Patents by Inventor Yasushi Ohe

Yasushi Ohe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6045953
    Abstract: A photosensitive recording material comprising an alicyclic, solvent-soluble, thermosetting epoxy oligomer capable of cationic polymerization, the oligomer being of a specified structure, an aliphatic monomer having at least one ethylenically unsaturated bond, the monomer being liquid at normal temperature and pressure, having a boiling point of 100.degree. C. or above at normal pressure and being capable of radical polymerization, a photoinitiator selected from the group consisting of i) a first photoinitiator capable of simultaneously generating a radical species that activates radical polymerization and a Br.o slashed.nsted acid or Lewis acid that activates cationic polymerization, upon exposure to actinic radiation, and ii) a second photoinitiator comprised of a radical polymerization photoinitiator capable of generating a radical species that activates radical polymerization upon exposure to actinic radiation and a cationic polymerization photoinitiator capable of generating a Br.o slashed.
    Type: Grant
    Filed: May 6, 1997
    Date of Patent: April 4, 2000
    Assignee: Toppan Printing Co., Ltd.
    Inventors: Yasushi Ohe, Hiromitsu Ito, Niro Watanabe
  • Patent number: 5698345
    Abstract: A photosensitive recording material comprising a solvent-soluble, thermosetting epoxy oligomer capable of cationic polymerization, an aliphatic monomer having at least one ethylenically unsaturated bond, the monomer being liquid at normal temperature and pressure, having a boiling point of 100.degree. C. or above at normal pressure and being capable of radical polymerization, a photoinitiator selected from the group consisting of i) a first photoinitiator capable of simultaneously generating a radical species that activates radical polymerization and a Br.o slashed.nsted acid or Lewis acid that activates cationic polymerization, upon exposure to actinic radiation, and ii) a second photoinitiator comprised of a radical polymerization photoinitiator capable of generating a radical species that activates radical polymerization upon exposure to actinic radiation and a cationic polymerization photoinitiator capable of generating a Br.o slashed.
    Type: Grant
    Filed: March 11, 1997
    Date of Patent: December 16, 1997
    Assignee: Toppan Printing Co., Ltd.
    Inventors: Yasushi Ohe, Hiromitsu Ito, Madoka Yasuike, Yasumasa Toba, Miki Shikano