Patents by Inventor Yi Ren

Yi Ren has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230083258
    Abstract: A bilateral teleoperation system includes: a primary-end operation platform and a secondary-end operation platform. The primary-end operation platform includes: a primary-end support, primary-end mechanical arms, a mechanical hand control assembly, and a first controller, a root end of the primary-end mechanical arm being arranged on the primary-end support, and a tail end of the primary-end mechanical arm being connected to the mechanical hand control assembly.
    Type: Application
    Filed: November 22, 2022
    Publication date: March 16, 2023
    Inventors: Kun XIONG, Longfei Zhao, Dongsheng Zhang, Lei Wei, Cheng Zhou, Haitao Wang, Wangwei Lee, Ke Chen, Bidan Huang, Yi Ren
  • Publication number: 20230033720
    Abstract: Provided are dynamic sealing structure and rotary kiln apparatus. Dynamic sealing structure includes kiln tail, discharging cover, sealing mechanism, guiding mechanism and a balancing device. Discharging cover includes discharging cover cylinder and discharging cover end face connected to same, discharging cover cylinder is arranged on outer side of circumferential wall of kiln tail in a sleeving manner, and discharging cover end face and end face of the kiln tail are arranged at intervals. Sealing mechanism is arranged between discharging cover cylinder and kiln tail and is connected to inner wall of discharging cover cylinder. Guiding mechanism is arranged between inner wall of discharging cover cylinder and outer side of kiln tail, and is located on one side or two sides of the sealing mechanism in axial direction of rotary kiln, rotating gap is provided between guiding mechanism and kiln tail, and balancing device is connected to outer side of the discharging cover cylinder.
    Type: Application
    Filed: May 9, 2020
    Publication date: February 2, 2023
    Inventors: Shucheng ZHU, Xibin WANG, Fang LI, Jinfeng LI, Yanwu LV, Yi REN
  • Publication number: 20230006193
    Abstract: The present disclosure discloses a porous metal matrix composite (MMC), wherein the porous MMC includes a metal material, a spacing material forming an interconnected structure and embedded in the metal material to form an interface between the metal material and the interconnected structure; and a first plurality of pores located at the interface.
    Type: Application
    Filed: June 28, 2022
    Publication date: January 5, 2023
    Inventors: Yi-Ren TZENG, Sheng-Hsiang CHIANG
  • Patent number: 11534820
    Abstract: A crystallizer copper plate and a continuous casting crystallizer. The crystallizer copper plate is provided with a metal continuous casting die surface and a rear-side cooling fixed surface. The fixed surface is provided with fixing screw holes in a vertical column connected to a fixed water tank or an adapter backplate and mesas forming the surrounding of the screw holes. Reinforced bars are connected between multiple mesas of each column. Cooling channels lower than the fixed surface are provided between any two adjacent two columns of fixing screw holes. Flow-diverting cooling bars are provided at the middle of meniscus regions of the cooling channels. Either the top end or the bottom end of the flow-diverting cooling bar is a cone used for altering the direction of movement of a cooling medium.
    Type: Grant
    Filed: June 16, 2020
    Date of Patent: December 27, 2022
    Assignee: XIXIA LONGCHENG SPECIAL MATERIAL CO., LTD.
    Inventors: Xibin Wang, Jialiang Zhao, Chunyi Liao, Chao Ma, Yi Ren
  • Patent number: 11521846
    Abstract: A layer stack is formed over a conductive material portion located on a substrate. The layer stack contains a first silicon oxide layer, a silicon nitride layer formed by chemical vapor deposition, and a second silicon oxide layer. A patterned etch mask layer including an opening is formed over the layer stack. A via cavity extending through the layer stack and down to the conductive material portion is formed by isotropically etching portions of the layer stack underlying the opening in the patterned etch mask layer using an isotropic etch process. A buffered oxide etch process may be used, in which the etch rate of the silicon nitride layer is less than, but is significant enough, compared to the etch rate of the first silicon oxide layer to provide tapered straight sidewalls on the silicon nitride layer. An optical device including a patterned layer stack can be provided.
    Type: Grant
    Filed: December 16, 2019
    Date of Patent: December 6, 2022
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Yi-Ren Wang, Yuan-Chih Hsieh
  • Patent number: 11509191
    Abstract: The present disclosure discloses an electric assembly and a vehicle having the same. The electric assembly includes: a box assembly; a motor, disposed in the box assembly; a transmission, disposed in the box assembly, where the transmission is power-coupled to the motor; and a controller, disposed outside the box assembly, and fixedly connected to the box assembly.
    Type: Grant
    Filed: January 28, 2019
    Date of Patent: November 22, 2022
    Assignee: BYD COMPANY LIMITED
    Inventors: Hongbin Luo, Yi Ren, Guangquan Chen, Daqi Chen, Shuanghong Jing, Chunlei Liu
  • Patent number: 11500029
    Abstract: A battery estimation method is provided. The method includes obtaining a potential difference parameter term associated with an estimated absolute state-of-charge for determining a maximum load capable of continuous drawing for a duration of the battery. The potential difference parameter term includes a potential difference characteristic parameter, or the potential difference parameter term includes the potential difference characteristic parameter and a potential difference compensation parameter.
    Type: Grant
    Filed: May 11, 2021
    Date of Patent: November 15, 2022
    Assignee: Simplo Technology Co., Ltd.
    Inventor: Yi-Ren Guo
  • Publication number: 20220351266
    Abstract: Disclosed is a customization platform for service quality evaluation product, comprising an account management module generating a registration interface and a product creation interface for guiding a user to register and log in to customize a service quality evaluation product; an access mode configuration module generating a product access mode configuration interface for guiding user to configure an access mode for the service quality evaluation product; a voice transcription configuration module generating an industry type selection interface for guiding user to select an industry type and a corresponding voice recognition model for pre-training according to the industry type, the pre-trained voice recognition model converting an input audio file to text content; and a semantic analysis configuration module generating an evaluation information configuration interface for guiding user to input the evaluation information to perform service quality scoring according to the text content and the evaluation inf
    Type: Application
    Filed: December 9, 2019
    Publication date: November 3, 2022
    Applicant: AI SPEECH CO., LTD.
    Inventors: Yi REN, Jin ZHANG, Jianwei XU, Zhisheng CAO, Min CHU
  • Publication number: 20220351959
    Abstract: A layer stack is formed over a conductive material portion located on a substrate. The layer stack contains a first silicon oxide layer, a silicon nitride layer formed by chemical vapor deposition, and a second silicon oxide layer. A patterned etch mask layer including an opening is formed over the layer stack. A via cavity extending through the layer stack and down to the conductive material portion is formed by isotropically etching portions of the layer stack underlying the opening in the patterned etch mask layer using an isotropic etch process. A buffered oxide etch process may be used, in which the etch rate of the silicon nitride layer is less than, but is significant enough, compared to the etch rate of the first silicon oxide layer to provide tapered straight sidewalls on the silicon nitride layer. An optical device including a patterned layer stack can be provided.
    Type: Application
    Filed: July 19, 2022
    Publication date: November 3, 2022
    Inventors: Yi-Ren Wang, Yuan-Chih Hsieh
  • Publication number: 20220325396
    Abstract: A microstructure may be provided by forming a metal layer such as a molybdenum layer over a substrate. An aluminum nitride layer is formed on a top surface of the metal layer. A surface portion of the aluminum nitride layer is converted into a continuous aluminum oxide-containing layer by oxidation. A dielectric spacer layer may be formed over the continuous aluminum oxide-containing layer. Contact via cavities extending through the dielectric spacer layer, the continuous aluminum oxide containing layer, and the aluminum nitride layer and down to a respective portion of the at least one metal layer may be formed using etch processes that contain a wet etch step while suppressing formation of an undercut in the aluminum nitride layer. Contact via structures may be formed in the contact via cavities. The microstructure may include a micro-electromechanical system (MEMS) device containing a piezoelectric transducer.
    Type: Application
    Filed: June 17, 2022
    Publication date: October 13, 2022
    Inventors: Yuan-Chih Hsieh, Yi-Ren Wang, Hung-Hua Lin
  • Patent number: 11466151
    Abstract: A polyester composition includes a first polyester selected from one or more of aliphatic-aromatic copolyesters, which is a copolymer comprising repeating units A as shown in formula (I) and repeating units B as shown in formula (II), in which m is an integer of 2 to 10 and n is an integer of 2 to 8; p is an integer of 2 to 10; and m, n and p are the same or different from each other. Optionally, the polyester composition has a second polyester. The polyester composition includes at least two polyesters. The polyester composition can be used in shape memory materials, 3D print wires, heat shrinkable sleeves, functional layers, medical limb immobilization braces, heat shrinkable thin films, nonwoven fabrics, elastic fibers, etc.
    Type: Grant
    Filed: October 20, 2017
    Date of Patent: October 11, 2022
    Assignees: CHINA PETROLEUM & CHEMICAL CORPORATION, BEIJING RESEARCH INSTITUTE OF CHEMICAL INDUSTRY, CHINA PETROLEUM & CHEMICAL CORPORATION
    Inventors: Cui Zheng, Guixiang Zhu, Lizhi Liu, Wei Zhang, Xuerong Yao, Minqiao Ren, Ling Han, Yi Ren, Nan Chen, Ying Shi
  • Publication number: 20220322549
    Abstract: A middle frame includes an inner frame, a blocking member, and a covering member. The inner frame includes an outer surface and an inner surface opposite the outer surface. The inner frame further comprises at least one mounting hole penetrating the outer surface and the inner surface, the at least one mounting hole comprises an opening at the outer surface. The covering member covers the outer surface, and the blocking member is disposed between the covering member and the outer surface so as to cover the opening of the at least one mounting hole at the outer surface. An electronic device including the middle frame and a method for manufacturing the middle frame are also provided.
    Type: Application
    Filed: March 23, 2022
    Publication date: October 6, 2022
    Inventors: WEN-BIN HUANG, HSIU-FU LI, JE-WEI CHIANG, YI-REN FANG, YU-CHENG ZHANG, YU-JEN CHUANG
  • Patent number: 11463226
    Abstract: This application describes a resource indication method and a communications device. A resource indication method may include sending, by a first device, first indication information to a second device in an nth time unit, where the first indication information indicate a first time domain resource of a first link or a second link in an (n+k0)th time unit to an (n+k1)th time unit. In the method, the first link is a link between the first device and the second device, the second link is a link between the second device and a third device, k0 is an integer greater than or equal to 0 and less than or equal to k1, and k1 is an integer.
    Type: Grant
    Filed: October 31, 2019
    Date of Patent: October 4, 2022
    Assignee: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Yi Qin, Zhongfeng Li, Yi Ren, Zhihang Li, Liuliu Ji, Jian Luo
  • Publication number: 20220298178
    Abstract: A method for preparing an L-erythrobiopterin compound is provided. The L-erythrobiopterin compound has a structure represented by formula (I), and is mainly prepared from a compound having a structure represented by formula (II) or (III) through dihydroxylation. The preparation method of the L-erythrobiopterin compound is high in production efficiency, low in cost, environmentally friendly, and suitable for industrial production.
    Type: Application
    Filed: August 18, 2020
    Publication date: September 22, 2022
    Inventors: Bin RONG, Lizhi ZHAO, Wei LI, Yi REN
  • Publication number: 20220284323
    Abstract: Methods and systems are presented for providing a computer platform that manages the impacts of government regulations on existing software processes of an online service provider. A regulation document is obtained from a government agency. The regulation document is processed, and legal obligations relevant to an online service provider are extracted from the regulation document. An ensemble machine learning model is used to recommend, for each of the legal obligations, software controls that can be implemented within one or more software processes of the online service provider to mitigate a risk of the legal obligations. The ensemble machine learning model may include an attribute-based model and a text-based model. An explainable visual interface is provided to present the recommended software controls and context that indicates to a user how the software controls are determined for the legal obligations.
    Type: Application
    Filed: March 19, 2021
    Publication date: September 8, 2022
    Inventors: Sneha Venkatachalam, Ravi Retineni, Hang Yu, Zhaoyang Wang, Yi Ren, Zihao Zhao, Huiting Li, Gaoyuan Wang, Li Cao
  • Publication number: 20220285224
    Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a substrate. The semiconductor device structure includes a gate stack over the substrate. The semiconductor device structure includes a spacer over a side of the gate stack. The semiconductor device structure includes a dielectric layer over the substrate. The dielectric layer has a first recess, the dielectric layer has an upper portion and a first lower portion, the upper portion is over the first recess, the first recess is between the first lower portion and the spacer, and the upper portion has a convex curved sidewall.
    Type: Application
    Filed: May 24, 2022
    Publication date: September 8, 2022
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ming-Heng TSAI, Chun-Sheng LIANG, Pei-Lin WU, Yi-Ren CHEN, Shih-Hsun CHANG
  • Publication number: 20220283782
    Abstract: Methods and systems are presented for providing a computer platform that manages the impacts of government regulations on existing software processes of an online service provider. A regulation document is obtained from a government agency. The regulation document is processed, and legal obligations relevant to an online service provider are extracted from the regulation document. An ensemble machine learning model is used to recommend, for each of the legal obligations, software controls that can be implemented within one or more software processes of the online service provider to mitigate a risk of the legal obligations. The ensemble machine learning model may include an attribute-based model and a text-based model. An explainable visual interface is provided to present the recommended software controls and context that indicates to a user how the software controls are determined for the legal obligations.
    Type: Application
    Filed: March 19, 2021
    Publication date: September 8, 2022
    Inventors: Sneha Venkatachalam, Ravi Retineni, Hang Yu, Zhaoyang Wang, Yi Ren, Zihao Zhao, Huiting Li, Gaoyuan Wang, Li Cao
  • Patent number: D971251
    Type: Grant
    Filed: November 23, 2021
    Date of Patent: November 29, 2022
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chia-Pei Lu, Tsu-Yi Ren
  • Patent number: D978902
    Type: Grant
    Filed: October 25, 2021
    Date of Patent: February 21, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chia-Pei Lu, Tsu-Yi Ren
  • Patent number: D982088
    Type: Grant
    Filed: September 22, 2021
    Date of Patent: March 28, 2023
    Assignee: SHENZHEN TIANREN ELECTRONIC COMMERCE CO., LTD.
    Inventor: Yi Ren Zhan