Abstract: [Object] To provide a sputtering target allowing component metals to be separated from each other by a simple process and a method of processing the sputtering target. [Solving Means] A method of processing a sputtering target according to the present invention performs a hydrogen embrittlement process with respect to a sputtering target 1 including a first target portion 3 made of a first material being a non hydrogen embrittlement material and a second target 4 portion made of a second material being a hydrogen embrittlement material, which are bonded to each other, to thereby separate from the sputtering target 1 the second target portion 4, collects the second material, and collects the first material. By utilizing difference in hydrogen embrittlement between the first material and the second material, the first material and the second material are separated from each other and collected. It is possible to efficiently collect the first material and the second material.

Abstract: The present invention provides a cationic electrodeposition coating composition having good appearance of coated film and high throwing power, and a method for making an amine-modified epoxy resin used for the cationic electrodeposition coating composition. The present invention relates to a method for making an amine-modified epoxy resin comprised in a cationic electrodeposition coating composition comprising the steps of: providing a half blocked isocyanate by reaction of an isocyanate compound with a blocking agent, preparing a blocked prepolymer by reaction of the half blocked isocyanate with a polyol, forming an epoxy resin containing oxazolidone ring by reaction of the blocked prepolymer with a diglycidyl ether type epoxy resin, chain-extending the epoxy resin containing oxazolidone ring with at least saturated or non-saturated hydrocarbon group containing dicarboxylic acid, and modifying the chain-extended epoxy resin with an amine.

Abstract: A cationic electrodeposition coating composition having superior defoaming property and being capable of effectively preventing the generation of unevennes of drying is provided.

Abstract: The present invention provides a cationic electrodeposition coating composition having good appearance of coated film and high throwing power, and a method for making an amine-modified epoxy resin used for the cationic electrodeposition coating composition. The present invention relates to a method for making an amine-modified epoxy resin comprised in a cationic electrodeposition coating composition comprising the steps of: providing a half blocked isocyanate by reaction of an isocyanate compound with a blocking agent, preparing a blocked prepolymer by reaction of the half blocked isocyanate with a polyol, forming an epoxy resin containing oxazolidone ring by reaction of the blocked prepolymer with a diglycidyl ether type epoxy resin, chain-extending the epoxy resin containing oxazolidone ring with at least saturated or non-saturated hydrocarbon group containing dicarboxylic acid, and modifying the chain-extended epoxy resin with an amine.

Abstract: The present invention provides a process for forming a multi layered coated film having good finished appearance. The present invention relates to a process for forming a multi layered coated film comprising the steps of conducting electrodeposition coating with a cationic electrodeposition coating composition on a substrate, and then heating and curing it to form an cured electrodeposition coated film on the substrate, applying an intermediate coating composition on the cured coated film to form an uncured intermediate coated film, applying a base top coating composition on the uncured intermediate coated film to form an uncured base coated film, applying a clear top coating composition on the uncured base coated film to form an uncured clear coated film, and simultaneously heating and curing the three uncured coated films, wherein the cured electrodeposition coated film has specified ranges of Ra and Pa; or has specified ranges of Tg and crosslinking density.

Abstract: A parallel scan type ion implanter comprising multipole electrostatic deflectors and designed to produce an even and uniform dose distribution on the entire area of the substrate by maintaining the moving speed of the ion beam spot constant on the substrate is characterized in that it holds the rate of raising or lowering the deflection voltage stepwise along the vertical direction (Y-direction) constant and the manner of varying the rate of changing the deflection voltage along the horizontal direction (X-direction) with time as the function of the location of the moving beam spot on the substrate determined by the dimensional parameters of the multipole electrostatic deflectors assuming that the rate is normalized by the rate of changing the deflecting voltage when the beam spot passes the center of the substrate.