Patents by Inventor Yi-Chung LAI

Yi-Chung LAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of fabricating a substrate with metal reflection layer
    Patent number: 11979980
    Abstract: A first and second patterned circuit layer are formed on a first surface and a second surface of a base material. A first adhesive layer is formed on the first patterned circuit layer. A portion of the first surface is exposed by the first patterned circuit layer. The metal reflection layer covers the first insulation layer and a reflectance thereof is greater than or equal to 85%, there is no conductive material between the first patterned circuit layer and the metal reflection layer, and the first adhesive layer is disposed between the first patterned circuit layer and the first insulation layer. A transparent adhesive layer and a protection layer are formed on the metal reflection layer. The transparent adhesive layer is disposed between the metal reflection layer and the protection layer. The protection layer comprises a transparent polymer. The light transmittance is greater than or equal to 80%.
    Type: Grant
    Filed: August 19, 2021
    Date of Patent: May 7, 2024
    Assignee: UNIFLEX Technology Inc.
    Inventors: Cheng-I Tu, Ying-Hsing Chen, Meng-Huan Chia, Hsin-Ching Su, Yi-Chun Liu, Cheng-Chung Lai, Yuan-Chih Lee
  • Method for manufacturing a substrate structure with high reflectance
    Patent number: 11937370
    Abstract: A base material is provided. A first patterned circuit layer and a second patterned circuit layer are formed on a first surface and a second surface of the base material. A first insulation layer and a metal reflection layer are provided on the first patterned circuit layer and a portion of the first surface exposed by the first patterned circuit layer, wherein the metal reflection layer covers the first insulation layer, and a reflectance of the metal reflection layer is substantially greater than or equal to 85%, there is no conductive material between the first patterned circuit layer and the metal reflection layer. A first ink layer is formed on the first insulation layer before the metal reflection layer is formed.
    Type: Grant
    Filed: September 1, 2021
    Date of Patent: March 19, 2024
    Assignee: UNIFLEX Technology Inc.
    Inventors: Cheng-I Tu, Ying-Hsing Chen, Meng-Huan Chia, Hsin-Ching Su, Yi-Chun Liu, Cheng-Chung Lai, Yuan-Chih Lee
  • Multi-layer electrode to improve performance of ferroelectric memory device
    Patent number: 11916127
    Abstract: Various embodiments of the present disclosure are directed towards a memory device including a first bottom electrode layer over a substrate. A ferroelectric switching layer is disposed over the first bottom electrode layer. A first top electrode layer is disposed over the ferroelectric switching layer. A second bottom electrode layer is disposed between the first bottom electrode layer and the ferroelectric switching layer. The second bottom electrode layer is less susceptible to oxidation than the first bottom electrode layer.
    Type: Grant
    Filed: June 16, 2021
    Date of Patent: February 27, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi Yang Wei, Bi-Shen Lee, Hsin-Yu Lai, Hai-Dang Trinh, Hsing-Lien Lin, Hsun-Chung Kuang
  • Biomaterial and method for promoting tissue regeneration by using the biomaterial
    Patent number: 11666685
    Abstract: The present disclosure provides a biomaterial and a method for promoting tissue regeneration by using the biomaterial.
    Type: Grant
    Filed: August 12, 2020
    Date of Patent: June 6, 2023
    Assignee: WIZDOM INC.
    Inventors: Yi-Chung Lai, Wen-Yi Chen, Yung-Lung Liu
  • FILTER APPARATUS FOR SEMICONDUCTOR DEVICE FABRICATION PROCESS
    Publication number: 20210362291
    Abstract: A filter device includes one or more filter membranes, and a filter housing enclosing the one or more filter membranes. Each of the filter membranes includes a base membrane made of a ceramic material, and a plurality of through holes. The base membrane is coated with a coating material.
    Type: Application
    Filed: November 19, 2020
    Publication date: November 25, 2021
    Inventors: Chwen YU, Chih-Chiang TSENG, Yi-Chung LAI, Tzu-Sou CHUANG, Yun-Ju CHIA
  • BIOMATERIAL AND METHOD FOR PROMOTING TISSUE REGENERATION BY USING THE BIOMATERIAL
    Publication number: 20210290826
    Abstract: The present disclosure provides a biomaterial and a method for promoting tissue regeneration by using the biomaterial.
    Type: Application
    Filed: August 12, 2020
    Publication date: September 23, 2021
    Inventors: Yi-Chung LAI, Wen-Yi CHEN, Yung-Lung LIU