Patents by Inventor Yi-Lin Chuang
Yi-Lin Chuang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11017149Abstract: Electronic design automation (EDA) of the present disclosure, in various embodiments, optimizes designing, simulating, analyzing, and verifying of one or more electronic architectural designs for an electronic device. The EDA of the present disclosure identifies one or more electronic architectural features from the one or more electronic architectural designs. In some situations, the EDA of the present disclosure can manipulate one or more electronic architectural models over multiple iterations using a machine learning process until one or more electronic architectural models from among the one or more electronic architectural models satisfy one or more electronic design targets. The EDA of the present disclosure substitutes the one or more electronic architectural models that satisfy the one or more electronic design targets for the one or more electronic architectural features in the one or more electronic architectural designs to optimize the one or more electronic architectural designs.Type: GrantFiled: May 11, 2020Date of Patent: May 25, 2021Inventors: Yi-Lin Chuang, Ching-Fang Chen, Wei-Li Chen, Wei-Pin Changchien, Yung-Chin Hou, Yun-Han Lee
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Publication number: 20210133384Abstract: A device is disclosed. The cell block includes a pin disposed at a Nth metal layer in a cell layout. The first metal interconnect is disposed at a (N+1)th metal layer above the Nth metal layer and stacked over the pin, and electrically coupled to the pin. The second interconnects are disposed at a (N+2)th metal layer and stacked over the first metal interconnect, and parallel to each other. The second metal interconnects are electrically coupled to the first metal interconnect, and forming an equivalent tapping point of the pin of the cell block. The equivalent tapping point and the pin are vertically overlapped with each other, and fabrication of the device is initiated after a DRC or a SEM simulation test is passed. A first via connects the first metal interconnect to the pin, and the at least one first metal interconnect is perpendicular to the pin.Type: ApplicationFiled: January 17, 2021Publication date: May 6, 2021Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yi-Lin CHUANG, Huang-Yu CHEN, Yun-Han LEE
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Publication number: 20210097224Abstract: A method of generating an integrated circuit includes: placing a plurality of electronic components on a layout floor plan to generate a placing layout of the integrated circuit; forming a clock tree upon the placing layout to generate a synthesis layout of the integrated circuit; routing the synthesis layout to generate a routed layout of the integrated circuit; performing a DRC process upon the routed layout to obtain a layout region with a systematic DRC violation; generating a plurality of prediction gains of the layout region according to a plurality of placement recipes respectively; and generating an adjusted routing layout of the integrated circuit by adjusting the layout region with the systematic DRC violation according to a target placement recipe in the plurality of placement recipes.Type: ApplicationFiled: March 24, 2020Publication date: April 1, 2021Inventors: SHIH-YAO LIN, YI-LIN CHUANG, YIN-AN CHEN, SHIH FENG HONG
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Patent number: 10943049Abstract: Systems and methods are provided for predicting systematic design rule check (DRC) violations in a placement layout before routing is performed on the placement layout. A systematic DRC violation prediction system includes DRC violation prediction circuitry. The DRC violation prediction circuitry receives placement data associated with a placement layout. The DRC violation prediction circuitry inspects the placement data associated with the placement layout, and the placement data may include data associated with a plurality of regions of the placement layout, which may be inspected on a region-by-region basis. The DRC violation prediction circuitry predicts whether one or more systematic DRC violations would be present in the placement layout due to a subsequent routing of the placement layout.Type: GrantFiled: May 1, 2019Date of Patent: March 9, 2021Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Lin Chuang, Henry Lin, Szu-Ju Huang, Yin-An Chen, Amos Hong
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Patent number: 10922466Abstract: A device is disclosed that includes a cell block, at least one first metal interconnect, and second metal interconnects. The cell block includes a pin disposed at a Nth metal layer in a cell layout. The at least one first metal interconnect is disposed at a (N+1)th metal layer above the Nth metal layer and stacked over the pin, and electrically coupled to the pin. The second interconnects are disposed at a (N+2)th metal layer and stacked over the at least one first metal interconnect, and parallel to each other. The second metal interconnects are electrically coupled to the at least one first metal interconnect, and forming an equivalent tapping point of the pin of the cell block. The equivalent tapping point and the pin are vertically overlapped with each other, and fabrication of the device is initiated after a DRC or a SEM simulation test is passed.Type: GrantFiled: December 5, 2018Date of Patent: February 16, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yi-Lin Chuang, Huang-Yu Chen, Yun-Han Lee
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Publication number: 20210004519Abstract: Systems and methods are provided for predicting static voltage (SIR) drop violations in a clock-tree synthesis (CTS) layout before routing is performed on the CTS layout. A static voltage (SIR) drop violation prediction system includes SIR drop violation prediction circuitry. The SIR drop violation prediction circuitry receives CTS data associated with a CTS layout. The SIR drop violation prediction circuitry inspects the CTS layout data associated with the CTS layout, and the CTS layout data may include data associated with a plurality of regions of the CTS layout, which may be inspected on a region-by-region basis. The SIR drop violation prediction circuitry predicts whether one or more SIR drop violations would be present in the CTS layout due to a subsequent routing of the CTS layout.Type: ApplicationFiled: September 21, 2020Publication date: January 7, 2021Inventors: Yi-Lin Chuang, Henry Lin, Szu-Ju Huang, Yin-An Chen, Amos Hong
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Patent number: 10810346Abstract: Systems and methods are provided for predicting static voltage (SIR) drop violations in a clock-tree synthesis (CTS) layout before routing is performed on the CTS layout. A static voltage (SIR) drop violation prediction system includes SIR drop violation prediction circuitry. The SIR drop violation prediction circuitry receives CTS data associated with a CTS layout. The SIR drop violation prediction circuitry inspects the CTS layout data associated with the CTS layout, and the CTS layout data may include data associated with a plurality of regions of the CTS layout, which may be inspected on a region-by-region basis. The SIR drop violation prediction circuitry predicts whether one or more SIR drop violations would be present in the CTS layout due to a subsequent routing of the CTS layout.Type: GrantFiled: June 3, 2019Date of Patent: October 20, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Lin Chuang, Henry Lin, Szu-Ju Huang, Yin-An Chen, Amos Hong
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Publication number: 20200272777Abstract: Electronic design automation (EDA) of the present disclosure, in various embodiments, optimizes designing, simulating, analyzing, and verifying of one or more electronic architectural designs for an electronic device. The EDA of the present disclosure identifies one or more electronic architectural features from the one or more electronic architectural designs. In some situations, the EDA of the present disclosure can manipulate one or more electronic architectural models over multiple iterations using a machine learning process until one or more electronic architectural models from among the one or more electronic architectural models satisfy one or more electronic design targets. The EDA of the present disclosure substitutes the one or more electronic architectural models that satisfy the one or more electronic design targets for the one or more electronic architectural features in the one or more electronic architectural designs to optimize the one or more electronic architectural designs.Type: ApplicationFiled: May 11, 2020Publication date: August 27, 2020Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Lin CHUANG, Ching-Fang CHEN, Wei-Li CHEN, Wei-Pin CHANGCHIEN, Yung-Chin HOU, Yun-Han LEE
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Publication number: 20200185324Abstract: A system (including a processor and memory with computer program code) that is configured to execute a method which includes generating the layout diagram including: selecting a circuit cell which includes an active element; bundling, for purposes of placement, the circuit cell and an inter-layer via together as an integral unit; placing the integral unit of the circuit cell and the inter-layer via in a first device layer of the layout diagram; and placing a metal pattern in a second device layer of the layout diagram; and wherein the placing the integral unit of the circuit cell and the inter-layer via forms a direct electrical connection channel between the circuit cell and the metal pattern.Type: ApplicationFiled: February 14, 2020Publication date: June 11, 2020Inventors: Yi-Lin CHUANG, Ching-Fang CHEN, Jia-Jye SHEN
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Patent number: 10678973Abstract: Electronic design automation (EDA) of the present disclosure, in various embodiments, optimizes designing, simulating, analyzing, and verifying of one or more electronic architectural designs for an electronic device. The EDA of the present disclosure identifies one or more electronic architectural features from the one or more electronic architectural designs. In some situations, the EDA of the present disclosure can manipulate one or more electronic architectural models over multiple iterations using a machine learning process until one or more electronic architectural models from among the one or more electronic architectural models satisfy one or more electronic design targets. The EDA of the present disclosure substitutes the one or more electronic architectural models that satisfy the one or more electronic design targets for the one or more electronic architectural features in the one or more electronic architectural designs to optimize the one or more electronic architectural designs.Type: GrantFiled: October 4, 2017Date of Patent: June 9, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Lin Chuang, Ching-Fang Chen, Wei-Li Chen, Wei-Pin Changchien, Yung-Chin Hou, Yun-Han Lee
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Publication number: 20200104457Abstract: Systems and methods are provided for predicting systematic design rule check (DRC) violations in a placement layout before routing is performed on the placement layout. A systematic DRC violation prediction system includes DRC violation prediction circuitry. The DRC violation prediction circuitry receives placement data associated with a placement layout. The DRC violation prediction circuitry inspects the placement data associated with the placement layout, and the placement data may include data associated with a plurality of regions of the placement layout, which may be inspected on a region-by-region basis. The DRC violation prediction circuitry predicts whether one or more systematic DRC violations would be present in the placement layout due to a subsequent routing of the placement layout.Type: ApplicationFiled: May 1, 2019Publication date: April 2, 2020Inventors: Yi-Lin Chuang, Henry Lin, Szu-Ju Huang, Yin-An Chen, Amos Hong
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Publication number: 20200104458Abstract: Systems and methods are provided for predicting static voltage (SIR) drop violations in a clock-tree synthesis (CTS) layout before routing is performed on the CTS layout. A static voltage (SIR) drop violation prediction system includes SIR drop violation prediction circuitry. The SIR drop violation prediction circuitry receives CTS data associated with a CTS layout. The SIR drop violation prediction circuitry inspects the CTS layout data associated with the CTS layout, and the CTS layout data may include data associated with a plurality of regions of the CTS layout, which may be inspected on a region-by-region basis. The SIR drop violation prediction circuitry predicts whether one or more SIR drop violations would be present in the CTS layout due to a subsequent routing of the CTS layout.Type: ApplicationFiled: June 3, 2019Publication date: April 2, 2020Inventors: Yi-Lin Chuang, Henry Lin, Szu-Ju Huang, Yin-An Chen, Amos Hong
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Patent number: 10566278Abstract: A computer implemented layout method for an integrated circuit (IC) structure and IC structure are provided. Such a method includes: placing a power supply rail pattern in a first device layer of the IC; bundling, for purposes of placement, a voltage level shifter and one or more inter-layer vias together as an integral unit; and placing the integral unit in the first device layer of the IC design such that one or more metal line patterns in the voltage level shifter are located parallel to albeit without overlapping the power supply rail pattern. The placing the integral unit forms a direct electrical connection channel between the voltage level shifter and a metal pattern in a second device layer of the IC design. At least one of the placing operations is performed using a layout generating machine.Type: GrantFiled: June 12, 2017Date of Patent: February 18, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yi-Lin Chuang, Ching-Fang Chen, Jia-Jye Shen
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Patent number: 10268795Abstract: A method for timing optimization is disclosed. The method includes obtaining information on detour locations of a chip by performing a routing operation, establishing, through machine learning, a model that describes a relationship between an image map and the detour locations, generating predicted detour locations based on the model and the image map, determining the probability of detouring in a region of the predicted detour locations, determining a predicted detour net for a path in a region having a high probability of detour, and determining sensitivity of the path.Type: GrantFiled: April 20, 2017Date of Patent: April 23, 2019Assignee: Taiwan Semiconductor Manufacturing Company Ltd.Inventors: Yi-Lin Chuang, Chih-Tien Chang, Kuan-Hua Su, Szu-Ju Huang
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Publication number: 20190108302Abstract: A device is disclosed that includes a cell block, at least one first metal interconnect, and second metal interconnects. The cell block includes a pin disposed at a Nth metal layer in a cell layout. The at least one first metal interconnect is disposed at a (N+1)th metal layer above the Nth metal layer and stacked over the pin, and electrically coupled to the pin. The second interconnects are disposed at a (N+2)th metal layer and stacked over the at least one first metal interconnect, and parallel to each other. The second metal interconnects are electrically coupled to the at least one first metal interconnect, and forming an equivalent tapping point of the pin of the cell block. The equivalent tapping point and the pin are vertically overlapped with each other, and fabrication of the device is initiated after a DRC or a SEM simulation test is passed.Type: ApplicationFiled: December 5, 2018Publication date: April 11, 2019Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yi-Lin CHUANG, Huang-Yu CHEN, Yun-Han LEE
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Patent number: 10162925Abstract: A cell layout, a cell layout library and a synthesizing method are disclosed. The cell layout includes a cell block and a tapping connector. The cell block has a pin. The pin being disposed at a Nth metal layer in the cell layout. The tapping connector is disposed at a (N+1)th metal layer and a (N+2)th metal layer and stacked above the pin of the cell block. The tapping connector is electrically connected to the pin and forms an equivalent tapping point of the pin of the cell block. N is a positive integer greater than or equal to 1.Type: GrantFiled: September 18, 2015Date of Patent: December 25, 2018Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yi-Lin Chuang, Huang-Yu Chen, Yun-Han Lee
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Publication number: 20180307790Abstract: A method for timing optimization is disclosed. The method includes obtaining information on detour locations of a chip by performing a routing operation, establishing, through machine learning, a model that describes a relationship between an image map and the detour locations, generating predicted detour locations based on the model and the image map, determining the probability of detouring in a region of the predicted detour locations, determining a predicted detour net for a path in a region having a high probability of detour, and determining sensitivity of the path.Type: ApplicationFiled: April 20, 2017Publication date: October 25, 2018Inventors: YI-LIN CHUANG, CHIH-TIEN CHANG, KUAN-HUA SU, SZU-JU HUANG
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Publication number: 20180268096Abstract: Electronic design automation (EDA) of the present disclosure, in various embodiments, optimizes designing, simulating, analyzing, and verifying of one or more electronic architectural designs for an electronic device. The EDA of the present disclosure identifies one or more electronic architectural features from the one or more electronic architectural designs. In some situations, the EDA of the present disclosure can manipulate one or more electronic architectural models over multiple iterations using a machine learning process until one or more electronic architectural models from among the one or more electronic architectural models satisfy one or more electronic design targets. The EDA of the present disclosure substitutes the one or more electronic architectural models that satisfy the one or more electronic design targets for the one or more electronic architectural features in the one or more electronic architectural designs to optimize the one or more electronic architectural designs.Type: ApplicationFiled: October 4, 2017Publication date: September 20, 2018Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Lin CHUANG, Ching-Fang CHEN, Wei-Li CHEN, Wei-Pin CHANGCHIEN, Yung-Chin HOU, Yun-Han LEE
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Publication number: 20170278789Abstract: A computer implemented layout method for an integrated circuit (IC) structure and IC structure are provided. Such a method includes: placing a power supply rail pattern in a first device layer of the IC; bundling, for purposes of placement, a voltage level shifter and one or more inter-layer vias together as an integral unit; and placing the integral unit in the first device layer of the IC design such that one or more metal line patterns in the voltage level shifter are located parallel to albeit without overlapping the power supply rail pattern. The placing the integral unit forms a direct electrical connection channel between the voltage level shifter and a metal pattern in a second device layer of the IC design. At least one of the placing operations is performed using a layout generating machine.Type: ApplicationFiled: June 12, 2017Publication date: September 28, 2017Inventors: Yi-Lin CHUANG, Ching-Fang CHEN, Jia-Jye SHEN
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Patent number: 9679840Abstract: A computer implemented layout method for an integrated circuit (IC) structure and IC structure are provided. The layout method can include placing a circuit cell and an inter-layer via together in a first device layer of the IC structure, and placing a metal pattern in a second device layer of the IC structure. The inter-layer via and the metal pattern may be configured to form a direct connection channel for the circuit cell and the metal pattern.Type: GrantFiled: March 20, 2014Date of Patent: June 13, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yi-Lin Chuang, Ching-Fang Chen, Jia-Jye Shen