Patents by Inventor Ye Ji SHIN

Ye Ji SHIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11978400
    Abstract: The present disclosure provides a technology for converting, into digital data, a sensing signal sensed from each pixel of a display panel and compensating for differences between LED elements.
    Type: Grant
    Filed: December 1, 2022
    Date of Patent: May 7, 2024
    Assignee: LX SEMICON CO., LTD.
    Inventors: Jun Young Shin, Ye Ji Lee, Min Young Jeong, Jung Bae Yun
  • Patent number: 10784082
    Abstract: Disclosed is an inductively-coupled plasma-generating device including: a first power supply for supplying high frequency power; a second power supply for supplying low frequency power; a single coil-based plasma source including at least two antennas which comprise a first antenna having one end as a grounded end and the other end, wherein the first power supply is connected to the first antenna at a point thereof adjacent to the grounded end to receive the high frequency power; and a second antenna surrounded by the first antenna, wherein the second antenna has one end connected to the first antenna and the other end as a low frequency power receiving end connected to the second power supply; and a gas supply for supplying a gas, wherein the gas is excited into plasma by the single coil-based plasma source.
    Type: Grant
    Filed: February 14, 2019
    Date of Patent: September 22, 2020
    Assignee: Research & Business Foundation Sungkyunkwan University
    Inventors: Geun Young Yeom, Kyung Chae Yang, Hyun Woo Tak, Ye Ji Shin, Da In Sung
  • Patent number: 10712317
    Abstract: The present disclosure relates to an apparatus for detecting a defect and a method for detecting a defect using the same, and more particularly, to an apparatus for detecting a defect and a method for detecting a defect using the same for detecting a defect inside an inspection object without destructing the inspection object. An apparatus for detecting a defect according to an embodiment of the present invention includes a first probe unit configured to transmit a signal into an inspection object and receive a signal generated inside the inspection object, a second probe unit separately installed from the first probe unit and configured to receive the signal generated inside the inspection object, and a position determining unit configured to detect a defect position inside the inspection object using the signal received by the first probe unit and the signal received by the second probe unit.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: July 14, 2020
    Inventors: Dong Hwan Shin, Ye Ji Shin, Seung Eun Cha
  • Publication number: 20200011836
    Abstract: The present disclosure relates to an apparatus for detecting a defect and a method for detecting a defect using the same, and more particularly, to an apparatus for detecting a defect and a method for detecting a defect using the same for detecting a defect inside an inspection object without destructing the inspection object. An apparatus for detecting a defect according to an embodiment of the present invention includes a first probe unit configured to transmit a signal into an inspection object and receive a signal generated inside the inspection object, a second probe unit separately installed from the first probe unit and configured to receive the signal generated inside the inspection object, and a position determining unit configured to detect a defect position inside the inspection object using the signal received by the first probe unit and the signal received by the second probe unit.
    Type: Application
    Filed: August 8, 2017
    Publication date: January 9, 2020
    Inventors: Dong Hwan SHIN, Ye Ji SHIN, Seung Eun CHA
  • Publication number: 20190252153
    Abstract: Disclosed is an inductively-coupled plasma-generating device including: a first power supply for supplying high frequency power; a second power supply for supplying low frequency power; a single coil-based plasma source including at least two antennas which comprise a first antenna having one end as a grounded end and the other end, wherein the first power supply is connected to the first antenna at a point thereof adjacent to the grounded end to receive the high frequency power; and a second antenna surrounded by the first antenna, wherein the second antenna has one end connected to the first antenna and the other end as a low frequency power receiving end connected to the second power supply; and a gas supply for supplying a gas, wherein the gas is excited into plasma by the single coil-based plasma source.
    Type: Application
    Filed: February 14, 2019
    Publication date: August 15, 2019
    Applicant: Research & Business Foundation Sungkyunkwan University
    Inventors: Geun Young YEOM, Kyung Chae YANG, Hyun Woo Tak, Ye Ji SHIN, Da In SUNG