Abstract: According to one embodiment, a mold includes a base, a first concave pattern, a second concave pattern, and a third concave pattern. The base includes a first surface and a pedestal projecting from the first surface. The pedestal includes a first region and a second region disposed outside the first region. The first concave pattern is formed in the first region. The second concave pattern is formed in the second region. The third concave pattern extends from the first region to the second region.

Abstract: A template substrate of an embodiment is provided with a substrate portion and a covering portion. The substrate portion is formed of a first light transmitting material. The substrate portion includes a first surface on which a template pattern transferred by imprint is formed and a second surface on a surface side opposed to the first surface on which predetermined work is performed. The covering portion covers at least a part of the second surface with the second light transmitting material.

Abstract: In an imprint method according to one embodiment, a template on which a template pattern is formed is pushed against resist on a substrate to be transferred while the resist is cured in this state. The template is subsequently separated from the cured resist. The template is then degassed from the template pattern surface side between after the template is separated from the cured resist and till the template is pushed against resist at the next shot.

Abstract: According to one embodiment, a mold includes a base, a first concave pattern, a second concave pattern, and a third concave pattern. The base includes a first surface and a pedestal projecting from the first surface. The pedestal includes a first region and a second region disposed outside the first region. The first concave pattern is formed in the first region. The second concave pattern is formed in the second region. The third concave pattern extends from the first region to the second region.

Abstract: According to one embodiment, a pattern formation method is disclosed. The method includes preparing a substrate having an underlying pattern and a mold having a concave/convex pattern. The method cures the resin in an uncured region and separate the mold from the resin. The curing the resin includes first and second curing processes. When the uncured region is provided in a plurality, the first process includes performing position alignment of the mold with reference to the substrate, determining a positional displacement amount of the concave/convex pattern with reference to the underlying pattern, and curing the resin in the uncured region having the smallest positional displacement amount. The performing, the determining and the curing are repeated until the uncured regions are reduced to one. When the uncured region is one, the second process includes performing position alignment of the mold with reference to the substrate, and curing the resin.

Abstract: In one embodiment, an imprint apparatus includes a template holding part configured to hold a template for imprint. The apparatus further includes a template moving part configured to move the template to press the template onto a light curing resin on a transfer target substrate or to demold the template from the light curing resin. The apparatus further includes a light source configured to irradiate the light curing resin with light to cure the light curing resin. The apparatus further includes a demold control part configured to control a demold speed or a demold angle of the template, based on a position of a shot region from which the template is to be demolded, when demolding the template from the light curing resin.

Abstract: According to one embodiment, first image information of a mold is acquired by irradiating the mold with first light, the mold having an uneven pattern with a shape corresponding to a pattern to be transferred onto a substrate to be processed. The position of the uneven pattern of the mold is adjusted by applying stress to the mold. Second image information is acquired by irradiating the mold whose position is adjusted with the first light. Stress information of the mold whose position is adjusted is measured by comparing the first image information with the second image information. The position adjustment is repeated until the measurement result satisfies a desired condition, and a pattern is formed on the substrate by using the mold whose position is adjusted.

Abstract: In an imprint method according to embodiments, light that hardens a resist is irradiated to a light irradiation region near an alignment mark in order to prevent the resist from being filled in the alignment mark of a template, when the alignment process between the template and a substrate is performed. After the alignment process is completed, the resist is filled in the template pattern and the alignment mark, and then, light that hardens the resist is irradiated onto the template.

Abstract: In an imprint method according to one embodiment, a template on which a template pattern is formed is pushed against resist on a substrate to be transferred while the resist is cured in this state. The template is subsequently separated from the cured resist. The template is then degassed from the template pattern surface side between after the template is separated from the cured resist and till the template is pushed against resist at the next shot.

Abstract: According to one embodiment, a nanoimprint template using a pattern transcription to a substrate by a nanoimprint technique, the template includes a transcription pattern and an alignment mark on a main surface of a main body, wherein the alignment mark comprises a polarizer.

Abstract: In one embodiment, an imprint apparatus includes a template holding part configured to hold a template for imprint. The apparatus further includes a template moving part configured to move the template to press the template onto a light curing resin on a transfer target substrate or to demold the template from the light curing resin. The apparatus further includes a light source configured to irradiate the light curing resin with light to cure the light curing resin. The apparatus further includes a demold control part configured to control a demold speed or a demold angle of the template, based on a position of a shot region from which the template is to be demolded, when demolding the template from the light curing resin.

Abstract: According to one embodiment, a pattern forming method for imprinting an imprinting surface having recess and protrusion of a template onto an imprint material provided on a target substrate is disclosed. The method includes filling a recess portion of the recess and protrusion with the imprint material. A photo-deformable layer is interposed between at least one of a location between the imprinting surface and the imprint material and a location between the target substrate and the imprint material during the filling. A configuration of the photo-deformable layer is deformable by light irradiation. The method includes curing the imprint material while the recess portion is filled with the imprint material. The method includes releasing the cured imprint material from the imprinting surface by irradiating the photo-deformable layer with light and by deforming the photo-deformable layer. The light has an intensity varying within a plane parallel to the imprinting surface.

Abstract: According to one embodiment, first image information of a mold is acquired by irradiating the mold with first light, the mold having an uneven pattern with a shape corresponding to a pattern to be transferred onto a substrate to be processed. The position of the uneven pattern of the mold is adjusted by applying stress to the mold. Second image information is acquired by irradiating the mold whose position is adjusted with the first light. Stress information of the mold whose position is adjusted is measured by comparing the first image information with the second image information. The position adjustment is repeated until the measurement result satisfies a desired condition, and a pattern is formed on the substrate by using the mold whose position is adjusted.

Abstract: An imprint mold includes a substrate, a concave and convex pattern provided on the substrate and corresponding to a pattern to be transferred, and a gas permeable region having higher gas permeability than molten quartz in which impurities are not doped.