Patents by Inventor Yi Yeon KIM

Yi Yeon KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ELECTRONIC DEVICES AND METHODS OF MANUFACTURING ELECTRONIC DEVICES
    Publication number: 20240178206
    Abstract: In one example, an electronic device includes a first substrate and a second substrate. The first substrate includes a substrate first side, a substrate second side, and a first conductive structure. An inner electronic component is coupled to the first conductive structure proximate to the substrate second side. An outer electronic component is coupled to the first conductive structure proximate to the substrate first side. The outer electronic component includes a body and a groove in the body configured to couple with an external interconnect. Inner interconnects couple the first substrate to the second substrate. The first substrate, the second substrate, the inner electronic component, and the outer electronic component are in a stacked configuration. The inner electronic component is interposed between the first substrate and the second substrate. Other examples and related methods are also disclosed herein.
    Type: Application
    Filed: November 27, 2022
    Publication date: May 30, 2024
    Applicant: Amkor Technology Singapore Holding Pte. Ltd.
    Inventors: Sang Hyeon LEE, Kyoung Yeon LEE, Jae Beom SHIM, Yi Seul HAN, Ji Yeon RYU, Woo Jun KIM
  • Method for etching atomic layer of graphene
    Patent number: 9245752
    Abstract: This present disclosure relates to an atomic layer etching method for graphene, including adsorbing reactive radicals onto a surface of the graphene and irradiating an energy source to the graphene on which the reactive radicals are adsorbed.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: January 26, 2016
    Assignee: Research & Business Foundation Sungkyunkwan University
    Inventors: Geun Young Yeom, Woong Sun Lim, Kyung Seok Min, Yi Yeon Kim, Jong Sik Oh
  • METHOD FOR ETCHING ATOMIC LAYER OF GRAPHINE
    Publication number: 20140206192
    Abstract: This present disclosure relates to an atomic layer etching method for graphene, including adsorbing reactive radicals onto a surface of the graphene and irradiating an energy source to the graphene on which the reactive radicals are adsorbed.
    Type: Application
    Filed: January 22, 2014
    Publication date: July 24, 2014
    Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Geun Young YEOM, Woong Sun LIM, Kyung Seok MIN, Yi Yeon KIM, Jong Sik OH
  • ATOMIC LAYER ETCHING APPARATUS AND ETCHING METHOD USING THE SAME
    Publication number: 20110192820
    Abstract: An atomic layer etching apparatus using reactive radicals and neutral beams and an etching method using the same are provided.
    Type: Application
    Filed: February 25, 2010
    Publication date: August 11, 2011
    Applicant: SUNGKYUNKWAN UNIVERSITY Foundation for Corporate Collaboration
    Inventors: Geun-Young Yeom, Woong-Sun Lim, Sang-Duk Park, Yi-Yeon Kim, Byoung-Jae Park, Je-Kwan Yeon