Abstract: A combustion-type exhaust gas treatment apparatus is used to treat a harmful exhaust gas by combustion to render the gas harmless. The treatment apparatus includes a combustion treatment section, a cooling section, and a washing section. The combustion treatment section includes an exhaust-gas treatment combustor, a body made from metal and having a roughened inner surface, and a water-film formation mechanism adapted to form a water film on the inner surface of the body. The combustion treatment of the exhaust gas is performed in the body.

Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.

Abstract: A combustion-type exhaust gas treatment apparatus is used to treat a harmful exhaust gas by combustion to render the gas harmless. The present invention provides such a combustion-type exhaust gas treatment apparatus. This treatment apparatus includes a combustion treatment section, a cooling section, and a washing section. The combustion treatment section includes an exhaust-gas treatment combustor, a body made from metal and having a roughened inner surface, and a water-film formation mechanism adapted to form a water film on the inner surface of the body. The combustion treatment of the exhaust gas is performed in the body.

Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.

Abstract: The present invention provides a burner for use in a combustion-type waste gas treatment system for combusting waste gases emitted from semiconductor manufacturing system, particularly, a deposition gas containing SiH4 and a halogen-base gas, simultaneously at a high efficiency of destruction, making it difficult for a powder of SiO2 to be attached and deposited, performing a low-NOx combustion, and maintaining a desired level of safety. The combustion-type waste gas treatment system has a flame stabilizing zone (15), which is open toward a combustion chamber (11), surrounded by a peripheral wall (12), and closed by a plate (14) remotely from the combustion chamber. A waste gas, an auxiliary combustible agent, and air are introduced into and mixed with each other in the flame stabilizing zone (15), and the mixed gases are ejected toward the combustion chamber (11) perpendicularly to the plate (14).

Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.

Abstract: A combustion type waste gas treatment system is capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.

Abstract: The present invention provides a burner for use in a combustion-type waste gas treatment system for combusting waste gases emitted from semiconductor manufacturing system, particularly, a deposition gas containing SiH4 and a halogen-base gas, simultaneously at a high efficiency of destruction, making it difficult for a powder of SiO2 to be attached and deposited, performing a low-NOx combustion, and maintaining a desired level of safety. The combustion-type waste gas treatment system has a flame stabilizing zone (15), which is open toward a combustion chamber (11), surrounded by a peripheral wall (12), and closed by a plate (14) remotely from the combustion chamber. A waste gas, an auxiliary combustible agent, and air are introduced into and mixed with each other in the flame stabilizing zone (15), and the mixed gases are ejected toward the combustion chamber (11) perpendicularly to the plate (14).

Abstract: The present invention provides a burner for use in a combustion-type waste gas treatment system for combusting waste gases emitted from semiconductor manufacturing system, particularly, a deposition gas containing SiH4 and a halogen-base gas, simultaneously at a high efficiency of destruction, making it difficult for a powder of SiO2 to be attached and deposited, performing a low-NOx combustion, and maintaining a desired level of safety. The combustion-type waste gas treatment system has a flame stabilizing zone (15), which is open toward a combustion chamber (11), surrounded by a peripheral wall (12), and closed by a plate (14) remotely from the combustion chamber. A waste gas, an auxiliary combustible agent, and air are introduced into and mixed with each other in the flame stabilizing zone (15), and the mixed gases are ejected toward the combustion chamber (11) perpendicularly to the plate (14).

Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous and combustible waste gas under heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion frames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.