Patents by Inventor Yehiel Kapoano

Yehiel Kapoano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for multiple mode inspection of a sample
    Patent number: 10295476
    Abstract: A system and method for multiple mode inspection of a sample. The system includes a radiation source, an objective lens, a bright field detection module, a dark field detection module and optics. The optics, when the system operates at a first mode, is configured to direct the input beam through a first opening, without substantially blocking any part of the input beam, towards a first region of the objective lens. The optics, when the system operates at a second mode, is configured to direct the input beam through a second opening, without substantially blocking any part of the input beam, towards a second region of the objective lens. The first region of the objective lens differs from the second region of the objective lens.
    Type: Grant
    Filed: August 14, 2018
    Date of Patent: May 21, 2019
    Assignee: Applied Materials Israel Ltd.
    Inventors: Binyamin Kirshner, Yehiel Kapoano