Abstract: An overlay alignment detection apparatus for a display device and an exposure process system are provided, the overlay alignment detection apparatus including a bearing frame for bearing the display device, a control circuit, a detection assembly and an analysis circuit. The control circuit is to send control commands to the detection assembly depending on pre-stored coordinate information of a reference point within an overlay area of the display device in response to the bearing frame being at an idle time among processes; the detection assembly is to be moved to the overlay area on the bearing frame according to the control commands sent by the control circuit, to acquire images of the overlay area, and to send the acquired images to the analysis circuit; and the analysis circuit is to analyze and process an overlay alignment condition of the display device, with the images sent by the detection assembly.

Abstract: Embodiments of this invention relate to a display substrate and a method for producing the same, as well as a display apparatus.

Abstract: This disclosure relates to the field of display technologies, and discloses a method for manufacturing an array substrate, an array substrate, a grayscale mask plate and a display device. The method includes forming a transparent conductive layer and a metal layer sequentially on a base substrate. A photoresist pattern is formed on the base: substrate on which the transparent conductive layer and the metal layer have been formed The transparent conductive layer and the metal layer corresponding to a photoresist-free region are removed. The photoresist in a second photoresist region is removed. The metal layer corresponding to the second photoresist region is removed to expose a pixel electrode. Additionally, the photoresist in a first photoresist region is removed to expose a first electrode, a second electrode and a first data line.

Abstract: This disclosure relates to the field of display technologies, and discloses a method for manufacturing an array substrate, an array substrate, a grayscale mask plate and a display device. The method includes forming a transparent conductive layer and a metal layer sequentially on a base substrate. A photoresist pattern is formed on the base: substrate on which the transparent conductive layer and the metal layer have been formed The transparent conductive layer and the metal layer corresponding to a photoresist-free region are removed. The photoresist in a second photoresist region is removed. The metal layer corresponding to the second photoresist region is removed to expose a pixel electrode. Additionally, the photoresist in a first photoresist region is removed to expose a first electrode, a second electrode and a first data line.

Abstract: An overlay alignment detection apparatus for a display device and an exposure process system are provided by embodiments of the present disclosure, the overlay alignment detection apparatus including a bearing frame for bearing the display device, a control device, a detection device and an analysis device. The control device is configured to send control commands to the detection device depending on pre-stored coordinate information of a reference point within an overlay area of the display device when the bearing frame is at an idle time among processes; the detection device is configured to be moved to the overlay area of the display device on the bearing frame according to the control commands sent by the control device, to acquire images of the overlay area, and to send the acquired images to the analysis device; and the analysis device is configured to analyze and process an overlay alignment condition of the display device, with the images sent by the detection device.

Abstract: Embodiments of this invention relate to a display substrate and a method for producing the same, as well as a display apparatus.

Abstract: A film patterning method is provided. The method comprises: performing a dry etching process on a film to be patterned, so as to form a patterned film; removing a suspended particle on the patterned film; and performing another dry etching process on the patterned film after the suspended particle is removed, to form a final pattern of the film. By moving or completely removing the suspended particle on the patterned film and then performing another dry etching process on the patterned film to etch away the etching residue, existence of the etching residue is completely avoided in the final pattern of the film, so that the product yield is improved and the product quality is ensured.

Abstract: A film patterning method is provided. The method includes: forming a to-be-patterned film on a surface of a base substrate; forming a protective layer for blocking foreign materials on a surface of the to-be-patterned film, before moving the base substrate to an etching device to pattern the to-be-patterned film; and forming a patterned mask, and etching the to-be-patterned film with the patterned mask so as to form a patterned film.

Abstract: The present invention provides an array substrate and a manufacturing method thereof and a display device, belonging to the field of display technology and solving the problems that the display quality is reduced and the normal watching is affected due to alignment shifting during alignment in an existing thin film transistor liquid crystal display. The array substrate of the present invention includes a plurality of sub-pixel units, wherein a plurality of light forming units corresponding to the sub-pixel units are arranged on a light-exiting surface of the array substrate, and each of the light forming unit is configured to form light of a color of the sub-pixel units corresponding thereto. When the array substrate of the present invention is applied to the display device, the display quality of the display device may be improved.