Abstract: A semiconductor device and a method of forming the same is disclosed. The semiconductor device includes a substrate, a first well region disposed within the substrate, a second well region disposed adjacent to the first well region and within the substrate, and an array of well regions disposed within the first well region. The first well region includes a first type of dopants, the second well region includes a second type of dopants that is different from the first type of dopants, and the array of well regions include the second type of dopants. The semiconductor device further includes a metal silicide layer disposed on the array of well regions and within the substrate, a metal silicide nitride layer disposed on the metal silicide layer and within the substrate, and a contact structure disposed on the metal silicide nitride layer.

Abstract: A structure of Vertical Cavity Surface-Emitting Laser (VCSEL) comprises an ion-implanted region with gas-furnace configuration arranged in the second mirror layer around a laser light output window, in order to retain several conductive passages between the inner and outer rims of the ion-implanted region, so as to let the aperture of the inner rim of the metal layer (that is, the aperture of the output window) be expanded without loss of resistance. Not only the shading effect can be removed, the spectrum width suppression function can be preserved, but also various photoelectric characteristics such as transmission eye diagram and photoelectric curve linearity can be improved, in addition, high-speed transmission characteristics can also be optimized.

Abstract: A structure of Vertical Cavity Surface-Emitting Laser (VCSEL) comprises an ion-implanted region with gas-furnace configuration arranged in the second mirror layer around a laser light output window, in order to retain several conductive passages between the inner and outer rims of the ion-implanted region, so as to let the aperture of the inner rim of the metal layer (that is, the aperture of the output window) be expanded without loss of resistance. Not only the shading effect can be removed, the spectrum width suppression function can be preserved, but also various photoelectric characteristics such as transmission eye diagram and photoelectric curve linearity can be improved, in addition, high-speed transmission characteristics can also be optimized.

Abstract: The present invention changes layer polarities of an epitaxy structure of an avalanche photodiode into n-i-n-i-p. A transport layer is deposed above an absorption layer to prevent absorbing photon and producing electrons and holes. A major part of electric field is concentrated on a multiplication layer for producing avalanche and a minor part of the electric field is left on the absorption layer for transferring carrier without avalanche. Thus, bandwidth limit from a conflict between RC bandwidth and carrier transferring time is relieved. Meanwhile, active area is enlarged and alignment error is improved without sacrificing component velocity too much.

Abstract: The present invention changes layer polarities of an epitaxy structure of an avalanche photodiode into n-i-n-i-p. A transport layer is deposed above an absorption layer to prevent absorbing photon and producing electrons and holes. A major part of electric field is concentrated on a multiplication layer for producing avalanche and a minor part of the electric field is left on the absorption layer for transferring carrier without avalanche. Thus, bandwidth limit from a conflict between RC bandwidth and carrier transferring time is relieved. Meanwhile, active area is enlarged and alignment error is improved without sacrificing component velocity too much.

Abstract: The present invention with a structure of depletion region improves the product of output power and bandwidth of a photodetector and prevents the drifting velocity of electron from slowing down under a bias, which can be applied to a photodetector of communicative wavelength over optical fiber.