Patents by Inventor Yoji Ogawa

Yoji Ogawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11655190
    Abstract: The present invention has solved the problems of conventional molding materials, and provides a hydraulic composition for additive manufacturing devices having high strength development, particularly high early strength development, and less generation of gas defect and graphite spheroidization defect. Specifically, the hydraulic composition for additive manufacturing devices of the present invention at least contains calcium aluminate. It is preferable that the hydraulic composition contain 0.5-10 parts by mass of gypsum with respect to 100 parts by mass of the calcium aluminate.
    Type: Grant
    Filed: June 28, 2017
    Date of Patent: May 23, 2023
    Assignee: TAIHEIYO CEMENT CORPORATION
    Inventors: Yoshifumi Ohgi, Yoji Ogawa, Makoto Tanimura, Atsuya Toba, Hayato Suzuki
  • Patent number: 11173539
    Abstract: A hydraulic composition for an additive manufacturing device has an excellent initial flexural strength development property and dimensional stability. The hydraulic composition includes 1.5 to 14 parts by mass of a polymer with respect to 100 parts by mass of an inorganic binder. In addition, in a hydraulic composition for an additive manufacturing device, the inorganic binder may contain 50 to 100 mass % of a calcium aluminate with respect to 100 mass % of the entire inorganic binder, and in a hydraulic composition for an additive manufacturing device the inorganic binder, may contain 0 to 50 mass % of rapid hardening cement with respect to 100 mass % of the entire inorganic binder.
    Type: Grant
    Filed: July 30, 2018
    Date of Patent: November 16, 2021
    Assignee: TAIHEIYO CEMENT CORPORATION
    Inventors: Yoshifumi Ohgi, Yoji Ogawa, Yusuke Ishii, Takeshi Nakazaki, Shinya Naka
  • Publication number: 20200180013
    Abstract: The present invention provides a hydraulic composition for an additive manufacturing device having an excellent initial flexural strength development property and dimensional stability, the hydraulic composition for an additive manufacturing device including: 1.5 to 14 parts by mass of a polymer with respect to 100 parts by mass of an inorganic binder. In addition, the present invention preferably provides a hydraulic composition for an additive manufacturing device in which the inorganic binder contains 50 to 100 mass % of a calcium aluminate with respect to 100 mass % of the entire inorganic binder, and more preferably provides a hydraulic composition for an additive manufacturing device in which the inorganic binder contains 0 to 50 mass % of rapid hardening cement with respect to 100 mass % of the entire inorganic binder.
    Type: Application
    Filed: July 30, 2018
    Publication date: June 11, 2020
    Inventors: Yoshifumi OHGI, Yoji OGAWA, Yusuke ISHII, Takeshi NAKAZAKI, Shinya NAKA
  • Publication number: 20200039883
    Abstract: The present invention has solved the problems of conventional molding materials, and provides a hydraulic composition for additive manufacturing devices having high strength development, particularly high early strength development, and less generation of gas defect and graphite spheroidization defect. Specifically, the hydraulic composition for additive manufacturing devices of the present invention at least contains calcium aluminate. It is preferable that the hydraulic composition contain 0.5-10 parts by mass of gypsum with respect to 100 parts by mass of the calcium aluminate.
    Type: Application
    Filed: June 28, 2017
    Publication date: February 6, 2020
    Inventors: Yoshifumi OHGI, Yoji OGAWA, Makoto TANIMURA, Atsuya TOBA, Hayato SUZUKI
  • Patent number: 7822548
    Abstract: A navigation apparatus of the invention includes a display portion that displays a guidance screen and a removably installed recording medium, the navigation apparatus being provided in a vehicle and guiding the vehicle along a guidance path. When candidate site data created in an external apparatus has been stored on the storage medium, a screen for selectively setting the end point of the guidance path based on the candidate site data is displayed in the display portion, and when setting the end point, a guidance path that arrives at the end point is calculated. The candidate site data includes information related to one or a plurality of locations that have been designated in advance by a user of the navigation apparatus, and the end point is selected from the one or plurality of locations.
    Type: Grant
    Filed: May 23, 2007
    Date of Patent: October 26, 2010
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Ikunori Hisada, Hiroshi Nakashima, Yoji Ogawa
  • Publication number: 20090269237
    Abstract: The high-strength non-combustible magnesium alloy is obtained by adding at least one supplementary additive selected from among carbon (C), molybdenum (Mo), niobium (Nb), silicon (Si), tungsten (W), alumina (Al2O3), magnesium silicide (Mg2Si) and silicon carbide (SiC) to small chip-like blocks of a non-combustible magnesium alloy resulting from adding 0.5 to 5.0% by mass of calcium to a magnesium alloy to produce a crushed product, and subjecting the same to forming, sintering and plastic working. The high-strength non-combustible magnesium alloy exhibits excellent joining ability, and can therefore enhance weldability when used in a filler metal.
    Type: Application
    Filed: February 28, 2007
    Publication date: October 29, 2009
    Applicant: NATIONAL INSTITUTE OF ADVANCED INDSUTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Tomio Satoh, Hidetoshi Ueno, Yoji Ogawa
  • Publication number: 20070276585
    Abstract: A navigation apparatus of the invention includes a display portion that displays a guidance screen and a removably installed recording medium, the navigation apparatus being provided in a vehicle and guiding the vehicle along a guidance path. When candidate site data created in an external apparatus has been stored on the storage medium, a screen for selectively setting the end point of the guidance path based on the candidate site data is displayed in the display portion, and when setting the end point, a guidance path that arrives at the end point is calculated. The candidate site data includes information related to one or a plurality of locations that have been designated in advance by a user of the navigation apparatus, and the end point is selected from the one or plurality of locations.
    Type: Application
    Filed: May 23, 2007
    Publication date: November 29, 2007
    Applicant: SANYO ELECTRIC CO., LTD.
    Inventors: Ikunori HISADA, Hiroshi NAKASHIMA, Yoji OGAWA
  • Patent number: 6806941
    Abstract: A method of forming a pattern for a semiconductor device comprises the steps of forming a photosensitive film on a substrate and radiating the photosensitive film on the substrate with a beam of a predetermined shape consisting of one of a charged particle beam and an electromagnetic beam, thereby forming an exposed region of a desired shape, the latter step including the step of exposing each of unit regions by a single shot of the beam of the predetermined shape for a predetermined period of time, repeating the exposure a plurality of times, and butt-joining the exposed unit regions to thereby form the exposed region of the desired shape, wherein, in the step of forming the exposed region of the desired shape, butting portions of the unit regions are situated in a first area of a layer to be formed other than a second area in the layer in which predetermined characteristics of a function of the semiconductor device are determined by a pattern width of the exposed region in association with another pattern f
    Type: Grant
    Filed: December 10, 2001
    Date of Patent: October 19, 2004
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Soichi Inoue, Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto
  • Publication number: 20020045132
    Abstract: A method of forming a pattern for a semiconductor device comprises the steps of forming a photosensitive film on a substrate and radiating the photosensitive film on the substrate with a beam of a predetermined shape consisting of one of a charged particle beam and an electromagnetic beam, thereby forming an exposed region of a desired shape, the latter step including the step of exposing each of unit regions by a single shot of the beam of the predetermined shape for a predetermined period of time, repeating the exposure a plurality of times, and butt-joining the exposed unit regions to thereby form the exposed region of the desired shape, wherein, in the step of forming the exposed region of the desired shape, butting portions of the unit regions are situated in a first area of a layer to be formed other than a second area in the layer in which predetermined characteristics of a function of the semiconductor device are determined by a pattern width of the exposed region in association with another pattern f
    Type: Application
    Filed: December 10, 2001
    Publication date: April 18, 2002
    Inventors: Soichi Inoue, Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto
  • Patent number: 6335145
    Abstract: A method of forming a pattern for a semiconductor device comprises the steps of forming a photosensitive film on a substrate and radiating the photosensitive film on the substrate with a beam of a predetermined shape consisting of one of a charged particle beam and an electromagnetic beam, thereby forming an exposed region of a desired shape, the latter step including the step of exposing each of unit regions by a single shot of the beam of the predetermined shape for a predetermined period of time, repeating the exposure a plurality of times, and butt-joining the exposed unit regions to thereby form the exposed region of the desired shape, wherein, in the step of forming the exposed region of the desired shape, butting portions of the unit regions are situated in a first area of a layer to be formed other than a second area in the layer in which predetermined characteristics of a function of the semiconductor device are determined by a pattern width of the exposed region in association with another pattern f
    Type: Grant
    Filed: November 6, 2000
    Date of Patent: January 1, 2002
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Soichi Inoue, Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto
  • Patent number: 6165652
    Abstract: A method of forming a photomask of a semiconductor device comprising the steps of forming a photosensitive film on a substrate and exposing the photosensitive film on the substrate by radiating with a radiation beam a plurality of butting unit regions defining butting portions between the butting unit regions and controlling said radiating of the butting unit region so that the butting portions of the butting unit regions are formed only in portions corresponding to isolation regions or alternatively, they are not formed in portions corresponding to contact areas.
    Type: Grant
    Filed: December 15, 1999
    Date of Patent: December 26, 2000
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Soichi Inoue, Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto
  • Patent number: 6040114
    Abstract: A method of forming a pattern for a semiconductor device comprises the steps of forming a photosensitive film on a substrate and radiating the photosensitive film on the substrate with a beam of a predetermined shape consisting of one of a charged particle beam and an electromagnetic beam, thereby forming an exposed region of a desired shape, the latter step including the step of exposing each of unit regions by a single shot of the beam of the predetermined shape for a predetermined period of time, repeating the exposure a plurality of times, and butt-joining the exposed unit regions to thereby form the exposed region of the desired shape, wherein, in the step of forming the exposed region of the desired shape, butting portions of the unit regions are situated in a first area of a layer to be formed other than a second area in the layer in which predetermined characteristics of a function of the semiconductor device are determined by a pattern width of the exposed region in association with another pattern f
    Type: Grant
    Filed: April 23, 1997
    Date of Patent: March 21, 2000
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Soichi Inoue, Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto
  • Patent number: 5807650
    Abstract: A method of repairing a defect existing on a photo mask comprising a transparent substrate and a mask pattern formed on the substrate, comprises steps of irradiating a focused ion beam toward the defect and supplying XeF.sub.2 gas to the defect, when an etching rate of the defect by the focused ion beam and XeF.sub.2 is 1.7 times greater than an etching rate by a sole irradiation of the focused ion beam.
    Type: Grant
    Filed: August 20, 1997
    Date of Patent: September 15, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Haruki Komano, Hiroko Nakamura, Munehiro Ogasawara, Satoshi Masuda, Katsuya Okumura, Yoji Ogawa
  • Patent number: 4926487
    Abstract: A speaker system for reproducing heavy low sounds comprises a tube body having a tubular straight portion and a pair of tubular arms, each of the arms extending substantially in parallel to each other in the forward direction to provide therebetween a wide space opening forward for accommodation, each arm further having sound radiation outlets formed in its forward end portion. A speaker driver is attached to the forward end of one of the arms and communicating with the sound radiation outlets, and a drone cone attached to the forward end of the other of the arms and communicating with the sound radiation outlets.
    Type: Grant
    Filed: March 15, 1989
    Date of Patent: May 15, 1990
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Tetsuji Yoshida, Yoshiaki Teraoka, Yoji Ogawa, Ken Kozaki, Kenji Hara, Hiroshi Satou, Akira Yoshino