Patents by Inventor Ying-Chan HUNG

Ying-Chan HUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240145421
    Abstract: Provided are a passivation layer for forming a semiconductor bonding structure, a sputtering target making the same, a semiconductor bonding structure and a semiconductor bonding process. The passivation layer is formed on a bonding substrate by sputtering the sputtering target; the passivation layer and the sputtering target comprise a first metal, a second metal or a combination thereof. The bonding substrate comprises a third metal. Based on a total atom number of the surface of the passivation layer, O content of the surface of the passivation layer is less than 30 at %; the third metal content of the surface of the passivation layer is less than or equal to 10 at %. The passivation layer has a polycrystalline structure. The semiconductor bonding structure sequentially comprises a first bonding substrate, a bonding layer and a second bonding substrate: the bonding layer is mainly formed by the passivation layer and the third metal.
    Type: Application
    Filed: October 27, 2023
    Publication date: May 2, 2024
    Inventors: Kuan-Neng CHEN, Zhong-Jie HONG, Chih-I CHO, Ming-Wei WENG, Chih-Han CHEN, Chiao-Yen WANG, Ying-Chan HUNG, Hong-Yi WU, CHENG-YEN HSIEH
  • Patent number: 11959834
    Abstract: A manufacturing method of a sample collection component, by which a removable light shielding component is disposed on a main body of the sample collection component to shield at least a portion of the light that passes through a storing space of the sample collection component.
    Type: Grant
    Filed: June 16, 2023
    Date of Patent: April 16, 2024
    Assignee: Materials Analysis Technology Inc.
    Inventors: Pin Chang, Ying-Chan Hung, Hung-Jen Chen
  • Publication number: 20230332985
    Abstract: A manufacturing method of a sample collection component, by which a removable light shielding component is disposed on a main body of the sample collection component to shield at least a portion of the light that passes through a storing space of the sample collection component.
    Type: Application
    Filed: June 16, 2023
    Publication date: October 19, 2023
    Applicant: Materials Analysis Technology Inc.
    Inventors: Pin Chang, Ying-Chan Hung, Hung-Jen Chen
  • Patent number: 10615449
    Abstract: An electrode material for a secondary battery and a secondary battery are provided. The electrode material for the secondary battery includes tin-manganese-nickel-oxide. The secondary battery includes a cathode, an anode, an electrolyte, and a package structure, wherein the anode includes the electrode material for the secondary battery.
    Type: Grant
    Filed: June 15, 2018
    Date of Patent: April 7, 2020
    Assignee: National Tsing Hua University
    Inventors: Yu-Ying Chu, Ying-Chan Hung, Han-Yi Chen, Tri-Rung Yew
  • Publication number: 20190305357
    Abstract: An electrode material for a secondary battery and a secondary battery are provided. The electrode material for the secondary battery includes tin-manganese-nickel-oxide. The secondary battery includes a cathode, an anode, an electrolyte, and a package structure, wherein the anode includes the electrode material for the secondary battery.
    Type: Application
    Filed: June 15, 2018
    Publication date: October 3, 2019
    Applicant: National Tsing Hua University
    Inventors: Yu-Ying Chu, Ying-Chan Hung, Han-Yi Chen, Tri-Rung Yew
  • Publication number: 20190226946
    Abstract: A manufacturing method of a sample collection component, by which a removable light shielding component is disposed on a main body of the sample collection component to shield at least a portion of the light that passes through a storing space of the sample collection component.
    Type: Application
    Filed: April 3, 2019
    Publication date: July 25, 2019
    Applicant: Materials Analysis Technology Inc.
    Inventors: Pin Chang, Ying-Chan Hung, Hung-Jen Chen
  • Patent number: 10309875
    Abstract: A sample collection component including a main body and a removable light shielding component is provided. The main body has a sample storing space which is sealable and allows light to pass through. The removable light shielding component is disposed on the main body and located outside the sample storing space for shielding at least a portion of the light passing through the sample storing space. In addition, a manufacturing method of the sample collection component is also provided.
    Type: Grant
    Filed: March 8, 2016
    Date of Patent: June 4, 2019
    Assignee: Materials Analysis Technology Inc.
    Inventors: Pin Chang, Ying-Chan Hung, Hung-Jen Chen
  • Publication number: 20170176298
    Abstract: A sample collection component including a main body and a removable light shielding component is provided. The main body has a sample storing space which is sealable and allows light to pass through. The removable light shielding component is disposed on the main body and located outside the sample storing space for shielding at least a portion of the light passing through the sample storing space. In addition, a manufacturing method of the sample collection component is also provided.
    Type: Application
    Filed: March 8, 2016
    Publication date: June 22, 2017
    Inventors: Pin Chang, Ying-Chan Hung, Hung-Jen Chen
  • Patent number: 9450184
    Abstract: A multilayer-stacked resistive random access memory device includes: first and second electrode layers; a resistive oxide layer which is electrically coupled to the first and second electrode layers, which exhibits resistive switching characteristics and which includes a metal oxide containing a first metal selected from the group consisting of W, Ti, Zr, Sn, Ta, Ni, Ag, Cu, Co, Hf, Ru, Mo, Cr, Fe, Al, and combinations thereof; and a sulfide layer contacting the resistive oxide layer and including a metal sulfide that contains a second metal that is the same as the first metal.
    Type: Grant
    Filed: June 11, 2015
    Date of Patent: September 20, 2016
    Assignee: NATIONAL TSING HUA UNIVERSITY
    Inventors: Tri-Rung Yew, Ying-Chan Hung, Tsang-Hsuan Wang, Pin Chang
  • Publication number: 20160240779
    Abstract: A multilayer-stacked resistive random access memory device includes: first and second electrode layers; a resistive oxide layer which is electrically coupled to the first and second electrode layers, which exhibits resistive switching characteristics and which includes a metal oxide containing a first metal selected from the group consisting of W, Ti, Zr, Sn, Ta, Ni, Ag, Cu, Co, Hf, Ru, Mo, Cr, Fe, Al, and combinations thereof; and a sulfide layer contacting the resistive oxide layer and including a metal sulfide that contains a second metal that is the same as the first metal.
    Type: Application
    Filed: June 11, 2015
    Publication date: August 18, 2016
    Applicant: National Tsing Hua University
    Inventors: Tri-Rung YEW, Ying-Chan HUNG, Tsang-Hsuan WANG, Pin CHANG
  • Publication number: 20150259783
    Abstract: An electron beam apparatus for patterned metal reduction, applied to generate metal lines or patterns on a substrate, includes an electron beam generating system with functions of collimating, focusing and scanning electron beams, an electron-transparent membrane of a vacuum chamber for allowing the electron beam to penetrate through, a stage mounted at a position to face the electron-transparent membrane, a substrate placed on the stage to face the electron-transparent membrane, a thin liquid layer containing metal ions and mounted on the substrate, and an environment control device for controlling the temperature, the pressure and the atmosphere around the substrate. A method for using the electron beam apparatus to generate the metal lines or patterns on the substrate is to focus the electron beam onto the substrate and have the electron beam to scan the substrate repeatedly along a predetermined path till a desired metal pattern is reduced on the substrate.
    Type: Application
    Filed: June 20, 2014
    Publication date: September 17, 2015
    Inventors: SHIH-EN LAI, YING-CHAN HUNG, PIN CHANG, TRI-RUNG YEW
  • Publication number: 20150093840
    Abstract: A colorimetric immunoassay of the present invention uses nanostructured material with high absorption and high scattering ability as a label material for biosensors. Subject matters to be measured may be characterized or quantified by determining the changes in optical properties of the nanostructured material. The biosensor of the present invention may be operated in broad light wavelength range and detected by direct observation with naked eye. The biosensor of the present invention may be also provided with advantages such as higher sensitivity and lower cost.
    Type: Application
    Filed: December 5, 2013
    Publication date: April 2, 2015
    Applicant: NATIONAL TSING HUA UNIVERSITY
    Inventors: Jing-Huei HUANG, Ying-Chan HUNG, Tri-Rung YEW, Pin CHANG