Patents by Inventor Yasushi Takai

Yasushi Takai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200024745
    Abstract: A film-forming powder containing a rare earth oxyfluoride has an average particle size D50 of 0.6-15 ?m, a total volume of ?10 ?m pores of 0.51-1.5 cm3/g as measured by mercury porosimetry, and a BET surface area of 3-50 m2/g is suitable for forming a dense film in high yields or deposition rates and high productivity. The film-forming powder having a greater pore volume can be prepared by forming a rare earth ammonium fluoride complex salt on surfaces of rare earth oxide particles to provide precursor particles, and heat treating the precursor particles at a temperature of 350 to 700° C.
    Type: Application
    Filed: July 15, 2019
    Publication date: January 23, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Kimura, Yasushi Takai, Shigeyuki Nakamura
  • Patent number: 10538836
    Abstract: An yttrium fluoride spray material contains Y5O4F7 and YF3, and has an average particle size of 10-60 ?m and a bulk density of 1.2-2.5 g/cm3. The Y5O4F7 and YF3 in the yttrium fluoride spray material consist of 30 to 90% by weight of Y5O4F7 and the balance of YF3. A sprayed coating of yttrium oxyfluoride is obtained by atmospheric plasma spraying of the spray material.
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: January 21, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Publication number: 20190352761
    Abstract: A spray material is defined as composite particles consisting essentially of (A) particles of rare earth fluoride and (B) particles of rare earth oxide, hydroxide or carbonate, consolidated together. The spray material is plasma sprayed onto a substrate to form a sprayed layer containing rare earth oxyfluoride in a consistent manner while minimizing the process shift and releasing few particles. The sprayed member has improved corrosion resistance to halogen-based gas plasma.
    Type: Application
    Filed: May 8, 2019
    Publication date: November 21, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yasushi Takai
  • Patent number: 10435569
    Abstract: A spray material comprising rare earth element oxyfluoride particles having an aspect ratio of up to 2, an average particle size of 10-100 ?m, and a bulk density of 0.8-2 g/cm3, and containing not more than 0.5 wt % of carbon and 3-15 wt % of oxygen is suitable for air plasma spraying. An article having a sprayed coating of rare earth element oxyfluoride has high resistance against plasma etching and a long lifetime.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: October 8, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Yasushi Takai
  • Publication number: 20190264317
    Abstract: An yttrium fluoride spray material contains Y5O4F7 and YF3, and has an average particle size of 10-60 ?m and a bulk density of 1.2-2.5 g/cm3. The Y5O4F7 and YF3 in the yttrium fluoride spray material consist of 30 to 90% by weight of Y5O4F7 and the balance of YF3. A sprayed coating of yttrium oxyfluoride is obtained by atmospheric plasma spraying of the spray material.
    Type: Application
    Filed: May 9, 2019
    Publication date: August 29, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Publication number: 20190264315
    Abstract: An yttrium fluoride spray material contains Y5O4F7 and YF3, and has an average particle size of 10-60 ?m and a bulk density of 1.2-2.5 g/cm3. The Y5O4F7 and YF3 in the yttrium fluoride spray material consist of 30 to 90% by weight of Y5O4F7 and the balance of YF3. A sprayed coating of yttrium oxyfluoride is obtained by atmospheric plasma spraying of the spray material.
    Type: Application
    Filed: May 9, 2019
    Publication date: August 29, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Publication number: 20190264316
    Abstract: An yttrium fluoride spray material contains YO5O4F7 and YF3, and has an average particle size of 10-60 ?m and a bulk density of 1.2-2.5 g/cm3. The Y5O4F7 and YF3 in the yttrium fluoride spray material consist of 30 to 90% by weight of Y5O4F7 and the balance of YF3. A sprayed coating of yttrium oxyfluoride is obtained by atmospheric plasma spraying of the spray material.
    Type: Application
    Filed: May 9, 2019
    Publication date: August 29, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Publication number: 20170292182
    Abstract: An yttrium fluoride sprayed coating having a thickness of 10-500 ?m, an oxygen concentration of 1-6 wt %, and a hardness of 350-470 HV is deposited on a substrate surface. The yttrium fluoride sprayed coating exhibits excellent corrosion resistance in a halogen-base gas atmosphere or halogen-base gas plasma atmosphere, functions to protect the substrate from damage by acid penetration during acid cleaning, and minimizes particle generation from a reaction product and due to spall-off from the coating.
    Type: Application
    Filed: April 5, 2017
    Publication date: October 12, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Yasushi Takai
  • Publication number: 20170253955
    Abstract: An yttrium-base sprayed coating is obtained by thermally spraying yttrium oxide, yttrium fluoride or yttrium oxyfluoride onto a substrate to form a coating of 10-500 ?m thick, and chemically cleaning the coating with a cleaning liquid of organic acid, inorganic acid or a mixture thereof until the population of particles with a size of up to 300 nm becomes no more than 5 particles/mm2 of the coating surface. The yttrium-base sprayed coating exhibits high corrosion resistance even in a halogen gas plasma atmosphere and prevents yttrium-base particles from spalling off during etching treatment.
    Type: Application
    Filed: May 22, 2017
    Publication date: September 7, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Publication number: 20170114440
    Abstract: An yttrium fluoride spray material contains Y5O4F7 and YF3, and has an average particle size of 10-60 ?m and a bulk density of 1.2-2.5 g/cm3. The Y5O4F7 and YF3 in the yttrium fluoride spray material consist of 30 to 90% by weight of Y5O4F7 and the balance of YF3. A sprayed coating of yttrium oxyfluoride is obtained by atmospheric plasma spraying of the spray material.
    Type: Application
    Filed: October 21, 2016
    Publication date: April 27, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Patent number: 9617469
    Abstract: Phosphor particles are provided in the form of spherical polycrystalline secondary particles consisting of a multiplicity of primary particles, including a garnet phase having the compositional formula: (A1-xBx)3C5O12 wherein A is Y, Gd, and/or Lu, B is Ce, Nd, and/or Tb, C is Al and/or Ga, and 0.002?x?0.2, the secondary particles having an average particle size of 5-50 ?m.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: April 11, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Toshihiko Tsukatani, Kazuhiro Wataya, Yasushi Takai, Takehisa Minowa
  • Publication number: 20170029628
    Abstract: An yttrium-base sprayed coating is obtained by thermally spraying yttrium oxide, yttrium fluoride or yttrium oxyfluoride onto a substrate to form a coating of 10-500 ?m thick, and chemically cleaning the coating with a cleaning liquid of organic acid, inorganic acid or a mixture thereof until the population of particles with a size of up to 300 nm becomes no more than 5 particles/mm2 of the coating surface. The yttrium-base sprayed coating exhibits high corrosion resistance even in a halogen gas plasma atmosphere and prevents yttrium-base particles from spalling off during etching treatment.
    Type: Application
    Filed: July 27, 2016
    Publication date: February 2, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Patent number: 9551059
    Abstract: A powder comprising rare earth element fluoride particles having an aspect ratio of up to 2, an average particle size of 10-100 ?m, a bulk density of 0.8-1.5 g/cm3, and a carbon content of 0.1-0.5 wt % is amenable to atmospheric plasma spraying. An article obtained by spraying the rare earth fluoride spray powder to a substrate undergoes few partial color changes and performs well even when used in a halogen gas plasma.
    Type: Grant
    Filed: April 20, 2015
    Date of Patent: January 24, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Takao Maeda, Yasushi Takai
  • Publication number: 20150361540
    Abstract: A spray material comprising rare earth element oxyfluoride particles having an aspect ratio of up to 2, an average particle size of 10-100 ?m, and a bulk density of 0.8-2 g/cm3, and containing not more than 0.5 wt % of carbon and 3-15 wt % of oxygen is suitable for air plasma spraying. An article having a sprayed coating of rare earth element oxyfluoride has high resistance against plasma etching and a long lifetime.
    Type: Application
    Filed: August 24, 2015
    Publication date: December 17, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Yasushi Takai
  • Publication number: 20150225832
    Abstract: A powder comprising rare earth element fluoride particles having an aspect ratio of up to 2, an average particle size of 10-100 ?m, a bulk density of 0.8-1.5 g/cm3, and a carbon content of 0.1-0.5 wt % is amenable to atmospheric plasma spraying. An article obtained by spraying the rare earth fluoride spray powder to a substrate undergoes few partial color changes and performs well even when used in a halogen gas plasma.
    Type: Application
    Filed: April 20, 2015
    Publication date: August 13, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Takao Maeda, Yasushi Takai
  • Patent number: 9090827
    Abstract: A method for manufacturing MAl2O4:Eu,RE type long-lasting phosphor ceramics that is capable of producing the ceramics at a reduced raw material cost. In addition, a sintered product of a long-lasting phosphor having no yellow body color. More specifically, the method for manufacturing MAl2O4:Eu,RE type long-lasting phosphor ceramics in which M is an alkaline earth element and RE is a rare earth element other than europium, involving mixing a BAM (alkaline earth aluminate) phosphor, an alkaline earth compound, an aluminum compound and a rare earth compound to form a mixture, and then firing the mixture; and a white MAl2O4:Eu,RE type long-lasting phosphor resulting from the method.
    Type: Grant
    Filed: February 26, 2010
    Date of Patent: July 28, 2015
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuji Kimura, Yasushi Takai, Hirofumi Kawazoe
  • Publication number: 20150203750
    Abstract: A method for manufacturing MAl2O4:Eu,RE type long-lasting phosphor ceramics that is capable of producing the ceramics at a reduced raw material cost. In addition, a sintered product of a long-lasting phosphor having no yellow body color. More specifically, the method for manufacturing MAl2O4:Eu,RE type long-lasting phosphor ceramics in which M is an alkaline earth element and RE is a rare earth element other than europium, involving mixing a BAM (alkaline earth aluminate) phosphor, an alkaline earth compound, an aluminum compound and a rare earth compound to form a mixture, and then firing the mixture; and a white MAl2O4:Eu,RE type long-lasting phosphor resulting from the method.
    Type: Application
    Filed: March 31, 2015
    Publication date: July 23, 2015
    Applicant: SHIN--ETSU CHEMICAL CO., LTD.
    Inventors: Yuji Kimura, Yasushi Takai, Hirofumi Kawazoe
  • Patent number: 8974696
    Abstract: A complex fluoride A2MF6 wherein M is a tetravalent element Si, Ti, Zr, Hf, Ge or Sn, A is an alkali metal Li, Na, K, Rb or Cs is prepared by providing a first solution containing a fluoride of M, providing a second solution containing a compound of A and/or the compound of A in solid form, mixing the first solution with the second solution and/or the solid for reacting the fluoride of M with the compound of A, and recovering the resulting solid product via solid-liquid separation.
    Type: Grant
    Filed: April 4, 2012
    Date of Patent: March 10, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masami Kaneyoshi, Yasushi Takai
  • Patent number: 8865022
    Abstract: Phosphor particles are provided in the form of spherical polycrystalline secondary particles consisting of a multiplicity of primary particles, including a garnet phase having the composition: (AxByCz)3C5O12 wherein A is Y, Gd, and/or Lu, B is Ce, Nd, and/or Tb, C is Al and/or Ga, and x, y and z are in the range: 0.002<y?0.2, 0<z?2/3, and x+y+z=1. The phosphor particles are prepared by granulating powder oxides containing one or more of the elements A, B, and C, melting the granules in a plasma and solidifying outside the plasma, and heat treating the resulting particles in a non-oxidizing atmosphere at a temperature of higher than 800° C. to 1,700° C.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: October 21, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihiko Tsukatani, Kazuhiro Wataya, Yasushi Takai, Takehisa Minowa
  • Publication number: 20140057078
    Abstract: A spray material comprising rare earth element oxyfluoride particles having an aspect ratio of up to 2, an average particle size of 10-100 ?m, and a bulk density of 0.8-2 g/cm3, and containing not more than 0.5 wt % of carbon and 3-15 wt % of oxygen is suitable for air plasma spraying. An article having a sprayed coating of rare earth element oxyfluoride has high resistance against plasma etching and a long lifetime.
    Type: Application
    Filed: August 21, 2013
    Publication date: February 27, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Yasushi Takai