Patents by Inventor Yataro Kondo

Yataro Kondo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4480910
    Abstract: There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).
    Type: Grant
    Filed: March 15, 1982
    Date of Patent: November 6, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Akihiro Takanashi, Tatsuo Harada, Masamoto Akeyama, Yataro Kondo, Toshiei Kurosaki, Shinji Kuniyoshi, Sumio Hosaka, Yoshio Kawamura