Abstract: Disclosed is an oxide sintered body, wherein contents of zinc, indium, gallium and tin relative to all metal elements satisfy the following inequality expressions: 40 atomic %?[Zn]?55 atomic %, 20 atomic %?[In]?40 atomic %, 5 atomic %?[Ga]?15 atomic %, and 5 atomic %?[Sn]?20 atomic %, where the contents (atomic %) of zinc, indium, gallium and tin relative to all metal elements excluding oxygen are respectively taken as [Zn], [In], [Ga] and [Sn], wherein the oxide sintered body has a relative density of 95% or more, and wherein the oxide sintered body includes, as a crystal phase, 5 to 20 volume % of InGaZn2 O5.

Abstract: A silver alloy sputtering target is provided which is useful in forming a thin silver-alloy film of a uniform thickness by the sputtering method. When crystal orientation strengths are determined at four arbitrary positions by the X-ray diffraction method, the orientation which exhibits the highest crystal orientation strength (Xa) is the same at the four measurement positions, and variations in strength ratio (Xb/Xa) between the highest crystal orientation strength (Xa) and the second highest crystal orientation strength (Xb) is 20% ore less.

Abstract: In a target for cathode discharging arc ion plating containing Al and Cr as an essential ingredient according to the invention, the thickness of the Al and Cr compound layer formed between Cr particles and Al contained in a target is 30 ?m or less. Alternatively, the total for the peak intensities of Al—Cr compound observed between diffraction angles between 10 to 80° by X-ray diffractiometry according to ?=2? method is 10% or less relative to the total for the peak intensities of Al, Cr and the Al—Cr compound. Further, the relative density of the target is 92% or more. The target is capable of forming hard films of high quality while preventing not uniform movement of arc spots and suppressing formation of macro particles.

Abstract: The present invention provides a surfboard improved in a movement performance such as a speed or a change of direction, etc. at the time of sliding on water, as compared with a conventional surfboard. The surfboard is so constructed that a tough and soft synthetic resin film 7 having a surface smoothness and patterned along to the contour of the rear area 2a of the water-contact bottom surface 2 of a surfboard 1 or the contour of both side faces 9b and 9b of a fin 9 is adhered either to the rear area 2a of the water contact bottom surface 2 of the surfboard 1 or to both side faces 9b and 9b of the fin 9 attached thereto, or to both of the rear area 2a and both side faces 9b and 9b of the fin 9, through an adhering agent such as a bonding agent or an adhesive agent. As the synthetic resin film 7 for adherence, such a one that a coated face 8 of the adhesive agent is applied to the rear surface thereof in advance is preferably used.

Abstract: A silver alloy sputtering target is provided which is useful in forming a thin silver-alloy film of a uniform thickness by the sputtering method. When crystal orientation strengths are determined at four arbitrary positions by the X-ray diffraction method, the orientation which exhibits the highest crystal orientation strength (Xa) is the same at the four measurement positions, and variations in strength ratio (Xb/Xa) between the highest crystal orientation strength (Xa) and the second highest crystal orientation strength (Xb) is 20% ore less.

Abstract: In a target for cathode discharging arc ion plating containing Al and Cr as an essential ingredient according to the invention, the thickness of the Al and Cr compound layer formed between Cr particles and Al contained in a target is 30 &mgr;m or less. Alternatively, the total for the peak intensities of Al—Cr compound observed between diffraction angles between 10 to 80° by X-ray diffractiometry according to &thgr;=2&thgr; method is 10% or less relative to the total for the peak intensities of Al, Cr and the Al—Cr compound. Further, the relative density of the target is 92% or more. The target is capable of forming hard films of high quality while preventing not uniform movement of arc spots and suppressing formation of macro particles.

Abstract: An improved process for producing superfines of metal is disclosed, which comprises reacting a metal halide containing gas with a reducing gas by causing to flow both the stream of a metal halide containing gas and the stream of a reducing gas concurrently but at different velocities so as to form an interfacial instability region in the reaction zone, and nuclei are formed in said instability region whereas said reaction zone is quenched (cooled) to inhibit the excessive growth of said nuclei. Application of a magnetic field to the reaction zone can enhance the degree of fineness and magnetic properties of the superfines thus produced.