Abstract: An apparatus and a method for detecting heartbeat include a sensor configured to detect displacements of an object without contacting the object wherein the object displaces corresponding the a human's heartbeat, a data processing unit configured to extract a feature dataset from the detected displacement data, and a neural network configured to inference inter beat intervals from the extracted feature dataset using a pre-trained model.

Abstract: A program method for a memory device is provided. The memory device includes a plurality of memory cells, a bit line and word lines electrically connected to the plurality of memory cells. The plurality of memory cells includes a selected memory cell and unselected memory cells when the memory device is in a program operation. The program method including performing precharge steps, performing program steps and performing a verification step to the selected memory cell after the precharge steps and the program steps. Each of the precharge steps includes applying a precharge voltage to the bit line electrically connected to the unselected memory cells. Each of the program steps includes applying a program voltage to a word line of the word lines electrically connected to the selected memory cell.

Abstract: The present invention discloses an operation method of memory device, applied to a memory device including a number of word lines and one or more functional lines. The operation method includes: receiving a read command for a target memory cell of the memory device; and outputting a signal having a first waveform to a target word line corresponding to the target memory cell to be read among a plurality of the word lines of the memory device, output a signal having a second waveform to the one or more functional lines of the memory device, and output a signal having a third waveform to the word lines other than the target word line. A falling time of the third waveform is longer than a falling time of the first waveform.

Abstract: A method for determining quick-pass-write (QPW) operation in increment-step-program-pulse (ISPP) operation is provided. The QPW operation is simultaneously applying a bit line voltage during the ISPP operation. The method includes, according to bit line voltages varying in a first range and voltage difference values varying in a second range with respect to a verified voltage, estimating a shrinkage quantity of threshold voltage distribution width at each bit line voltage and each voltage difference value, so as to obtain a shrinkage-quantity topographic contour. According to the bit line voltages and the voltage difference values, a program shot number as needed to achieve the verified voltage is estimated, so as to obtain a program-shot-number topographic contour.

Abstract: A transistor is described including a fly-over conductor. The transistor has a gate, a channel and a source/drain terminal. The fly-over conductor is disposed over the source/drain terminal. A circuit is connected to the fly-over conductor to apply a bias voltage tending to offset effects on the transistor of charge trapped in insulating material. A word line driver can include a transistor with a fly-over conductor.

Abstract: A transistor is described including a fly-over conductor. The transistor has a gate, a channel and a source/drain terminal. The fly-over conductor is disposed over the source/drain terminal. A circuit is connected to the fly-over conductor to apply a bias voltage tending to offset effects on the transistor of charge trapped in insulating material. A word line driver can include a transistor with a fly-over conductor.

Abstract: A one-time programmable memory array includes a first row conductor extending in a first row direction and disposed at a first elevation, a second row conductor extending in a second row direction and disposed at a second elevation and a column conductor extending in a column direction and disposed adjacent to the first row conductor and adjacent to the second row conductor. The array also includes a dielectric layer covering at least a portion of the column conductor, a fuse link coupled between the dielectric layer on the column conductor and the second row conductor.

Abstract: A one-time programmable memory array includes a first row conductor extending in a first row direction and disposed at a first elevation, a second row conductor extending in a second row direction and disposed at a second elevation and a column conductor extending in a column direction and disposed adjacent to the first row conductor and adjacent to the second row conductor. The array also includes a dielectric layer covering at least a portion of the column conductor, a fuse link coupled between the dielectric layer on the column conductor and the second row conductor.

Abstract: A one-time programmable memory array includes a first row conductor extending in a first row direction and disposed at a first elevation, a second row conductor extending in a second row direction and disposed at a second elevation and a column conductor extending in a column direction and disposed adjacent to the first row conductor and adjacent to the second row conductor. The array also includes a dielectric layer covering at least a portion of the column conductor, a fuse link coupled between the dielectric layer on the column conductor and the second row conductor.

Abstract: A one-time programmable memory array includes a first row conductor extending in a first row direction and disposed at a first elevation, a second row conductor extending in a second row direction and disposed at a second elevation and a column conductor extending in a column direction and disposed adjacent to the first row conductor and adjacent to the second row conductor. The array also includes a dielectric layer covering at least a portion of the column conductor, a fuse link coupled between the dielectric layer on the column conductor and the second row conductor.

Abstract: A multi-bit memory cell includes a substrate; a multi-bit charge-trapping cell over the substrate, the multi-bit charge-trapping cell having a first lateral side and a second lateral side; a source region in the substrate, a portion of the source region being under the first side of the multi-bit charge-trapping cell; a drain region in the substrate, a portion of the drain region being under the second side of the multi-bit charge-trapping cell; and a channel region in the substrate between the source region and the drain region. The channel region has one of a p-type doping and an n-type doping, and the doping is configured to provide a highest doping concentration near the central portion of the channel region.

Abstract: A method for fabricating a floating gate memory device comprises using self-aligned process for formation of a fourth poly layer over a partial gate structure that does not require an additional photolithographic step. Accordingly, enhanced device reliability can be achieved because a higher GCR can be maintained with lower gate bias levels. In addition, process complexity can be reduced, which can increase throughput and reduce device failures.

Abstract: A multi-bit flash memory and a reading method thereof. Multiple reference memory cells for saving reserved data are provided to operate together with multiple data memory cells. Before the data memory cells are read, data stored in the reference memory cell is sensed based on a present reference current. Then, a value of a new reference current for reading the data memory cells is determined according to a difference between the sensed data and the reserved data.

Abstract: A one-time programmable memory array includes a first row conductor extending in a first row direction and disposed at a first elevation, a second row conductor extending in a second row direction and disposed at a second elevation and a column conductor extending in a column direction and disposed adjacent to the first row conductor and adjacent to the second row conductor. The array also includes a dielectric layer covering at least a portion of the column conductor, a fuse link coupled between the dielectric layer on the column conductor and the second row conductor.

Abstract: A semiconductor fabrication process allows the fabrication of both logic and memory devices using a conventional CMOS process with a few additional steps. The additional steps, however, do not require additional masks. Accordingly, the process can be reduce the complexity, time, and cost for fabricating logic and memory devices on the same substrate, especially for embedded applications.

Abstract: A NAND type multi-bit charge storage memory array comprises a first and a second memory strings each of which includes one or more charge storage memory cells and two select transistors. The charge storage memory cells are connected in series to form a memory cell string. The two select transistors are connected in series to both ends of the memory cell string, respectively. The NAND type multi-bit charge storage memory array further comprises a shared bit line and a first and a second bit lines. The shared bit line is connected with the first ends of the first and the second memory strings. The first and the second bit lines are connected to the second ends of the first and the second memory strings, respectively. The first select transistor and the second select transistor of each memory string are controlled by a first and a second select transistor control lines, respectively.

Abstract: A multi-bit flash memory and a reading method thereof. Multiple reference memory cells for saving reserved data are provided to operate together with multiple data memory cells. Before the data memory cells are read, data stored in the reference memory cell is sensed based on a present reference current. Then, a value of a new reference current for reading the data memory cells is determined according to a difference between the sensed data and the reserved data.

Abstract: A multi-bit flash memory and a reading method thereof. Multiple reference memory cells for saving reserved data are provided to operate together with multiple data memory cells. Before the data memory cells are read, data stored in the reference memory cell is sensed based on a present reference current. Then, a value of a new reference current for reading the data memory cells is determined according to a difference between the sensed data and the reserved data.

Abstract: A method for manufacturing a NAND flash memory is provided. First, a substrate is provided. Next, a tunneling dielectric layer, a first conductive layer and a mask layer are sequentially formed on the substrate. Next, a plurality of isolation structures is formed in the mask layer, the first conductive layer, the tunneling dielectric layer and the substrate. Next, the mask layer is removed, so that the top surface of each isolation structure is higher than that of the first conductive layer. Next, a second conductive layer is formed on the exposed sidewalls of the isolation structures. Next, an inter-gate dielectric layer and a third conductive layer are sequentially formed on the substrate.

Abstract: A one-time programmable memory array includes a first row conductor extending in a first row direction and disposed at a first elevation, a second row conductor extending in a second row direction and disposed at a second elevation and a column conductor extending in a column direction and disposed adjacent to the first row conductor and adjacent to the second row conductor. The array also includes a dielectric layer covering at least a portion of the column conductor, a fuse link coupled between the dielectric layer on the column conductor and the second row conductor.