Patents by Inventor Yong-Chen Chung
Yong-Chen Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240170204Abstract: A magnetic device includes a base plate, a cover plate, a first winding column, a second winding column, a primary winding, a secondary winding and a supporting column. The base plate, having a first concave portion, is opposite to the cover plate. The first winding column and the second winding column are disposed between the bottom plate and the cover plate, respectively. The primary winding and the secondary winding are wound around the first winding column and the second winding column. The supporting column is disposed between the base plate and the cover plate. A first concave portion concaves from a first side of the base plate towards the first winding column and the second winding column along multiple directions. The primary winding and the secondary winding are wound and stacking along an extension direction of the first winding column and the second winding column.Type: ApplicationFiled: July 20, 2023Publication date: May 23, 2024Inventors: Chen CHEN, De-Jia LU, Kai-De CHEN, Yong-Long SYU, Chao-Lin CHUNG
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Patent number: 7204686Abstract: A parallelism adjustment device applicable to nano-imprint lithography has an imprint unit, a carrier unit, a parallelism adjustment mechanism, and a driving source. The imprint unit has a first molding plate and an imprinting mold mounted on the first molding plate. The carrier unit has a second molding plate and a substrate mounted on the second molding plate. The parallelism adjustment mechanism has an enclosed resilient film and a fluid filled therein, and is coupled to at least one of the first and second molding plates. The driving source drives at least one of the imprint unit and the carrier unit to form contact between the mold and the moldable layer. The parallelism adjustment device is pressed via the contact to adjust parallelism for the imprint mold and the substrate and uniformly distributes the pressure between the mold and the substrate, making the molding quality of nano-imprint lithography significantly improved.Type: GrantFiled: September 17, 2003Date of Patent: April 17, 2007Assignee: Industrial Technology Research InstituteInventors: Yong-Chen Chung, Chia-Hung Lin, Chuan-Feng Chen, Chia-Chun Hsu, Wen-Hung Feng, Ming-Chi Chen
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Patent number: 7090477Abstract: An electromagnetic coaxial driving injection apparatus, having a linear motor for driving injection and a rotation motor for metering. The linear motor and the rotation motor of both the injection and metering motors and an injection screw are set on a common axis. A connecting device connects moving parts of the motors with the injection screw. Stationary parts of the motors are fastened on a frame and forward-backward moving unit, not moving during injection and metering. Due to the arrangement of the moving parts and the injection screw on a single axis, moving parts are lessened, and transmission losses are minimized. Since the number of structural parts is low, only the moving parts of the motors move during injection while the stationary parts thereof remain at rest, thus greatly reducing inertia.Type: GrantFiled: April 1, 2003Date of Patent: August 15, 2006Assignee: Industrial Technology Research InstituteInventors: Chia-Chun Hsu, Yong-Chen Chung, Chia-Hung Lin, Wen-Hung Feng, Ming-Chi Chen
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Patent number: 6994541Abstract: A uniform pressing apparatus used in nanoimprint lithographic process is proposed, including a housing having a first flange; a first carrier unit for carrying an imprint mold and having at least one second flange freely attaches to the first flange; a second carrier unit for carrying a substrate; at least one uniform pressing unit mounted on a imprint force transmission path; and a power source driving at least one of the housing and the second carrier unit to allow a contact to be formed between the mold and the moldable layer. Therefore, the nanoimprint lithographic process is achieved with good parallelism between the substrate and the mold and with uniform pressure distribution.Type: GrantFiled: September 17, 2003Date of Patent: February 7, 2006Assignee: Industrial Technology Research InstituteInventors: Yong-Chen Chung, Chia-Hung Lin, Chia-Chun Hsu, Chuan-Feng Chen, Wen-Hung Feng, Ming-Chi Chen
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Publication number: 20040219461Abstract: A parallelism adjustment device applicable to nano-imprint lithography has an imprint unit, a carrier unit, a parallelism adjustment mechanism, and a driving source. The imprint unit has a first molding plate and an imprinting mold mounted on the first molding plate. The carrier unit has a second molding plate and a substrate mounted on the second molding plate. The parallelism adjustment mechanism has an enclosed resilient film and a fluid filled therein, and is coupled to at least one of the first and second molding plates. The driving source drives at least one of the imprint unit and the carrier unit to form contact between the mold and the moldable layer. The parallelism adjustment device is pressed via the contact to adjust parallelism for the imprint mold and the substrate and uniformly distributes the pressure between the mold and the substrate, making the molding quality of nano-imprint lithography significantly improved.Type: ApplicationFiled: September 17, 2003Publication date: November 4, 2004Inventors: Yong-Chen Chung, Chia-Hung Lin, Chuan-Feng Chen, Chia-Chun Hsu, Wen-Hung Feng, Ming-Chi Chen
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Publication number: 20040219249Abstract: A uniform pressing apparatus used in nanoimprint lithographic process is proposed, including a housing having a first flange; a first carrier unit for carrying an imprint mold and having at least one second flange freely attaches to the first flange; a second carrier unit for carrying a substrate; at least one uniform pressing unit mounted on a imprint force transmission path; and a power source driving at least one of the housing and the second carrier unit to allow a contact to be formed between the mold and the moldable layer. Therefore, the nanoimprint lithographic process is achieved with good parallelism between the substrate and the mold and with uniform pressure distribution.Type: ApplicationFiled: September 17, 2003Publication date: November 4, 2004Inventors: Yong-Chen Chung, Chia-Hung Lin, Chia-Chun Hsu, Chuan-Feng Chen, Wen-Hung Feng, Ming-Chi Chen
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Publication number: 20040071810Abstract: An electromagnetic coaxial driving injection apparatus, having a linear motor for driving injection and a rotation motor for metering. The linear motor and the rotation motor of both the injection and metering motors and an injection screw are set on a common axis. A connecting device connects moving parts of the motors with the injection screw. Stationary parts of the motors are fastened on a frame and forward-backward moving unit, not moving during injection and metering. Due to the arrangement of the moving parts and the injection screw on a single axis, moving parts are lessened, and transmission losses are minimized. Since the number of structural parts is low, only the moving parts of the motors move during injection while the stationary parts thereof remain at rest, thus greatly reducing inertia.Type: ApplicationFiled: April 1, 2003Publication date: April 15, 2004Inventors: Chia-chun Hsu, Yong-chen Chung, Chia-hung Lin, Wen-hung Feng, Ming-chi Chen
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Patent number: 6662850Abstract: A lift cord concealable Venetian blind lift control mechanism is constructed to include a base having two hollow screw rods axially aligned at two sides and selectively mounted in the top or bottom rail of a Venetian blind, a revolving rod inserted through the hollow screw rods, a spring member, which provides a torsional force to the revolving rod, two bobbins respectively threaded onto the screw rods for synchronous rotation with the revolving rod. The left and right lift cords of the Venetian blind each have one end connected to the bottom or top rail and the other end fastened to the bobbin such that when the bottom rail of the Venetian blind lifted or lowered by an external force, the bobbins are synchronously rotated to wind up or let off the lift cords; when the external force disappeared, the bobbins are immovable, keeping the bottom rail in position.Type: GrantFiled: May 14, 2002Date of Patent: December 16, 2003Assignees: Industrial Technology Research Institute, Nien Made Enterprise Co., Ltd.Inventors: Yong-Chen Chung, Chia-Chun Hsu, Ming-Chang Dang
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Publication number: 20030168189Abstract: A lift cord concealable Venetian blind lift control mechanism is constructed to include a base having two hollow screw rods axially aligned at two sides and selectively mounted in the top or bottom rail of a Venetian blind, a revolving rod inserted through the hollow screw rods, a spring member, which provides a torsional force to the revolving rod, two bobbins respectively threaded onto the screw rods for synchronous rotation with the revolving rod. The left and right lift cords of the Venetian blind each have one end connected to the bottom or top rail and the other end fastened to the bobbin such that when the bottom rail of the Venetian blind lifted or lowered by an external force, the bobbins are synchronously rotated to wind up or let off the lift cords; when the external force disappeared, the bobbins are immovable, keeping the bottom rail in position.Type: ApplicationFiled: May 14, 2002Publication date: September 11, 2003Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Yong-Chen Chung, Chia-Chun Hsu, Ming-Chang Dang