Abstract: A photosensitive composition comprises (A) a specific compound, which is excellent in sensitivity, resolution, and defocus latitude (DOF), and a pattern-forming method using the photosensitive composition is provided.

Abstract: A resist composition, includes: (B) a polymer having a group capable of decomposing under an action of an acid and having a weight average molecular weight of 1,000 to 5,000, of which solubility in an alkali developer increases under an action of an acid; and (Z) a compound containing a sulfonium cation having a structure represented by formula (Z-1): wherein Y1 to Y13 each independently represents a hydrogen atom or a substituent, and adjacent members of Y1 to Y13 may combine with each other to form a ring; and Z represents a single bond or a divalent linking group.

Abstract: A positive resist composition containing a compound including a sulfonium cation having a structure represented by the formula (Z-I) as defined herein, a low molecular weight compound which increases solubility in an alkali developing solution by an action of an acid, and a compound which generates a compound having a structure represented by the formula (A-I) as defined herein upon irradiation of an actinic ray or a radiation.

Abstract: The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the resist composition and a pattern forming method using the resist composition, which are a resist composition comprising (A) a sulfonium salt represented by the following formula (I); and a pattern forming method using the resist composition: wherein R1 represents an alkyl group or an aryl group, R2 to R9 each independently represents a hydrogen atom or a substituent and may combine with each other to form a ring, Z represents an electron-withdrawing divalent linking group, Xn? represents an n-valent anion, n represents an integer of 1 to 3, and m represents the number of anions necessary for neutralizing the electric charge.

Abstract: A positive resist composition for electron beam, X-ray or EUV includes (A) a compound represented by the following formula (I), and (B) a resin capable of decomposing by the action of an acid to increase solubility in an alkali developing solution, which includes a repeating unit represented by the following formula (II) and a repeating unit represented by the following formula (III):

Abstract: A resist composition includes (A) a compound represented by the following formula (I): wherein each of R1 to R13 independently represents a hydrogen atom or a substituent, provided that at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X? represents an anion containing a proton acceptor functional group.

Abstract: A resist composition, includes: (B) a polymer having a group capable of decomposing under an action of an acid and having a weight average molecular weight of 1,000 to 5,000, of which solubility in an alkali developer increases under an action of an acid; and (Z) a compound containing a sulfonium cation having a structure represented by formula (Z-1): wherein Y1 to Y13 each independently represents a hydrogen atom or a substituent, and adjacent members of Y1 to Y13 may combine with each other to form a ring; and Z represents a single bond or a divalent linking group.

Abstract: A photosensitive composition includes (A) a compound represented by the following formula (I): wherein R1 to R13 each independently represents a hydrogen atom or a substituent, Z represents a single bond or a divalent linking group, and X? represents an anion containing a proton acceptor functional group.

Abstract: A positive resist composition containing a compound including a sulfonium cation having a structure represented by the formula (Z-I) as defined herein, a low molecular weight compound which increases solubility in an alkali developing solution by an action of an acid, and a compound which generates a compound having a structure represented by the formula (A-I) as defined herein upon irradiation of an actinic ray or a radiation.

Abstract: A sulfonium salt is provided that has a cation represented by Formula (II) (R1? to R13? in Formula (II) independently denote a hydrogen atom or a substituent, and may be bonded to each other to form a ring, provided that at least one of R1? to R8? denotes a halogen atom or a haloalkyl group). There are also provided a curable composition that includes the sulfonium salt, and an ink composition that includes the curabie composition. Furthermore, there are also provided an inkjet recording method employing the ink composition, and a process for producing a lithographic printing plate, the process including discharging the ink composition onto a hydrophilic support. A printed material and a lithographic printing plate thus obtained are also included in the present invention.

Abstract: A photosensitive composition, which comprises a compound represented by formula (I): wherein R1 to R13 each independently represents a hydrogen atom or a substituent, and at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X? represents a counter anion; and a pattern-forming method using the photosensitive composition.

Abstract: A positive resist composition comprising: a compound having at least two acid-decomposable groups, an aromatic ring and an alkylene or cycloalkylene chain and having a molecular weight of 2,000 or less, of which solubility in an alkali developer increases under an action of an acid; and a compound represented by the formula (B-1) as defined herein, which generates an acid upon irradiation with actinic rays or radiation.

Abstract: A high-sensitivity silver halide photographic light-sensitive material is provided, which is a silver halide photographic light-sensitive material, in which a dye chromophore is adsorbed in multiple layers on the surface of a silver halide grain and at least one of the dye chromophore-containing compounds satisfies: a specific condition relating to the aggregation property, hydrophilicity/hydrophobicity or J-aggregation property; or a specific structure.

Abstract: A photosensitive composition comprises (A) a specific compound, which is excellent in sensitivity, resolution, and defocus latitude (DOF), and a pattern-forming method using the photosensitive composition is provided.

Abstract: The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the resist composition and a pattern forming method using the resist composition, which are a resist composition comprising (A) a sulfonium salt represented by the following formula (I); and a pattern forming method using the resist composition: wherein R1 represents an alkyl group or an aryl group, R2 to R9 each independently represents a hydrogen atom or a substituent and may combine with each other to form a ring, Z represents an electron-withdrawing divalent linking group, Xn? represents an n-valent anion, n represents an integer of 1 to 3, and m represents the number of anions necessary for neutralizing the electric charge.

Abstract: A high-sensitivity silver halide photographic light-sensitive material is provided, which is a silver halide photographic light-sensitive material, in which a dye chromophore is adsorbed in multiple layers on the surface of a silver halide grain and at least one of the dye chromophore-containing compounds satisfies: a specific condition relating to the aggregation property, hydrophilicity/hydrophobicity or J-aggregation property; or a specific structure.

Abstract: Disclosed are a silver halide photographic light-sensitive material comprising silver halide containing a metal complex having a cyanide ligand in a silver halide emulsion layer and comprising a hydrazine compound having an onium group in the molecule, and a method of developing the silver halide photographic light-sensitive material with a developer having a pH of 9.0-11.0. The silver halide photographic light-sensitive material of the present invention can provide high sensitivity, high processing stability and high contrast images.

Abstract: Disclosed are a silver halide photographic light-sensitive material comprising silver halide containing a metal complex having a cyanide ligand in a silver halide emulsion layer and comprising a hydrazine compound having an onium group in the molecule, and a method of developing the silver halide photographic light-sensitive material with a developer having a pH of 9.0-11.0. The silver halide photographic light-sensitive material of the present invention can provide high sensitivity, high processing stability and high contrast images.