Patents by Inventor Yong-Woon YOON

Yong-Woon YOON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for etching silicon nitride film and etching method using same
    Patent number: 11608471
    Abstract: An etching composition for silicon nitride comprising: a phosphoric acid compound; water; and at least one of a silane compound represented by Formula 1, below, and a reaction product thereof, and an etching method using the same are disclosed,
    Type: Grant
    Filed: April 5, 2019
    Date of Patent: March 21, 2023
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Ki Wook Hwang, Sang Ran Koh, Youn Jin Cho, Jung Min Choi, Kwen Woo Han, Jun Young Jang, Yong Woon Yoon
  • COMPOSITION FOR ETCHING SILICON NITRIDE FILM AND ETCHING METHOD USING SAME
    Publication number: 20210363423
    Abstract: An etching composition for silicon nitride comprising: a phosphoric acid compound; water; and at least one of a silane compound represented by Formula 1 and a reaction product thereof, and an etching method using the same are disclosed.
    Type: Application
    Filed: April 5, 2019
    Publication date: November 25, 2021
    Inventors: Ki Wook HWANG, Sang Ran KOH, Youn Jin CHO, Jung Min CHOI, Kwen Woo HAN, Jun Young Jang, Yong Woon YOON
  • Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
    Patent number: 10345706
    Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,
    Type: Grant
    Filed: April 22, 2014
    Date of Patent: July 9, 2019
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Hyun-Ji Song, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Yoo-Jeong Choi, Seung-Hee Hong
  • Method of producing layer structure, layer structure, and method of forming patterns
    Patent number: 10312074
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: June 4, 2019
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Min-Soo Kim, Hyun-Ji Song, Sun-Hae Kang, Sung-Min Kim, Sung-Hwan Kim, Young-Min Kim, Yun-Jun Kim, Hea-Jung Kim, Youn-Hee Nam, Jae-Yeol Baek, Byeri Yoon, Yong-Woon Yoon, Chung-Heon Lee, Seulgi Jeong, Yeon-Hee Jo, Seung-Hee Hong, Sun-Min Hwang, Won-Jong Hwang, Songse Yi, MyeongKoo Kim, Naery Yu
  • Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition
    Patent number: 9823566
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A, A? , X, Y, I, m and n are the same as described in the detailed description.
    Type: Grant
    Filed: May 8, 2013
    Date of Patent: November 21, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Yong-Woon Yoon, Sung-Jae Lee, Joon-Young Moon, You-Jung Park, Chul-Ho Lee, Youn-Jin Cho
  • MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION
    Publication number: 20170327640
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.
    Type: Application
    Filed: August 3, 2017
    Publication date: November 16, 2017
    Inventors: Yun-Jun KIM, Hwan-Sung CHEON, Youn-Jin CHO, Yong-Woon YOON, Chung-Heon LEE, Hyo-Young KWON, Yoo-Jeong CHOI
  • Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition
    Patent number: 9725389
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: August 8, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yun-Jun Kim, Hwan-Sung Cheon, Youn-Jin Cho, Yong-Woon Yoon, Chung-Heon Lee, Hyo-Young Kwon, Yoo-Jeong Choi
  • Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition
    Patent number: 9683114
    Abstract: A monomer for a hardmask composition, a hardmask composition, and a method of forming patterns, the monomer being represented by the following Chemical Formula 1:
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: June 20, 2017
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Hea-Jung Kim, Sung-Hwan Kim, Youn-Hee Nam, Yun-Jun Kim, Joon-Young Moon, Hyun-Ji Song, Yong-Woon Yoon, Chung-Heon Lee
  • Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
    Patent number: 9665003
    Abstract: A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
    Type: Grant
    Filed: April 28, 2014
    Date of Patent: May 30, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Hyun-Ji Song, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Seung-Hee Hong
  • Hard mask composition and method for forming pattern using same
    Patent number: 9529257
    Abstract: Disclosed are a polymer represented by the Chemical Formula 1, a monomer represented by the Chemical Formula 2, and a solvent, wherein the monomer is included in the same or a higher amount than the polymer, and a method of forming patterns using the same.
    Type: Grant
    Filed: September 2, 2013
    Date of Patent: December 27, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Chul-Ho Lee, You-Jung Park, Yong-Woon Yoon, Sung-Jae Lee, Youn-Jin Cho, Young-Min Kim, Chung-Heon Lee
  • Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition
    Patent number: 9513546
    Abstract: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same.
    Type: Grant
    Filed: March 19, 2013
    Date of Patent: December 6, 2016
    Assignee: Cheil Industries, Inc.
    Inventors: You-Jung Park, Hea-Jung Kim, Yo-Choul Park, Yong-Woon Yoon, Sung-Jae Lee, Chul-Ho Lee, Youn-Jin Cho
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 9371444
    Abstract: A hardmask composition and a method of forming patterns, the composition including a solvent; and a polymer including a moiety represented by the following Chemical Formula 1,
    Type: Grant
    Filed: January 22, 2015
    Date of Patent: June 21, 2016
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Young-Min Kim, Joon-Young Moon, Yu-Shin Park, Hyun-Ji Song, Yong-Woon Yoon, Chung-Heon Lee
  • Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition
    Patent number: 9359276
    Abstract: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.
    Type: Grant
    Filed: November 21, 2012
    Date of Patent: June 7, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Yoo-Jeong Choi, Hyo-Young Kwon, Youn-Jin Cho, Yun-Jun Kim, Young-Min Kim, Yong-Woon Yoon, Chung-Heon Lee
  • METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS
    Publication number: 20160126088
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Application
    Filed: June 16, 2015
    Publication date: May 5, 2016
    Inventors: Min-Soo KIM, Hyun-Ji SONG, Sun-Hae KANG, Sung-Min KIM, Sung-Hwan KIM, Young-Min KIM, Yun-Jun KIM, Hea-Jung KIM, Youn-Hee NAM, Jae-Yeol BAEK, Byeri YOON, Yong-Woon YOON, Chung-Heon LEE, Seulgi JEONG, Yeon-Hee JO, Seung-Hee HONG, Sun-Min HWANG, Won-Jong HWANG, Songse YI, MyeongKoo KIM, Naery YU
  • Composition for hardmask, method of forming patterns using the same, and semiconductor integrated circuit device including the patterns
    Patent number: 9244351
    Abstract: A composition for a hardmask including copolymer including repeating units represented by Chemical Formulae 1 and 2 and a solvent, a method of forming a pattern using the same, and a semiconductor integrated circuit device including a pattern formed using the method are provided.
    Type: Grant
    Filed: November 23, 2012
    Date of Patent: January 26, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Sung-Jae Lee, Joon-Young Moon, Youn-Jin Cho, Young-Min Kim, Yong-Woon Yoon
  • MONOMER, HARDMASK COMPOSITION COMPRISING MONOMER, AND PATTERN FORMING METHOD USING HARDMASK COMPOSITION
    Publication number: 20150362837
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A, A?, X, Y, l, m and n are the same as described in the detailed description.
    Type: Application
    Filed: May 8, 2013
    Publication date: December 17, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Yong-Woon YOON, Sung-Jae LEE, Joon-Young MOON, You-Jung PARK, Chul-Ho LEE, Youn-Jin CHO
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150329718
    Abstract: A hardmask composition and a method of forming patterns, the composition including a solvent; and a polymer including a moiety represented by the following Chemical Formula 1,
    Type: Application
    Filed: January 22, 2015
    Publication date: November 19, 2015
    Inventors: Yoo-Jeong CHOI, Yun-Jun KIM, Young-Min KIM, Joon-Young MOON, Yu-Shin PARK, Hyun-Ji SONG, Yong-Woon YOON, Chung-Heon LEE
  • MONOMER, HARD MASK COMPOSITION COMPRISING SAID MONOMER, AND METHOD FOR FORMING PATTERN USING SAID HARD MASK COMPOSITION
    Publication number: 20150301448
    Abstract: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same.
    Type: Application
    Filed: March 19, 2013
    Publication date: October 22, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: You-Jung Park, Hea-Jung Kim, Yo-Choul Park, Yong-Woon Yoon, Sung-Jae Lee, Chul-Ho Lee, Youn-Jin Cho
  • MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING THE MONOMER, AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150268558
    Abstract: A monomer for a hardmask composition, a hardmask composition, and a method of forming patterns, the monomer being represented by the following Chemical Formula 1:
    Type: Application
    Filed: January 30, 2015
    Publication date: September 24, 2015
    Inventors: Hea-Jung KIM, Sung-Hwan KIM, Youn-Hee NAM, Yun-Jun KIM, Joon-Young MOON, Hyun-Ji SONG, Yong-Woon YOON, Chung-Heon LEE
  • HARD MASK COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME
    Publication number: 20150205198
    Abstract: Disclosed are a polymer represented by the Chemical Formula 1, a monomer represented by the Chemical Formula 2, and a solvent, wherein the monomer is included in the same or a higher amount than the polymer, and a method of forming patterns using the same.
    Type: Application
    Filed: September 2, 2013
    Publication date: July 23, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Chul-Ho Lee, You-Jung Park, Yong-Woon Yoon, Sung-Jae Lee, Youn-Jin Cho, Young-Min Kim, Chung-Heon Lee