Patents by Inventor Yasuyuki Matsumoto

Yasuyuki Matsumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150132031
    Abstract: A developing roller that is capable of carrying toner on a surface thereof, and that supplies the toner carried on the surface to a surface of a photosensitive drum when a voltage is applied thereto, includes: a rubber layer; and a surface layer that covers the rubber layer, contains alumina, and has a higher volume resistivity than the rubber layer.
    Type: Application
    Filed: November 4, 2014
    Publication date: May 14, 2015
    Inventors: Kazunari Hagiwara, Tatsuaki Orihara, Shuhei Tokiwa, Yasuyuki Matsumoto, Naoki Fuei, Makoto Fukatsu, Yoshikuni Ito
  • Patent number: 9021873
    Abstract: A brake abnormality diagnosis device which diagnoses an abnormality in a brake of a brake-equipped motor provided in a robot or a machine tool, includes: an abnormality diagnosis unit which performs a diagnosis as to whether or not there is an abnormality in the brake, while the motor is excited and the brake is activated; and an output unit which, if it is diagnosed that there is an abnormality in the brake, notifies the abnormality in the brake without interrupting the excitation of the motor and without releasing the brake.
    Type: Grant
    Filed: May 6, 2013
    Date of Patent: May 5, 2015
    Assignee: Fanuc Corporation
    Inventors: Tsutomu Shikagawa, Yasuyuki Matsumoto
  • Patent number: 8847539
    Abstract: A servomotor drive device has a first converter, a regenerative resistor circuit having a first switching element and a regenerative resistor, a first connection part configured to connect a second converter in parallel to the regenerative resistor circuit in an attachable and detachable manner, and a first control unit configured to control the on and off states of the first switching element. The second converter has a second switching unit and a second control unit configured to return regenerative energy to an AC power source side by bringing the second switching element into the on state when the second converter is connected to the first connection part.
    Type: Grant
    Filed: October 25, 2012
    Date of Patent: September 30, 2014
    Assignee: FANUC Corporation
    Inventors: Naoyuki Suzuki, Yasuyuki Matsumoto
  • Patent number: 8757777
    Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
    Type: Grant
    Filed: August 22, 2013
    Date of Patent: June 24, 2014
    Assignee: Seiko Epson Corporation
    Inventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
  • Publication number: 20140125149
    Abstract: A diode includes an anode connected to the other ends of brake coils, and a cathode connected to one end of a smoothing capacitor. A diode includes an anode connected to the other end of the smoothing capacitor, and a cathode connected to one ends of the brake coils. By providing the diodes, energy stored in the brake coils, when at least one of an NPN type transistor and an NPN type transistor is in an on-state, is returned to the smoothing capacitor when the NPN type transistors are in an off-states.
    Type: Application
    Filed: November 8, 2013
    Publication date: May 8, 2014
    Applicant: FANUC CORPORATION
    Inventors: Yasuyuki MATSUMOTO, Naoyuki SUZUKI
  • Publication number: 20140060982
    Abstract: A first switching element is connected to one end of a brake and switches from the off state to the on state when a switch command is input to cause a brake drive current to flow through the brake. A second switching element is connected to the other end of the brake and switches from the off state to the on state when the switch command is input to cause a brake drive current to flow through the brake. A voltage detection unit detects a brake voltage being applied to the brake. A switch command delay unit delays the switch command input to the first switching element. A short circuit determination unit determines whether or not a short circuit has occurred in the first switching element based on the brake voltage and the switch command delayed by the switch command delay unit.
    Type: Application
    Filed: September 5, 2013
    Publication date: March 6, 2014
    Applicant: FANUC CORPORATION
    Inventors: Yasuyuki MATSUMOTO, Tsutomu SHIKAGAWA
  • Publication number: 20140000355
    Abstract: A brake abnormality diagnosis device which diagnoses an abnormality in a brake of a brake-equipped motor provided in a robot or a machine tool, includes: an abnormality diagnosis unit which performs a diagnosis as to whether or not there is an abnormality in the brake, while the motor is excited and the brake is activated; and an output unit which, if it is diagnosed that there is an abnormality in the brake, notifies the abnormality in the brake without interrupting the excitation of the motor and without releasing the brake.
    Type: Application
    Filed: May 6, 2013
    Publication date: January 2, 2014
    Applicant: FANUC CORPORATION
    Inventors: Tsutomu SHIKAGAWA, Yasuyuki MATSUMOTO
  • Publication number: 20130335485
    Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
    Type: Application
    Filed: August 22, 2013
    Publication date: December 19, 2013
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Akira MATSUZAWA, Mutsuhiko OTA, Tetsushi TAKAHASHI, Yasuyuki MATSUMOTO
  • Publication number: 20130276277
    Abstract: A liquid ejection apparatus manufacturing method includes forming a metallic film in at least the section to be cut of a bonding surface between the flow path forming substrate (a second substrate) and the protection substrate (a first substrate); forming a first fragile section on the protection substrate by irradiating the section to be cut of the protection substrate bonded to the flow path forming substrate from the protection substrate side with a laser beam whose condensing point is focused thereon, and forming a second fragile section on the flow path forming substrate by melting the metallic film of the section to be cut; and dividing the protection substrate and the flow path forming substrate bonded to each other along the first fragile section and the second fragile section.
    Type: Application
    Filed: March 25, 2013
    Publication date: October 24, 2013
    Applicant: SEIKO EPSON CORPORATION
    Inventor: Yasuyuki MATSUMOTO
  • Patent number: 8534800
    Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: September 17, 2013
    Assignee: Seiko Epson Corporation
    Inventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
  • Patent number: 8460948
    Abstract: A method for manufacturing an ink jet recording head is employed which has a metal mask formation process for forming a metal mask having a predetermined shape containing a silicide film formed by silicidation of the surface of a flow path forming substrate wafer containing a silicon substrate and a liquid flow path formation process for forming a liquid flow path by anisotropically etching the flow path forming substrate wafer using the metal mask as a mask.
    Type: Grant
    Filed: April 3, 2012
    Date of Patent: June 11, 2013
    Assignee: Seiko Epson Corporation
    Inventor: Yasuyuki Matsumoto
  • Patent number: 8342656
    Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
    Type: Grant
    Filed: November 18, 2011
    Date of Patent: January 1, 2013
    Assignee: Seiko Epson Corporation
    Inventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
  • Publication number: 20120258556
    Abstract: A method for manufacturing an ink jet recording head is employed which has a metal mask formation process for forming a metal mask having a predetermined shape containing a silicide film formed by silicidation of the surface of a flow path forming substrate wafer containing a silicon substrate and a liquid flow path formation process for forming a liquid flow path by anisotropically etching the flow path forming substrate wafer using the metal mask as a mask.
    Type: Application
    Filed: April 3, 2012
    Publication date: October 11, 2012
    Applicant: SEIKO EPSON CORPORATION
    Inventor: Yasuyuki MATSUMOTO
  • Patent number: 8152281
    Abstract: A liquid ejecting head including a first base member in which a plurality of pressure generating chambers communicating with nozzle openings and a series of partition walls are arranged in parallel, a second base member disposed on the first base member, a reservoir serving as a common liquid chamber for the pressure generating chambers, and an adhesive agent adhered to a first angular portion formed in an end portion of the partition walls near the reservoir which is adjacent to the second base member.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: April 10, 2012
    Assignee: Seiko Epson Corporation
    Inventor: Yasuyuki Matsumoto
  • Publication number: 20120062655
    Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
    Type: Application
    Filed: November 18, 2011
    Publication date: March 15, 2012
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Akira MATSUZAWA, Mutsuhiko OTA, Tetsushi TAKAHASHI, Yasuyuki MATSUMOTO
  • Patent number: 8061813
    Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
    Type: Grant
    Filed: September 12, 2007
    Date of Patent: November 22, 2011
    Assignee: Seiko Epson Corporation
    Inventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
  • Patent number: 7789495
    Abstract: A liquid ejection head including: a flow-channel forming substrate having a pressure generating chamber which communicates with a liquid supply channel which communicates with one end of the pressure generating chamber in terms of a first direction so as to have a first length for supplying liquid to the pressure generating chamber; and a pressure generating unit that causes the change in pressure in the pressure generating chamber, wherein the liquid supply channel is formed by narrowing the width of the pressure generating chamber in a second direction substantially perpendicular to the first direction so as to have a second length shorter than the first length, a stepped surface is formed between the side surface of the pressure generating chamber in the second direction and the side surface of the liquid supply channel in the second direction, and wherein a bridge is provided at a corner defined by the stepped surface, the side surface of the pressure generating chamber in the second direction on the step
    Type: Grant
    Filed: July 31, 2007
    Date of Patent: September 7, 2010
    Assignee: Seiko Epson Corporation
    Inventors: Yasuyuki Matsumoto, Tetsushi Takahashi, Akira Matsuzawa
  • Publication number: 20100156999
    Abstract: A liquid ejecting head including a first base member in which a plurality of pressure generating chambers communicating with nozzle openings and a series of partition walls are arranged in parallel, a second base member disposed on the first base member, a reservoir serving as a common liquid chamber for the pressure generating chambers, and an adhesive agent adhered to a first angular portion formed in an end portion of the partition walls near the reservoir which is adjacent to the second base member.
    Type: Application
    Filed: December 11, 2009
    Publication date: June 24, 2010
    Applicant: SEIKO EPSON CORPORATION
    Inventor: Yasuyuki MATSUMOTO
  • Patent number: 7587922
    Abstract: A hemming machine is provided with a frame, a hemming tool support structure and a swinging drive structure. The hemming tool support structure is rotatably coupled to the frame to rotate about a center rotation axis. The hemming tool support structure includes a hemming tool disposed at a first location such that the hemming tool moves towards and away from an edge part of a workpiece that is supported on a die upon rotation of the hemming tool support structure. The swinging drive structure transmits a rotational driving force to the hemming tool support structure via a releasable connection located on a side of the center rotation axis that is opposite of the hemming tool. The releasable connection is configured to release the swinging drive structure to allow further rotational movement of the hemming tool away from the die.
    Type: Grant
    Filed: February 12, 2007
    Date of Patent: September 15, 2009
    Assignee: Nissan Motor Co., Ltd.
    Inventor: Yasuyuki Matsumoto
  • Publication number: 20090181329
    Abstract: When a liquid passage is formed by etching a passage forming substrate by using a protective film formed on the surface of the passage forming substrate, there are provided a first step of forming the protective film, as a process of forming the protective film having a predetermined pattern, a second step of forming a resist film by applying a positive resist on the protective film and subjecting the positive resist to pre-baking, a third step of selectively removing the resist film by selectively exposing and developing the resist, a fourth step of selectively removing the protective film by performing dry etching at a temperature equal to or lower than a temperature at which the pre-baking is performed, a fifth step of removing a degeneration layer formed on the surface of the resist film in the third step, and a sixth step of removing the resist film by again exposing and developing the resist film.
    Type: Application
    Filed: January 8, 2009
    Publication date: July 16, 2009
    Applicant: SEIKO EPSON CORPORATION
    Inventor: Yasuyuki Matsumoto