specified assuredly, enabling the simple and assured identification of the material.

Abstract: A material includes various encrypted information such as product type information, product history information and authentication judging information by using an information presenting substance exhibiting line spectrums and associated with certain encrypted information corresponding to the line spectrums. Line spectrum of the information presenting substance is detected by irradiating electromagnetic waves to the material. Since the line spectrum is narrow in half-width and strong in light emitting intensity, the distinctiveness is high and therefore the encrypted information included in the material can be specified assuredly, enabling the simple and assured identification of the material.