Patents by Inventor Yasuyuki Sano

Yasuyuki Sano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of Production of a thin film type semiconductor device having a heat-retaining layer
    Patent number: 6767773
    Abstract: An operating semiconductor layer is formed in such a manner that amorphous silicon layer is formed to be shaped so that it has a wide region and a narrow region and the narrow region is connected to the wide region at a position asymmetric to the wide region, and the amorphous silicon layer is crystallized by scanning a CW laser beam from the wide region toward the narrow region in a state that a polycrystalline silicon layer as a heat-retaining layer encloses the narrow region from a side face through the silicon oxide layer.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: July 27, 2004
    Assignee: Fujitsu Limited
    Inventors: Yasuyuki Sano, Akito Hara, Michiko Takei, Nobuo Sasaki
  • Semiconductor device and method of production thereof
    Publication number: 20030042486
    Abstract: An operating semiconductor layer is formed in such a manner that amorphous silicon layer is formed to be shaped so that it has a wide region and a narrow region and the narrow region is connected to the wide region at a position asymmetric to the wide region, and the amorphous silicon layer is crystallized by scanning a CW laser beam from the wide region toward the narrow region in a state that a polycrystalline silicon layer as a heat-retaining layer encloses the narrow region from a side face through the silicon oxide layer.
    Type: Application
    Filed: August 29, 2002
    Publication date: March 6, 2003
    Applicant: FUJITSU LIMITED
    Inventors: Yasuyuki Sano, Akito Hara, Michiko Takei, Nobuo Sasaki
  • Photopolymerizable type resin compositions for dental purposes
    Patent number: 5063255
    Abstract: A dental photopolymerizable type resin composition is provided, which comprises (a) a photopolymerizable compound that has therein at least one ethylenically unsaturated double bond and is a solid either crystalline or amorphous at 40.degree. C. or lower, (b) an inorganic filler, (c) a photopolymerization initiator, and (d) a reducing agent. That compound may be a mono- or poly-functional (meth)acrylate.
    Type: Grant
    Filed: November 1, 1989
    Date of Patent: November 5, 1991
    Assignee: G-C Toshi Kogyo Corporation
    Inventors: Akira Hasegawa, Hiroshi Mori, Tatsuhiko Takahashi, Yasuyuki Sano