Patents by Inventor Yoji Ogawa
Yoji Ogawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11655190Abstract: The present invention has solved the problems of conventional molding materials, and provides a hydraulic composition for additive manufacturing devices having high strength development, particularly high early strength development, and less generation of gas defect and graphite spheroidization defect. Specifically, the hydraulic composition for additive manufacturing devices of the present invention at least contains calcium aluminate. It is preferable that the hydraulic composition contain 0.5-10 parts by mass of gypsum with respect to 100 parts by mass of the calcium aluminate.Type: GrantFiled: June 28, 2017Date of Patent: May 23, 2023Assignee: TAIHEIYO CEMENT CORPORATIONInventors: Yoshifumi Ohgi, Yoji Ogawa, Makoto Tanimura, Atsuya Toba, Hayato Suzuki
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Patent number: 11173539Abstract: A hydraulic composition for an additive manufacturing device has an excellent initial flexural strength development property and dimensional stability. The hydraulic composition includes 1.5 to 14 parts by mass of a polymer with respect to 100 parts by mass of an inorganic binder. In addition, in a hydraulic composition for an additive manufacturing device, the inorganic binder may contain 50 to 100 mass % of a calcium aluminate with respect to 100 mass % of the entire inorganic binder, and in a hydraulic composition for an additive manufacturing device the inorganic binder, may contain 0 to 50 mass % of rapid hardening cement with respect to 100 mass % of the entire inorganic binder.Type: GrantFiled: July 30, 2018Date of Patent: November 16, 2021Assignee: TAIHEIYO CEMENT CORPORATIONInventors: Yoshifumi Ohgi, Yoji Ogawa, Yusuke Ishii, Takeshi Nakazaki, Shinya Naka
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Publication number: 20200180013Abstract: The present invention provides a hydraulic composition for an additive manufacturing device having an excellent initial flexural strength development property and dimensional stability, the hydraulic composition for an additive manufacturing device including: 1.5 to 14 parts by mass of a polymer with respect to 100 parts by mass of an inorganic binder. In addition, the present invention preferably provides a hydraulic composition for an additive manufacturing device in which the inorganic binder contains 50 to 100 mass % of a calcium aluminate with respect to 100 mass % of the entire inorganic binder, and more preferably provides a hydraulic composition for an additive manufacturing device in which the inorganic binder contains 0 to 50 mass % of rapid hardening cement with respect to 100 mass % of the entire inorganic binder.Type: ApplicationFiled: July 30, 2018Publication date: June 11, 2020Inventors: Yoshifumi OHGI, Yoji OGAWA, Yusuke ISHII, Takeshi NAKAZAKI, Shinya NAKA
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Publication number: 20200039883Abstract: The present invention has solved the problems of conventional molding materials, and provides a hydraulic composition for additive manufacturing devices having high strength development, particularly high early strength development, and less generation of gas defect and graphite spheroidization defect. Specifically, the hydraulic composition for additive manufacturing devices of the present invention at least contains calcium aluminate. It is preferable that the hydraulic composition contain 0.5-10 parts by mass of gypsum with respect to 100 parts by mass of the calcium aluminate.Type: ApplicationFiled: June 28, 2017Publication date: February 6, 2020Inventors: Yoshifumi OHGI, Yoji OGAWA, Makoto TANIMURA, Atsuya TOBA, Hayato SUZUKI
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Patent number: 7822548Abstract: A navigation apparatus of the invention includes a display portion that displays a guidance screen and a removably installed recording medium, the navigation apparatus being provided in a vehicle and guiding the vehicle along a guidance path. When candidate site data created in an external apparatus has been stored on the storage medium, a screen for selectively setting the end point of the guidance path based on the candidate site data is displayed in the display portion, and when setting the end point, a guidance path that arrives at the end point is calculated. The candidate site data includes information related to one or a plurality of locations that have been designated in advance by a user of the navigation apparatus, and the end point is selected from the one or plurality of locations.Type: GrantFiled: May 23, 2007Date of Patent: October 26, 2010Assignee: Sanyo Electric Co., Ltd.Inventors: Ikunori Hisada, Hiroshi Nakashima, Yoji Ogawa
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Publication number: 20090269237Abstract: The high-strength non-combustible magnesium alloy is obtained by adding at least one supplementary additive selected from among carbon (C), molybdenum (Mo), niobium (Nb), silicon (Si), tungsten (W), alumina (Al2O3), magnesium silicide (Mg2Si) and silicon carbide (SiC) to small chip-like blocks of a non-combustible magnesium alloy resulting from adding 0.5 to 5.0% by mass of calcium to a magnesium alloy to produce a crushed product, and subjecting the same to forming, sintering and plastic working. The high-strength non-combustible magnesium alloy exhibits excellent joining ability, and can therefore enhance weldability when used in a filler metal.Type: ApplicationFiled: February 28, 2007Publication date: October 29, 2009Applicant: NATIONAL INSTITUTE OF ADVANCED INDSUTRIAL SCIENCE AND TECHNOLOGYInventors: Tomio Satoh, Hidetoshi Ueno, Yoji Ogawa
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Publication number: 20070276585Abstract: A navigation apparatus of the invention includes a display portion that displays a guidance screen and a removably installed recording medium, the navigation apparatus being provided in a vehicle and guiding the vehicle along a guidance path. When candidate site data created in an external apparatus has been stored on the storage medium, a screen for selectively setting the end point of the guidance path based on the candidate site data is displayed in the display portion, and when setting the end point, a guidance path that arrives at the end point is calculated. The candidate site data includes information related to one or a plurality of locations that have been designated in advance by a user of the navigation apparatus, and the end point is selected from the one or plurality of locations.Type: ApplicationFiled: May 23, 2007Publication date: November 29, 2007Applicant: SANYO ELECTRIC CO., LTD.Inventors: Ikunori HISADA, Hiroshi NAKASHIMA, Yoji OGAWA
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Patent number: 6806941Abstract: A method of forming a pattern for a semiconductor device comprises the steps of forming a photosensitive film on a substrate and radiating the photosensitive film on the substrate with a beam of a predetermined shape consisting of one of a charged particle beam and an electromagnetic beam, thereby forming an exposed region of a desired shape, the latter step including the step of exposing each of unit regions by a single shot of the beam of the predetermined shape for a predetermined period of time, repeating the exposure a plurality of times, and butt-joining the exposed unit regions to thereby form the exposed region of the desired shape, wherein, in the step of forming the exposed region of the desired shape, butting portions of the unit regions are situated in a first area of a layer to be formed other than a second area in the layer in which predetermined characteristics of a function of the semiconductor device are determined by a pattern width of the exposed region in association with another pattern fType: GrantFiled: December 10, 2001Date of Patent: October 19, 2004Assignee: Kabushiki Kaisha ToshibaInventors: Soichi Inoue, Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto
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Publication number: 20020045132Abstract: A method of forming a pattern for a semiconductor device comprises the steps of forming a photosensitive film on a substrate and radiating the photosensitive film on the substrate with a beam of a predetermined shape consisting of one of a charged particle beam and an electromagnetic beam, thereby forming an exposed region of a desired shape, the latter step including the step of exposing each of unit regions by a single shot of the beam of the predetermined shape for a predetermined period of time, repeating the exposure a plurality of times, and butt-joining the exposed unit regions to thereby form the exposed region of the desired shape, wherein, in the step of forming the exposed region of the desired shape, butting portions of the unit regions are situated in a first area of a layer to be formed other than a second area in the layer in which predetermined characteristics of a function of the semiconductor device are determined by a pattern width of the exposed region in association with another pattern fType: ApplicationFiled: December 10, 2001Publication date: April 18, 2002Inventors: Soichi Inoue, Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto
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Patent number: 6335145Abstract: A method of forming a pattern for a semiconductor device comprises the steps of forming a photosensitive film on a substrate and radiating the photosensitive film on the substrate with a beam of a predetermined shape consisting of one of a charged particle beam and an electromagnetic beam, thereby forming an exposed region of a desired shape, the latter step including the step of exposing each of unit regions by a single shot of the beam of the predetermined shape for a predetermined period of time, repeating the exposure a plurality of times, and butt-joining the exposed unit regions to thereby form the exposed region of the desired shape, wherein, in the step of forming the exposed region of the desired shape, butting portions of the unit regions are situated in a first area of a layer to be formed other than a second area in the layer in which predetermined characteristics of a function of the semiconductor device are determined by a pattern width of the exposed region in association with another pattern fType: GrantFiled: November 6, 2000Date of Patent: January 1, 2002Assignee: Kabushiki Kaisha ToshibaInventors: Soichi Inoue, Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto
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Patent number: 6165652Abstract: A method of forming a photomask of a semiconductor device comprising the steps of forming a photosensitive film on a substrate and exposing the photosensitive film on the substrate by radiating with a radiation beam a plurality of butting unit regions defining butting portions between the butting unit regions and controlling said radiating of the butting unit region so that the butting portions of the butting unit regions are formed only in portions corresponding to isolation regions or alternatively, they are not formed in portions corresponding to contact areas.Type: GrantFiled: December 15, 1999Date of Patent: December 26, 2000Assignee: Kabushiki Kaisha ToshibaInventors: Soichi Inoue, Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto
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Patent number: 6040114Abstract: A method of forming a pattern for a semiconductor device comprises the steps of forming a photosensitive film on a substrate and radiating the photosensitive film on the substrate with a beam of a predetermined shape consisting of one of a charged particle beam and an electromagnetic beam, thereby forming an exposed region of a desired shape, the latter step including the step of exposing each of unit regions by a single shot of the beam of the predetermined shape for a predetermined period of time, repeating the exposure a plurality of times, and butt-joining the exposed unit regions to thereby form the exposed region of the desired shape, wherein, in the step of forming the exposed region of the desired shape, butting portions of the unit regions are situated in a first area of a layer to be formed other than a second area in the layer in which predetermined characteristics of a function of the semiconductor device are determined by a pattern width of the exposed region in association with another pattern fType: GrantFiled: April 23, 1997Date of Patent: March 21, 2000Assignee: Kabushiki Kaisha ToshibaInventors: Soichi Inoue, Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto
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Patent number: 5807650Abstract: A method of repairing a defect existing on a photo mask comprising a transparent substrate and a mask pattern formed on the substrate, comprises steps of irradiating a focused ion beam toward the defect and supplying XeF.sub.2 gas to the defect, when an etching rate of the defect by the focused ion beam and XeF.sub.2 is 1.7 times greater than an etching rate by a sole irradiation of the focused ion beam.Type: GrantFiled: August 20, 1997Date of Patent: September 15, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Haruki Komano, Hiroko Nakamura, Munehiro Ogasawara, Satoshi Masuda, Katsuya Okumura, Yoji Ogawa
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Patent number: 4926487Abstract: A speaker system for reproducing heavy low sounds comprises a tube body having a tubular straight portion and a pair of tubular arms, each of the arms extending substantially in parallel to each other in the forward direction to provide therebetween a wide space opening forward for accommodation, each arm further having sound radiation outlets formed in its forward end portion. A speaker driver is attached to the forward end of one of the arms and communicating with the sound radiation outlets, and a drone cone attached to the forward end of the other of the arms and communicating with the sound radiation outlets.Type: GrantFiled: March 15, 1989Date of Patent: May 15, 1990Assignee: Sanyo Electric Co., Ltd.Inventors: Tetsuji Yoshida, Yoshiaki Teraoka, Yoji Ogawa, Ken Kozaki, Kenji Hara, Hiroshi Satou, Akira Yoshino