Patents by Inventor Yi-Hung Lin

Yi-Hung Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230335508
    Abstract: An electronic device and a repair method thereof are provided. The repair method of the electronic device includes: providing a panel, wherein the panel includes a substrate, a first conductive layer disposed on the substrate, a transistor disposed on the substrate, and a dielectric layer disposed between the first conductive layer and the transistor, wherein the transistor comprises a first electrode and a second electrode; and cutting at least one of the first electrode and the second electrode with a laser beam, wherein a cutting point formed by the laser beam does not overlap with the first conductive layer.
    Type: Application
    Filed: March 21, 2023
    Publication date: October 19, 2023
    Applicant: Innolux Corporation
    Inventors: Jia-Sin Lin, Yi-Hung Lin, Yan-Zheng Wu, Chen-Lin Yeh
  • Patent number: 11790838
    Abstract: An electronic device is provided. The electronic device includes a pixel array, a gate driver and a bias control signal driver. The pixel array includes a pixel unit. The gate driver is configured to generate a plurality of gate control signals. The bias control signal driver is electrically connected to the pixel unit and the gate driver. The bias control signal driver is configured to generate a bias signal to drive the pixel unit according to a part of the plurality of gate control signals.
    Type: Grant
    Filed: September 19, 2022
    Date of Patent: October 17, 2023
    Assignee: Innolux Corporation
    Inventors: Kazuyuki Hashimoto, Yi-Hung Lin, Kung-Chen Kuo
  • Publication number: 20230327048
    Abstract: A light-emitting device includes a substrate; a first semiconductor layer and a semiconductor platform disposed on the first semiconductor layer, wherein the semiconductor platform includes a second semiconductor layer and an active layer between the first semiconductor layer and the second semiconductor layer; a plurality of openings passing through the semiconductor platform to uncover the first semiconductor layer; a plurality of first electrodes and a plurality of first electrode pads on the first semiconductor layer in the plurality of openings and not covering the semiconductor platform; a second electrode and a second electrode pad on the second semiconductor layer and not covering the first semiconductor layer in the plurality of openings, wherein a first surface of the plurality of first electrode pads is higher than a second surface of the second electrode pad, and a step difference between the first surface and the second surface is less than 2 ?m.
    Type: Application
    Filed: April 5, 2023
    Publication date: October 12, 2023
    Inventors: Chao-Hsing Chen, Yi-Hung Lin, Chien-Ya Hung
  • Patent number: 11773506
    Abstract: An IC fabrication system for facilitating improved thermal uniformity includes a chamber within which an IC process is performed on a substrate, a heating mechanism configured to heat the substrate, and a substrate-retaining device configured to retain the substrate in the chamber. The substrate-retaining device includes a contact surface configured to contact an edge of the retained substrate without the substrate-retaining device contacting a circumferential surface of the retained substrate. The substrate-retaining device includes a plurality of contact regions and a plurality of noncontact regions disposed at a perimeter, where the plurality of noncontact regions is interspersed with the plurality of contact regions. Each of the plurality of noncontact regions includes the contact surface.
    Type: Grant
    Filed: October 7, 2019
    Date of Patent: October 3, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yi-Hung Lin, Jr-Hung Li, Chang-Shen Lu, Tze-Liang Lee, Chii-Horng Li
  • Patent number: 11758666
    Abstract: A manufacturing method of a metal structure is disclosed, which includes the following steps: forming a seed layer on a substrate; forming a patterned metal layer on the seed layer, wherein the patterned metal layer includes a metal member; forming a first patterned photoresist layer on the seed layer, wherein a thickness of the first patterned photoresist layer is less than a thickness of the patterned metal layer; and performing a first patterning process to the seed layer through the first patterned photoresist layer to form a patterned seed layer, wherein after the first patterning process, the metal member includes a first part and a second part, the first part is disposed between the patterned seed layer and the second part, and a width of the first part is greater than a width of the second part.
    Type: Grant
    Filed: September 28, 2021
    Date of Patent: September 12, 2023
    Assignee: InnoLux Corporation
    Inventors: Hsueh-Hsuan Chou, Yi-Hung Lin
  • Publication number: 20230282179
    Abstract: An electronic device with short frame time length is provided. The electronic device includes a substrate, a plurality of first signal lines, a plurality of second signal lines, and two first integrated circuits. The plurality of first signal lines are disposed on the substrate. The plurality of first signal lines are divided into a first group of signal lines and a second group of signal lines. The plurality of second signal lines are disposed on the substrate. The plurality of second signal lines are disposed alternately with the plurality of first signal lines. The two first integrated circuits are bonded on the substrate. Each of the two first integrated circuits are electrically connected to the first group of signal lines and the second group of signal lines. The first group of signal lines and the second group of signal lines are disposed alternately in columns.
    Type: Application
    Filed: February 13, 2023
    Publication date: September 7, 2023
    Applicant: Innolux Corporation
    Inventors: Yi-Hung Lin, Cheng-Hung Tsai
  • Publication number: 20230282969
    Abstract: An electronic device is provided. The electronic device includes a substrate, a conductive layer, an insulating layer, and a modulating material. The conductive layer is disposed on the substrate and has a first opening penetrating through the conductive layer. The insulating layer is disposed on the conductive layer and includes a second opening penetrating through the insulating layer. The first opening of the conductive layer and the second opening of the insulating layer are at least partially overlapped. The modulating material is disposed on the insulating layer.
    Type: Application
    Filed: May 11, 2023
    Publication date: September 7, 2023
    Inventors: Yi-Hung LIN, Tang-Chin HUNG, Chia-Chi HO, I-Yin LI
  • Publication number: 20230261650
    Abstract: The disclosure provides an electrical apparatus, including a substrate, a plurality of gate driver units and a plurality of gate lines. The gate driver units are disposed on the substrate. The gate lines are disposed on the substrate. Each of the gate lines is respectively electrically connected to the corresponding gate driver unit. Each of the gate lines is configured to transmit a respective gate signal. The gate lines include a first gate line and a second gate line. The first gate line and the second gate line are configured to transmit the respective gate signals at a same time.
    Type: Application
    Filed: January 31, 2023
    Publication date: August 17, 2023
    Applicant: Innolux Corporation
    Inventors: Hsiu-Yi Tsai, Yu-Ti Huang, Yu-Hsiang Chiu, Yi-Hung Lin
  • Patent number: 11725278
    Abstract: A system and method for plasma enhanced deposition processes. An exemplary semiconductor manufacturing system includes a susceptor configured to hold a semiconductor wafer and a sector disposed above the susceptor. The sector includes a first plate and an overlying second plate, operable to form a plasma there between. The first plate includes a plurality of holes extending through the first plate, which vary in at least one of diameter and density from a first region of the first plate to a second region of the first plate.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: August 15, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Kun-Mo Lin, Yi-Hung Lin, Jr-Hung Li, Tze-Liang Lee, Ting-Gang Chen, Chung-Ting Ko
  • Publication number: 20230245949
    Abstract: An electronic device is disclosed. The electronic device includes a circuit layer, an electronic element and a thermal conducting element. The electronic element is disposed on the circuit layer and electrically connected to the circuit layer. The thermal conducting element is disposed between the circuit layer and the electronic element. The thermal conducting element is used for performing heat exchange with the electronic element.
    Type: Application
    Filed: August 29, 2022
    Publication date: August 3, 2023
    Applicant: InnoLux Corporation
    Inventors: Chin-Lung TING, Chung-Kuang WEI, Cheng-Chi WANG, Yeong-E CHEN, Yi-Hung LIN
  • Publication number: 20230206823
    Abstract: An electronic device is provided. The electronic device includes a pixel array, a gate driver and a bias control signal driver. The pixel array includes a pixel unit. The gate driver is configured to generate a plurality of gate control signals. The bias control signal driver is electrically connected to the pixel unit and the gate driver. The bias control signal driver is configured to generate a bias signal to drive the pixel unit according to a part of the plurality of gate control signals.
    Type: Application
    Filed: September 19, 2022
    Publication date: June 29, 2023
    Applicant: Innolux Corporation
    Inventors: Kazuyuki Hashimoto, Yi-Hung Lin, Kung-Chen Kuo
  • Patent number: 11688934
    Abstract: An antenna device is provided. The antenna device includes a first substrate, a first conductive layer, a first insulating structure, a second substrate, a second conductive layer and a liquid-crystal layer. The first conductive layer is disposed on the first substrate. The first insulating structure is disposed on the first conductive layer, and the first insulating structure includes a first region and a second region. The second substrate is disposed opposite to the first substrate. The second conductive layer is disposed on the second substrate. The liquid-crystal layer is disposed between the first conductive layer and the second conductive layer. The thickness of the first region is less than the thickness of the second region, and at least a portion of the first region is disposed in an overlapping region of the first conductive layer and the second conductive layer.
    Type: Grant
    Filed: August 31, 2021
    Date of Patent: June 27, 2023
    Assignee: INNOLUX CORPORATION
    Inventors: Yi-Hung Lin, Tang-Chin Hung, Chia-Chi Ho, I-Yin Li
  • Publication number: 20230197904
    Abstract: A light-emitting device includes a substrate including a top surface, a first side surface and a second side surface, wherein the first side surface and the second side surface of the substrate are respectively connected to two opposite sides of the top surface of the substrate; a semiconductor stack formed on the top surface of the substrate, the semiconductor stack including a first semiconductor layer, a second semiconductor layer, and an active layer formed between the first semiconductor layer and the second semiconductor layer; a first electrode pad formed adjacent to a first edge of the light-emitting device; and a second electrode pad formed adjacent to a second edge of the light-emitting device, wherein in a top view of the light-emitting device, the first edge and the second edge are formed on different sides or opposite sides of the light-emitting device, the first semiconductor layer adjacent to the first edge includes a first sidewall directly connected to the first side surface of the substrate,
    Type: Application
    Filed: February 23, 2023
    Publication date: June 22, 2023
    Inventors: Chao-Hsing CHEN, Cheng-Lin LU, Chih-Hao CHEN, Chi-Shiang HSU, I-Lun MA, Meng-Hsiang HONG, Hsin-Ying WANG, Kuo-Ching HUNG, Yi-Hung LIN
  • Patent number: 11672081
    Abstract: A manufacturing method of a metal structure is disclosed, which includes the following steps: forming a seed layer on a substrate; forming a patterned metal layer on the seed layer, wherein the patterned metal layer includes a metal member; forming a first patterned photoresist layer on the seed layer, wherein a thickness of the first patterned photoresist layer is less than a thickness of the patterned metal layer; and performing a first patterning process to the seed layer through the first patterned photoresist layer to form a patterned seed layer, wherein after the first patterning process, the metal member includes a first part and a second part, the first part is disposed between the patterned seed layer and the second part, and a width of the first part is greater than a width of the second part.
    Type: Grant
    Filed: November 20, 2020
    Date of Patent: June 6, 2023
    Assignee: InnoLux Corporation
    Inventors: Hsueh-Hsuan Chou, Yi-Hung Lin
  • Publication number: 20230145304
    Abstract: An electronic device and a method for manufacturing the same are provided. The electronic device includes: a first insulating layer; a first metal bump disposed on the first insulating layer; and a second insulating layer disposed on the first metal bump, wherein the second insulating layer includes a first opening exposing a portion of the first metal bump, wherein a thickness of the first insulating layer is greater than a thickness of the second insulating layer.
    Type: Application
    Filed: May 19, 2022
    Publication date: May 11, 2023
    Inventors: Yi-Hung LIN, Chun-Hung LAI, Chun-Chin FAN
  • Patent number: 11646485
    Abstract: A method for manufacturing a liquid-crystal antenna device is provided. The method includes step (a) providing a first mother substrate. The first mother substrate includes a first region and a second region. The first region has a plurality of first sides. An extension line of at least one of the first sides divides the second region into a first part and a second part. The method also includes the following steps: (b) forming a first electrode layer on the first region and the second region, and (c) cutting the first mother substrate along the first sides of the first region.
    Type: Grant
    Filed: December 18, 2020
    Date of Patent: May 9, 2023
    Assignee: INNOLUX CORPORATION
    Inventors: Yi-Hung Lin, Chin-Lung Ting, Hui-Min Huang, Tang-Chin Hung
  • Publication number: 20230131442
    Abstract: An electronic device includes a substrate, a driving element, a conductive layer, and an electronic element is provided. The driving element is disposed on the substrate. The conductive layer is disposed on the substrate, wherein there is a first distance (B) between the driving element and an edge of the conductive layer. The electronic element is disposed on the conductive layer and is electrically connected to the driving element, wherein there is a second distance (A) between the electronic element and the edge of the conductive layer, and the first distance (B) is greater than the second distance (A).
    Type: Application
    Filed: September 30, 2022
    Publication date: April 27, 2023
    Applicant: Innolux Corporation
    Inventors: Yi-Hung Lin, Hsiu-Yi Tsai, Chia-Ping Tseng, Chia-Chi Ho
  • Publication number: 20230108090
    Abstract: Disclosed is an electronic device including a tunable element, a first power supply circuit, and a second power supply circuit. The first power supply circuit and the second power supply circuit are electrically connected to the tunable element. The first power supply circuit drives the tunable element during a first time period. The second power supply circuit drives the tunable element during a second time period.
    Type: Application
    Filed: September 15, 2022
    Publication date: April 6, 2023
    Applicant: Innolux Corporation
    Inventors: Yi-Hung Lin, Chung-Le Chen, Shuo-Ting Hong, Yu-Ti Huang, Yu-Hsiang Chiu, Nai-Fang Hsu
  • Patent number: 11621374
    Abstract: A light-emitting device includes a substrate including a top surface, a first side surface and a second side surface, wherein the first side surface and the second side surface of the substrate are respectively connected to two opposite sides of the top surface of the substrate; a semiconductor stack formed on the top surface of the substrate, the semiconductor stack including a first semiconductor layer, a second semiconductor layer, and an active layer formed between the first semiconductor layer and the second semiconductor layer; a first electrode pad formed adjacent to a first edge of the light-emitting device; and a second electrode pad formed adjacent to a second edge of the light-emitting device, wherein in a top view of the light-emitting device, the first edge and the second edge are formed on different sides or opposite sides of the light-emitting device, the first semiconductor layer adjacent to the first edge includes a first sidewall directly connected to the first side surface of the substrate,
    Type: Grant
    Filed: May 14, 2021
    Date of Patent: April 4, 2023
    Assignee: EPISTAR CORPORATION
    Inventors: Chao-Hsing Chen, Cheng-Lin Lu, Chih-Hao Chen, Chi-Shiang Hsu, I-Lun Ma, Meng-Hsiang Hong, Hsin-Ying Wang, Kuo-Ching Hung, Yi-Hung Lin
  • Patent number: D990376
    Type: Grant
    Filed: July 26, 2021
    Date of Patent: June 27, 2023
    Assignee: MOBILITY HOLDINGS, LIMITED
    Inventors: Joakim Uimonen, Eric Yi-Hung Lin, Antoine Goudrand