Patents by Inventor Yaw-Shun Hong

Yaw-Shun Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6815519
    Abstract: The present invention discloses an acidic fluorine-containing hybrid having a uniform distribution of an organic and an inorganic components prepared by a sol-gel process. The organic component is a fluorine-containing poly(siloxane amideimide) having a good processing ability, gas permeability, mechanical properties, and chemical stability. The inorganic component is silica having good heat resistance and moisture resistance. The hybrid has excellent properties, such as a good film formation property, a high gas selectivity, a low dielectric constant, a good resistance to scraping, and a good transparency, etc., and can be used in making industrial products, such as gas detection films, sensors, encapsulation material, photoelectrical communication material, and biomedical material, etc.
    Type: Grant
    Filed: March 22, 2002
    Date of Patent: November 9, 2004
    Assignee: Chung-Shan Institute of Science & Technology
    Inventors: Yie-Shun Chiu, Hsing-Tsai Huang, Te-Chuan Chang, Gaw-Pying Wang, Yaw-Shun Hong
  • Publication number: 20030181622
    Abstract: The present invention discloses an acidic fluorine-containing hybrid having a uniform distribution of an organic and an inorganic components prepared by a sol-gel process. The organic component is a fluorine-containing poly(siloxane amideimide) having a good processing ability, gas permeability, mechanical properties, and chemical stability. The inorganic component is silica having good heat resistance and moisture resistance. The hybrid has excellent properties, such as a good film formation property, a high gas selectivity, a low dielectric constant, a good resistance to scraping, and a good transparency, etc., and can be used in making industrial products, such as gas detection films, sensors, encapsulation material, photoelectrical communication material, and biomedical material, etc.
    Type: Application
    Filed: March 22, 2002
    Publication date: September 25, 2003
    Applicant: Chung-Shan Institute of Science & Technology
    Inventors: Yie-Shun Chiu, Hsing-Tsai Huang, Te-Chuan Chang, Gaw-Pying Wang, Yaw-Shun Hong
  • Patent number: 6566456
    Abstract: In the present invention, vinylimidazole and [3-(methacryloxy)propyl]trimethoxysilane are copolymerized to form a modified polyvinylimidazole, which then undergoes hydrolysis and condensation reactions with water and tetramethoxysilane to prepare a hybrid of polyvinylimidazole and silica. Experimental analyses show that covalent bondings exist between the modified polyvinylimidazole and silica in the hybrid.
    Type: Grant
    Filed: November 3, 2000
    Date of Patent: May 20, 2003
    Assignee: Chung-Shan Institute of Science & Technology
    Inventors: Jeng-Cheng Yang, Yaw-Shun Hong, Te-Chuan Chang, Yu-Tan Wang