Patents by Inventor Yong Yi

Yong Yi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140286832
    Abstract: An exhaust system is provided. The exhaust system includes an exhaust conduit having a protuberance thereon. A reductant injector is provided on the protuberance. The reductant injector is positioned such that an ejection tip of the reductant injector is inclined with respect to a centerline of the exhaust conduit. A baffle assembly is coupled to an inner wall of the exhaust conduit. The baffle assembly is positioned upstream of the ejection tip of the reductant injector. A first plate of the baffle assembly is positioned parallel to the centerline of the exhaust conduit. A second plate of the baffle assembly extends from the first plate. The second plate is positioned angularly with respect to the first plate. The baffle assembly is configured to deflect at least a portion of an exhaust gas flow over the ejection tip of the reductant injector.
    Type: Application
    Filed: June 6, 2014
    Publication date: September 25, 2014
    Inventors: Yong Yi, Jinhui Sun, Arvind Jujare
  • Publication number: 20140256378
    Abstract: A method of controlling a mobile communication terminal including a first antenna and a second antenna is provided. The method includes receiving transmission data to be transmitted, applying first power smaller than a first threshold value to the first antenna, applying second power smaller than the first threshold value to the second antenna, and cooperatively transmitting the transmission data based on the first power and the second power, respectively, by the first antenna and the second antenna, wherein a sum of the first power and the second power is larger than a second threshold value.
    Type: Application
    Filed: March 4, 2014
    Publication date: September 11, 2014
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Soo-Pyoung PARK, Yong-Yi KIM, Jea-Dong JANG
  • Publication number: 20140249014
    Abstract: The present invention relates to a dark neutral gray glass composition with a low transmittance, and a glass formed therefrom, and more specifically, to a dark neutral gray glass composition with a low transmittance and a low color purity, wherein an appropriate amount of Fe2O3, CoO and Se are used as a colorant component, and the FeO content in Fe2O3 and the CoO and Se relative content are delimited by a predetermined range, so as to lower the transmittance of visible rays, solar energy and ultraviolet rays and color purity, thereby protecting privacy in a vehicle, a building and the like, enabling harmony among the various colors thereof, and protecting an interior material and people from ultraviolet rays, and to a glass formed therefrom.
    Type: Application
    Filed: August 2, 2012
    Publication date: September 4, 2014
    Applicant: KCC CORPORATION
    Inventors: Yun Hee Lee, Yong Yi Kim, Jae Chung Lim
  • Publication number: 20140242002
    Abstract: A mouthwash composition comprises water and a modified polyglutamic acid composed of a plurality of segment A and a plurality of segment B randomly arranged, in which, the segment A has a formula I: The segment B has a formula II: wherein X?H, Na, K, NH4, ½Ca, or ½Mg, and Y?Cl, Br, or I. The modified polyglutamic acid in the mouthwash composition is 0.1-5 wt %. The mouthwash composition in the present invention can eliminate bad breath, and also has antibacterial properties, so it can suppress the formation of dental plaque and is effective in preventing periodontal disease.
    Type: Application
    Filed: January 23, 2014
    Publication date: August 28, 2014
    Applicant: Far Eastern New Century Corporation
    Inventors: Yong-Yi WU, Chun-Yi LI, Chih-Ta LEE
  • Patent number: 8800275
    Abstract: A mounting assembly for an injector is located in a curved portion of an exhaust line having an exhaust flow from an upstream end to a downstream end. The mounting assembly includes an indent extending at least partially into the exhaust line curved portion and disposed in the exhaust flow. The downstream wall has an interior surface oriented to substantially face the exhaust line downstream end. A recess extends from the downstream wall in a direction away from the exhaust line downstream end, and a recess aperture is formed in the recess and configured to fluidly communicate with the injector. The recess reduces the amount of exhaust heat reaching the injector tip.
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: August 12, 2014
    Assignee: Caterpillar Inc.
    Inventors: Richard Anderson Crandell, Jinhui Sun, Yong Yi, Zhi Huang, Matthew Fahrenkrug, James E. Webster, III, Michael Max Blanco
  • Patent number: 8778598
    Abstract: A method of forming fine patterns of a semiconductor device according to a double patterning process that uses acid diffusion is provided. In this method, a plurality of first mask patterns are formed on a substrate. A capping film including an acid source is formed on the exposed surface areas of the plurality of first mask patterns. A second mask layer is formed on the capping films. A plurality of acid diffused regions are formed within the second mask layer by diffusing acid obtained from the acid source from the capping films into the second mask layer. A plurality of second mask patterns are formed of residual parts of the second mask layer which remain after removing the acid diffused regions of the second mask layer.
    Type: Grant
    Filed: December 12, 2012
    Date of Patent: July 15, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yool Kang, Suk-joo Lee, Jung-hyeon Lee, Shi-yong Yi
  • Publication number: 20140193976
    Abstract: Methods of forming contact holes include forming a first guide pattern over an etching target layer. The first guide pattern has first openings each extending in a first direction and each first opening arranged in a direction perpendicular to the first direction. A first BCP structure is formed in each first opening. The first BCP structure includes first material layers in the first direction at a first pitch in each of the first openings, and second material layers filling a remaining portion of each first opening. First holes are formed by removing the first material layers. A second guide pattern is formed over the first guide pattern and the second material layers, and the above processes are performed on the second guide pattern to form second holes. Portions of the etching target layer overlapped by the first holes or the second holes are removed to form a desired pattern.
    Type: Application
    Filed: December 17, 2013
    Publication date: July 10, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eun-Sung KIM, Jae-Woo NAM, Chul-Ho SHIN, Shi-Yong YI
  • Patent number: 8728447
    Abstract: A teeth-whitening gel is provided. The main ingredient of the teeth-whitening gel comprises a polypeptide having halamine (N—X bond, X?Cl, Br or I) groups and a high molecular weight. By the redox properties of halamine group, the gel contacting with the teeth's surface can bleach and whiten the teeth.
    Type: Grant
    Filed: July 18, 2012
    Date of Patent: May 20, 2014
    Assignee: Far Eastern New Century Corporation
    Inventors: Chih-Ta Lee, Chun-Yi Li, Lin-Chien Yu, Yong-Yi Wu
  • Publication number: 20140061154
    Abstract: A method includes forming a hydrophilic guide layer, a DBARC layer and a photoresist film. A portion of the photoresist film and DBARC layer is exposed to form exposed and unexposed portions. The unexposed photoresist film is removed to form a photoresist pattern including the exposed photoresist film portion. A neutral layer is formed on the photoresist pattern. The photoresist pattern and the DBARC layer of the exposed portion are removed to form first opening portions exposing the guide layer. A block copolymer layer includes a block copolymer having first and second polymer blocks coated on the neutral layer while filling the first opening portions. The block copolymer layer is microphase separated to form a pattern layer including first and second patterns. A pattern including one polymer block is removed to form a pattern mask. The object layer is etched to form a pattern including second opening portions.
    Type: Application
    Filed: May 30, 2013
    Publication date: March 6, 2014
    Inventors: Eun-Sung KIM, Jae-Woo NAM, Chul-Ho SHIN, Shi-Yong YI
  • Patent number: 8615118
    Abstract: Techniques for background subtraction in computed tomography include determining voxels in a slice of interest in a three dimensional computed tomography scan of the interior of a body based on a first set of measurements of radiation transmitted through the body. Based on the first set of measurements, a first background image for radiation transmitted through the body in a first direction is determined without the effects of the voxels in the slice of interest. A current image is determined based on a different current measurement of radiation transmitted through the body in the first direction. A first difference is determined between the current image and the first background image. The result is a high contrast image in the slice of interest even from a single current projection image.
    Type: Grant
    Filed: May 31, 2011
    Date of Patent: December 24, 2013
    Assignee: The University of Maryland, Baltimore
    Inventors: Byong Yong Yi, Xinsheng Cedric Yu, Jin Zhang, Giovanni Lasio
  • Publication number: 20130288482
    Abstract: In a method of forming a pattern, a photoresist pattern is formed on a substrate including an etching target layer. A surface treatment is performed on the photoresist pattern to form a guide pattern having a higher heat-resistance than the photoresist pattern. A material layer including a block copolymer including at least two polymer blocks is coated on a portion of the substrate exposed by the guide pattern. A micro-phase separation is performed on the material layer to form a minute pattern layer including different polymer blocks arranged alternately. At least one polymer block is removed from the minute pattern layer to form a minute pattern mask. The etching target layer is etched by using the minute pattern mask to form a pattern. Minute patterns may be formed utilizing a less complex process that those employed during conventional processes of forming a minute pattern.
    Type: Application
    Filed: September 28, 2012
    Publication date: October 31, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jae-Woo Nam, Kyoung-Seon Kim, Eun-Sung Kim, Chul-Ho Shin, Shi-Yong Yi
  • Patent number: 8551899
    Abstract: The present invention relates to a dark neutral green gray soda-lime glass composition comprising, as a colorant ingredient per 100 weight parts of a base glass composition, 1.4 to 2.5 weight parts of total Fe2O3, 0.02 to 0.04 weight parts of CoO, 0.0001 to 0.004 weight parts of Se, 0.005 to 0.5 weight parts of MnO2, and 0.05 to 1 weight parts of CeO2. The glass composition of the present invention has a visible light transmittance (LTA) of 15% or less, an ultraviolet ray transmittance (Tuv) of 0 to 1%, and a solar transmittance (Tsol) of 15% or less, measured for a reference thickness of 4 mm. As described above, the glass composition of the present invention is excellent in absorbing ultraviolet rays and solar heat, and therefore can be valuably used in privacy glass or a sunroof of a motor vehicle, or in glass used for construction.
    Type: Grant
    Filed: February 24, 2010
    Date of Patent: October 8, 2013
    Assignee: KCC Corporation
    Inventors: Yong Yi Kim, Si Moo Lee, Seon Jin Kim, Jin Hyuk Lee
  • Publication number: 20130219871
    Abstract: A mounting assembly for an injector is located in a curved portion of an exhaust line having an exhaust flow from an upstream end to a downstream end. The mounting assembly includes an indent extending at least partially into the exhaust line curved portion and disposed in the exhaust flow. The downstream wall has an interior surface oriented to substantially face the exhaust line downstream end. A recess extends from the downstream wall in a direction away from the exhaust line downstream end, and a recess aperture is formed in the recess and configured to fluidly communicate with the injector. The recess reduces the amount of exhaust heat reaching the injector tip.
    Type: Application
    Filed: February 27, 2012
    Publication date: August 29, 2013
    Applicant: CATERPILLAR, INC.
    Inventors: Richard Anderson Crandell, Jinhui Sun, Yong Yi, Zhi Huang, Matthew Fahrenkrug, James E. Webster, III, Michael Max Blanco
  • Publication number: 20130216487
    Abstract: A teeth-whitening gel is provided. The main ingredient of the teeth-whitening gel comprises a polypeptide having halamine (N—X bond, X?Cl, Br or I) groups and a high molecular weight. By the redox properties of halamine group, the gel contacting with the teeth's surface can bleach and whiten the teeth.
    Type: Application
    Filed: July 18, 2012
    Publication date: August 22, 2013
    Applicant: FAR EASTERN NEW CENTURY CORPORATION
    Inventors: Chih-Ta Lee, Chun-Yi Li, Lin-Chien Yu, Yong-Yi Wu
  • Patent number: 8431331
    Abstract: A method of forming fine patterns of a semiconductor device according to a double patterning process that uses acid diffusion is provided. In this method, a plurality of first mask patterns are formed on a substrate so as to be separated from one another. A capping film including an acid source is formed on sidewalls and an upper surface of each of the plurality of first mask patterns. A second mask layer is formed on the capping films. A plurality of acid diffused regions are formed within the second mask layer by diffusing acid obtained from the acid source from the capping films into the second mask layer. A plurality of second mask patterns are formed of residual parts of the second mask layer which remain in the first spaces after removing the acid diffused regions of the second mask layer.
    Type: Grant
    Filed: November 10, 2008
    Date of Patent: April 30, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yool Kang, Suk-joo Lee, Jung-hyeon Lee, Shi-yong Yi
  • Patent number: 8399174
    Abstract: A method of patterning a substrate includes processing first regions of the substrate to form a first pattern, the first regions defining a second region between adjacent first regions, arranging a block copolymer on the first and second regions, the block copolymer including a first component and a second component, the first component of the block copolymer being aligned on the first regions, and selectively removing one of the first component and the second component of the block copolymer to form a second pattern having a pitch that is less than a pitch of a first region and an adjacent second region.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: March 19, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyoung Taek Kim, Hyun Woo Kim, Sang Ouk Kim, Shi Yong Yi, Seong Woon Choi
  • Publication number: 20130065773
    Abstract: A variety of elastomeric-based microfluidic devices and methods for using and manufacturing such devices are provided. Certain of the devices have arrays of reaction sites to facilitate high throughput analyses. Some devices also include reaction sites located at the end of blind channels at which reagents have been previously deposited during manufacture. The reagents become suspended once sample is introduced into the reaction site. The devices can be utilized with a variety of heating devices and thus can be used in a variety of analyses requiring temperature control, including thermocycling applications such as nucleic acid amplification reactions, genotyping and gene expression analyses.
    Type: Application
    Filed: April 4, 2012
    Publication date: March 14, 2013
    Applicant: Fluidigm Corporation
    Inventors: Marc Unger, Ian D. Manger, Michael Lucero, Yong Yi, Emily Miyashita-Lin, Anja Wienecke, Geoffrey Facer
  • Patent number: 8359832
    Abstract: An engine exhaust aftertreatment system including a mixer disposed in the exhaust stream. The mixer includes a mesh section having a mesh of wires and may include a baffle section having a deflector that redirects a direction of flow of the exhaust stream. The mesh section may not extend across an entire width of an exhaust conduit containing the exhaust stream. The mesh section may also be sized and located to intersect the reductant introduced by the injector.
    Type: Grant
    Filed: December 21, 2009
    Date of Patent: January 29, 2013
    Assignee: Caterpillar Inc.
    Inventors: Yong Yi, Jinhui Sun
  • Patent number: 8349200
    Abstract: For patterning during integrated circuit fabrication, a first pattern of first masking structures is formed, and a buffer layer is formed on exposed surfaces of the first masking structures. Also, a second pattern of second masking structures is formed in recesses between the buffer layer at sidewalls of the first masking structures. Furthermore, the first and masking structures are formed from spin-coating respective high carbon containing materials. Such first and second masking structures pattern a target layer with higher pitch than possible with traditional photolithography.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: January 8, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Shi-Yong Yi, Myeong-Cheol Kim, Dong-Ki Yoon, Kyung-Yub Jeon, Ji-Hoon Cha
  • Publication number: 20130000729
    Abstract: A fluid supply system configured to be utilized with a coolant system of an engine, the fluid supply system including; a fluid tank, a fluid pump coupled to the fluid tank and a thermal management system in thermal communication with the fluid tank and the fluid pump, wherein the thermal management system includes; a first coolant circuit in thermal communication with the fluid tank and a second coolant circuit in thermal communication with the fluid pump, wherein flow of coolant from the coolant system through the first fluid circuit and second fluid circuit is in parallel when coolant flows through the second fluid circuit.
    Type: Application
    Filed: June 30, 2011
    Publication date: January 3, 2013
    Applicant: Caterpillar Inc.
    Inventors: Mahesh K. Mokire, Jinhui Sun, Jack A. Merchant, Raymond U. Isada, Yong Yi, Daniel R. Wentzel