Abstract: The embodiments of the disclosure provide a patterning method, which includes the following processes. A target layer is formed on a substrate. A hard mask layer is formed over the target layer. A first patterning process is performed on the hard mask layer by using a photomask having a first pattern with a first pitch. The photomask is shifted along a first direction by a first distance. A second patterning process is performed on the hard mask layer by using the photomask that has been shifted, so as to form a patterned hard mask. The target layer is patterned using the patterned hard mask to form a patterned target layer. The target layer has a second pattern with a second pitch less than the first pitch.

Abstract: A method of forming an integrated circuit includes the following steps. A substrate including a plurality of exposure fields is provided, and each of the exposure field includes a target portion and a set of alignment marks. Measure the set of alignment marks of each exposure field by a measuring system to obtain alignment data for the respective exposure field. Determine an exposure parameter corresponding to each exposure field and an exposure location on the target portion from the alignment data for the respective exposure field by a calculating system. Feedback the alignment data to a next substrate.

Abstract: An overlay mask includes a plurality of first patterns, a plurality of second patterns and a plurality of third patterns. The first patterns are arranged within a first pitch. The second patterns are arranged within a second pitch. A first portion of the third patterns are arranged alternately with the first patterns, within the first pitch, and a second portion of the third patterns are arranged alternately with the second patterns, within the second pitch, and the first pitch is not equal to the second pitch.

Abstract: A method of forming an integrated circuit includes the following steps. A substrate including a plurality of exposure fields is provided, and each of the exposure field includes a target portion and a set of alignment marks. Measure the set of alignment marks of each exposure field by a measuring system to obtain alignment data for the respective exposure field. Determine an exposure parameter corresponding to each exposure field and an exposure location on the target portion from the alignment data for the respective exposure field by a calculating system. Feedback the alignment data to a next substrate.

Abstract: The present invention provides an overlay target. The overlay target includes a plurality of first pattern blocks and a plurality of second pattern blocks. The first pattern blocks and the second patterns blocks are arranged in array by being separated by at least one first gaps stretching along a first direction and at least one second gaps stretching along a second direction. Each first pattern block is composed of a plurality of first stripe patterns stretching along a third direction, and each second pattern block is composed of a plurality of second stripe patterns stretching along a fourth direction. The first direction is orthogonal to the second direction, the third direction and the fourth direction are 45 degrees relative to the first direction.

Abstract: An overlay mask includes a plurality of first patterns, a plurality of second patterns and a plurality of third patterns. The first patterns are arranged within a first pitch. The second patterns are arranged within a second pitch. A first portion of the third patterns are arranged alternately with the first patterns, within the first pitch, and a second portion of the third patterns are arranged alternately with the second patterns, within the second pitch, and the first pitch is not equal to the second pitch.

Abstract: An overlay operation method and an overlay control method are disclosed. A first mark and a second mark are identified on a substrate, wherein the first mark and the second mark are formed by a process in combination with using a photomask. Next, a first measurement is performed to obtain an offset between the first mark and the second mark in a direction. Then, an operation is performed to judge whether the offset is in a range from a pre-determined offset minus a deviation to the pre-determined offset plus the deviation, wherein the pre-determined offset is determined by the photomask.

Abstract: The present invention provides an overlay mark information, including at least a pair of first overlay mark patterns disposed in a first layer, each first overlay mark pattern consisting of a plurality of first mark units arranged along a first direction, where each first mark unit includes at least one first pattern and at least one second pattern, and the dimension of the first pattern is different from the dimension of the second pattern. The overlay mark information also includes at least a pair of second overlay patterns disposed in the first layer, each second overlay mark pattern consisting of a plurality of second mark units arranged along the first direction, where the pattern of each first mark unit is the same as the pattern of each second mark unit after 180 degrees rotated.

Abstract: An overlay operation method and an overlay control method are disclosed. A first mark and a second mark are identified on a substrate, wherein the first mark and the second mark are formed by a process in combination with using a photomask. Next, a first measurement is performed to obtain an offset between the first mark and the second mark in a direction. Then, an operation is performed to judge whether the offset is in a range from a pre-determined offset minus a deviation to the pre-determined offset plus the deviation, wherein the pre-determined offset is determined by the photomask.

Abstract: An overlay mask includes a plurality of first patterns, a plurality of second patterns and a plurality of third patterns. The first patterns are arranged within a first pitch. The second patterns are arranged within a second pitch. A first portion of the third patterns are arranged alternately with the first patterns, within the first pitch, and a second portion of the third patterns are arranged alternately with the second patterns, within the second pitch, and the first pitch is not equal to the second pitch.

Abstract: An overlay measurement method includes providing three predetermined patterns, including a first predetermined pattern, a second predetermined pattern and a third predetermined pattern. An inspection process is then performed on said three predetermined patterns, to obtain three image points, including a first image point, a second image point and a third image point respectively. Next, a defining process is performed to define a default position, and a calculating process is performed to obtain a real offset value x=(p?q)*(c?a)/(a?b)+p.

Abstract: In this disclosure, a mark segmentation method and a method for manufacturing a semiconductor structure applying the same are provided. The mark segmentation method comprises the following steps. First, a plurality of segments having a width WS and separated from each other by a space SS formed on a substrate are identified by a processor. Thereafter, a plurality of marks are set over the segments by the processor. This step comprises: (1) adjusting a width WM of each one of the marks being equal to m(WS+SS)+WS or m(WS+SS)+SS by the processor, wherein m is an integer; and (2) adjusting a space SM of adjacent two of the marks by the processor such that WM+SM=n(WS+SS), wherein n is an integer.

Abstract: In this disclosure, a mark segmentation method and a method for manufacturing a semiconductor structure applying the same are provided. The mark segmentation method comprises the following steps. First, a plurality of segments having a width WS and separated from each other by a space SS formed on a substrate are identified by a processor. Thereafter, a plurality of marks are set over the segments by the processor. This step comprises: (1) adjusting a width WM of each one of the marks being equal to m(WS+SS)+WS or m(WS+SS)+SS by the processor, wherein m is an integer; and (2) adjusting a space SM of adjacent two of the marks by the processor such that WM+SM=n(WS+SS), wherein n is an integer.

Abstract: A floating water bed for a user being floatably surrounded with liquid, includes a sleeping bed, which is made of waterproof material, having a compartment for the user accommodating therein that the user is floating and supporting by the liquid, and a breathing opening communicating with the compartment and arranged in such a manner that when the user rests in the compartment, the breathing opening is aligned with a head of the user, wherein the breathing opening is adapted for air circulation of the compartment with ambient atmosphere, such that the sleeping bag is adapted for allowing the user to achieve absolute relaxation while achieving complete rest, wherein the sleeping bag is adapted for completely separating the user from the liquid surrounding and thus protecting the user within the sleeping bag.

Abstract: Light source and backlight module utilizing the same. The light source includes a hollow glass tube and an electrode disposed therein. The electrode comprises a bent surface, increasing surface area, thereby increasing light emission efficiency and reducing temperature.

Abstract: A backlight module is provided. The backlight module comprises a light source, a reflection panel, a back bezel, and an upper filtering apparatus. The reflection panel has a first upper portion, which is essentially disposed at an outer side of the light source, and is used to reflect lights projecting from the light source. The back bezel has a second upper portion which is essentially disposed at an outer side of the reflection panel. At least one of the first upper portion and the second upper portion forms an upper opening. The filtering apparatus covers the openings. The filtering apparatus is capable of changing the distribution of the temperature of the light source to allow more efficient lamp activity. As a result, luminance is increased and lamp life extended.

Abstract: A direct type backlight module comprises a back bezel, a light source, a circuit board, and a heat-insulating element. The light source comprising a plurality of driving elements coupled thereto is disposed within the back bezel. The circuit board is disposed outside the back bezel. The heat-insulating element is disposed between the back bezel and the circuit board so as to form a first convectional space and a second convectional space.

Abstract: A display and a backlight module thereof. The display includes a backlight module, a panel and a front bezel. The backlight module includes a substrate, a plurality of lamps, and a plurality of lamp holders. The substrate includes a first side and a second side. The lamps are arranged from the first side to the second side in order and parallel to the first side and the second side. The lamp holders disposed on the substrate are connected to the lamps. A line formed by the linked lamps and the substrate intersect to form an included angle.

Abstract: A display and a backlight module thereof. The display includes a backlight module, a panel and a front bezel. The backlight module includes a substrate, a plurality of lamps, and a plurality of lamp holders. The substrate includes a first side and a second side. The lamps are arranged from the first side to the second side in order and parallel to the first side and the second side. The lamp holders disposed on the substrate are connected to the lamps. A line formed by the linked lamps and the substrate intersect to form an included angle.

Abstract: The floating water bed includes a specially designed unique sleeping bag and a movable mattress pad. The sleeping bag is both thin and soft and it is placed on top of the movable mattress pad. This movable mattress pad can be lowered or risen from the water. As the human being rests within the sleeping bag, with the press of a button, the mattress pad can be lowered into the water along with the sleeping bag and the individual inside. At this time, the individual inside the sleeping bag will be floating in mid-water and will begin experiencing soothing relaxation. The floating water bed will have a well-shaped hole perpendicular to the sleeping bag and rising out of the water, providing the individual with an entrance into the sleeping bag as well as a breathing space once they are within the sleeping bag. With this well-shaped hole, the individual can breathe easily without the use of oxygen masks or additional equipment.