Patents by Inventor Yeon-Heui Nam

Yeon-Heui Nam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist composition, method for forming resist pattern using the same, array substrate fabricated using the same and method of fabricating the array substrate
    Publication number: 20070246441
    Abstract: A resist composition used for the imprint lithography process, a method for forming resist pattern using the same, an array substrate manufactured using the same, and method of fabricating the array substrate includes an additive and the adhesion promoter inducing the chemical bond of the base layer contacting to the UV curable resin. As a result, it is possible for the resist composition to form a high-resolution pattern and to improve the durability of the mold for molding a UV curable resin.
    Type: Application
    Filed: April 23, 2007
    Publication date: October 25, 2007
    Inventors: Jin Wuk Kim, Yeon Heui Nam