Abstract: A cryogenic dynamic cooling apparatus and a cooling method for heat assisted magnetic recording media substrate are provided. The cooling apparatus includes a chamber that is configured to receive a substrate. A substrate holder secures the substrate inside the chamber. The apparatus has a cooling plate that is movable between a retracted position and an extended position inside the chamber. The cooling plate provides clearance for movement of the substrate holder inside the chamber in the retracted position, and the cooling plate cools the substrate in the extended position. Also, the cooling plate is substantially parallel to and spaced apart from the substrate. The apparatus further includes a cryogenic operatively coupled to the cooling plate that is cooled by the cryogenic cooling element.

Abstract: Aspects of the present invention are directed to a cryogenic dynamic cooling apparatus and a cooling method for heat assisted magnetic recording media substrate. The cooling apparatus includes a chamber that is configured to receive a substrate. A substrate holder secures the substrate inside the chamber. The apparatus has a cooling plate that is movable between a retracted position and an extended position inside the chamber. The cooling plate provides clearance for movement of the substrate holder inside the chamber in the retracted position, and the cooling plate cools the substrate in the extended position. Also, the cooling plate is substantially parallel to and spaced apart from the substrate. The apparatus further includes a cryogenic cooling element operatively coupled to the cooling plate that is cooled by the cryogenic cooling element.

Abstract: Various embodiments provide a substrate carrier configured to rotatably carry at least one substrate through a plurality of processing stations. The substrate carrier includes an integrated heater for heating a first side of the substrate while the second side of the substrate undergoes one or more manufacturing processes at each of the plurality of processing stations, e.g., to promote the desired growth of HAMR media. This can result in the elimination of one or more processing stations, thereby realizing cost savings, decreased substrate processing time, as well as a reduced area within which a substrate processing system can be implemented.

Abstract: A processing system for and a method of producing ions inside a process chamber and shielding the ions from a magnetic field by directing the magnetic field through a magnet keeper is described.

Abstract: Systems and methods for uniformly implanting materials on substrates using directed magnetic fields are provided. One such system includes a chamber configured to receive a preselected material and to enclose a first substrate, first and second rotating assemblies configured to facilitate an implantation of the preselected material onto first and second surfaces of the first substrate and including first and second rotating magnet sub-assemblies configured to direct magnetic fields onto the first and second surfaces, and an RF energizer configured to apply RF energy to the first substrate, where the first magnetic field and the second magnetic field combine to form a resultant magnetic field that is substantially parallel along the first surface, and where the implantation of the preselected material onto the first substrate occurs based on a combination of the RF energy and the resultant magnetic field.

Abstract: A disk processing system with a load chamber having a stationary heater and a movable heater.