Patents by Inventor Yi-Chiuan Luo

Yi-Chiuan Luo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for e-beam writing
    Patent number: 9367661
    Abstract: A method of preparing mask data, the method begins with performing a logic operation to a design layout, and an optical proximity correction (OPC) is performed to the design layout to form an OPC feature. The OPC feature has a first jog and a second jog on a line, and the first jog is larger than the second jog in width. The OPC feature is resized to form a resized first jog and a resized second jog on the line if a width ratio of the first jog to the second jog being smaller than a predetermined value.
    Type: Grant
    Filed: September 4, 2014
    Date of Patent: June 14, 2016
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Jia-Guei Jou, Yi-Chiuan Luo, Chih-Chung Huang, Chi-Ming Tsai, Chih-Chiang Tu
  • APPARATUS AND METHOD FOR E-BEAM WRITING
    Publication number: 20160070843
    Abstract: A method of preparing mask data, the method begins with performing a logic operation to a design layout, and an optical proximity correction (OPC) is performed to the design layout to form an OPC feature. The OPC feature has a first jog and a second jog on a line, and the first jog is larger than the second jog in width. The OPC feature is resized to form a resized first jog and a resized second jog on the line if a width ratio of the first jog to the second jog being smaller than a predetermined value.
    Type: Application
    Filed: September 4, 2014
    Publication date: March 10, 2016
    Inventors: Jia-Guei JOU, Yi-Chiuan Luo, Chih-Chung Huang, Chi-Ming Tsai, Chih-Chiang Tu