Abstract: The disclosed techniques include a space filling device to be used with a wet bench in chemical replacement procedures. The space filling device has an overall density that is higher than the chemicals used to purge the wet bench. As such, when embedded into the wet bench, or more specifically, the chemical tank of the wet bench, the space filling device will occupy a portion of the interior volume space. As a result, less purging chemicals are used to fill and bath the wet bench.

Abstract: A Faraday shield, a semiconductor processing apparatus, and an etching apparatus are provided. The Faraday shield includes a plurality of conductive slices and a spacer interposed between adjacent two of the conductive slices to electrically isolate the adjacent two of conductive slices from one another. The conductive slices are separately arranged aside one another and oriented along a circumference of the Faraday shield. A coil is wound around the circumference of the Faraday shield.

Abstract: The disclosed techniques include a space filling device to be used with a wet bench in chemical replacement procedures. The space filling device has an overall density that is higher than the chemicals used to purge the wet bench. As such, when embedded into the wet bench, or more specifically, the chemical tank of the wet bench, the space filling device will occupy a portion of the interior volume space. As a result, less purging chemicals are used to fill and bath the wet bench.

Abstract: The disclosed techniques include a space filling device to be used with a wet bench in chemical replacement procedures. The space filling device has an overall density that is higher than the chemicals used to purge the wet bench. As such, when embedded into the wet bench, or more specifically, the chemical tank of the wet bench, the space filling device will occupy a portion of the interior volume space. As a result, less purging chemicals are used to fill and bath the wet bench.

Abstract: The disclosed techniques include a space filling device to be used with a wet bench in chemical replacement procedures. The space filling device has an overall density that is higher than the chemicals used to purge the wet bench. As such, when embedded into the wet bench, or more specifically, the chemical tank of the wet bench, the space filling device will occupy a portion of the interior volume space. As a result, less purging chemicals are used to fill and bath the wet bench.

Abstract: A slit door assembly includes a door plate, a supporting arm including a first end coupled to the door plate and a second end away from the first end, and a linkage unit including a rod member and a pin member protruding from the rod member and connecting to the second end of the supporting arm. A fillet is disposed between the pin member and the rod member. A method of operating a slit door assembly includes receiving a door plate, receiving a supporting arm coupled to the door plate, and coupling a linkage unit to the supporting arm, wherein the linkage unit includes a pin member and a rod member, the pin member is protrudes from the rod member and having a fillet. The method further includes applying a first force to the linkage unit to move the door plate from a first position to a second position.

Abstract: A slit door assembly includes a door plate; a supporting arm including a first end coupled to the door plate and a second end away from the first end; and a linkage unit including a rod member and a pin member protruding from the rod member and connecting to the second end of the supporting arm. A fillet is disposed between the pin member and the rod member. A method of operating a slit door assembly includes receiving a door plate; receiving a supporting arm coupled to the door plate; and coupling a linkage unit to the supporting arm, wherein the linkage unit includes a pin member and a rod member, the pin member is protrudes from the rod member and having a fillet. The method further includes applying a first force to the linkage unit to move the door plate from a first position to a second position.

Abstract: A Faraday shield, a semiconductor processing apparatus, and an etching apparatus are provided. The Faraday shield includes a plurality of conductive slices and a spacer interposed between adjacent two of the conductive slices to electrically isolate the adjacent two of conductive slices from one another. The conductive slices are separately arranged aside one another and oriented along a circumference of the Faraday shield. A coil is wound around the circumference of the Faraday shield.

Abstract: The disclosed techniques include a space filling device to be used with a wet bench in chemical replacement procedures. The space filling device has an overall density that is higher than the chemicals used to purge the wet bench. As such, when embedded into the wet bench, or more specifically, the chemical tank of the wet bench, the space filling device will occupy a portion of the interior volume space. As a result, less purging chemicals are used to fill and bath the wet bench.