Patents by Inventor Yonggang Li

Yonggang Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230085411
    Abstract: A microelectronic assembly is disclosed, comprising: a substrate having a core made of glass; and a first integrated circuit (IC) die and a second IC die coupled to a first side of the substrate. The core comprises a cavity, a third IC die is located within the cavity, and the core further comprises one or more conductive through-glass via (TGV) that facilitates electrical coupling between the first side of the substrate and an opposing second side of the substrate. In some embodiments, the cavity is a blind cavity; in other embodiments, the cavity is a through-hole. In some embodiments, the third IC die merely provides lateral coupling between the first IC die and the second IC die; in other embodiments, the third IC die also provides electrical coupling between the first side and the second side of the substrate with through-silicon vias.
    Type: Application
    Filed: September 16, 2021
    Publication date: March 16, 2023
    Applicant: Intel Corporation
    Inventors: Sameer Paital, Yonggang Li, Kristof Kuwawi Darmawikarta, Gang Duan, Srinivas V. Pietambaram
  • Patent number: 11605867
    Abstract: A method of fabricating an RF filter on a semiconductor package comprises forming a first dielectric buildup film. A second dielectric buildup film is formed over the first dielectric buildup film, the second dielectric buildup film comprising a dielectric material that contains a metallization catalyst, wherein the dielectric material comprises one of an epoxy-polymer blend dielectric material, silicon dioxide and silicon nitride, and a low-k dielectric. A trench is formed in the second dielectric buildup film with laser ablation, wherein the laser ablation selectively activates sidewalls of the trench for electroless metal deposition. A metal selectively is plated to sidewalls of the trench based at least in part on the metallization catalyst and immersion in an electroless solution. A low-loss buildup film is formed over the metal that substantially fills the trench.
    Type: Grant
    Filed: June 10, 2021
    Date of Patent: March 14, 2023
    Assignee: Intel Corporation
    Inventors: Brandon C. Marin, Jeremy D. Ecton, Aleksandar Aleksov, Kristof Darmawikarta, Yonggang Li, Dilan Seneviratne
  • Publication number: 20220338703
    Abstract: A steam cleaning apparatus may include a wand, a cleaning assembly coupled to the wand, the cleaning assembly including a steam generator, and a cleaning head pivotally coupled to the wand. The cleaning head may include a plurality of cleaning pads, a pad motor having a motor driveshaft, a drivetrain configured to transfer rotational motion of the motor driveshaft to each of the plurality of cleaning pads such that a rotation of the motor driveshaft causes a corresponding rotation in each of the plurality of cleaning pads, and a temperature sensor positioned proximate to the drivetrain, the temperature sensor being configured to measure a temperature of the drivetrain.
    Type: Application
    Filed: April 22, 2022
    Publication date: October 27, 2022
    Inventors: Fariha AHMED, Joshua REDMAN, Peter HUTCHINSON, Dmitry LAYEVSKY, Andrew KEENE, Kai XU, Ognjen VRDOLJAK, Queena Tan, Devin FENG, Junping Li, Ming YAO, Tao Wang, Hui Zou, Yonggang Li, David T. BARKER, Heliang CHEN, Jibing Gu, Mingliang Qin, Zhengzhou Lu, Lei Liu
  • Publication number: 20220254559
    Abstract: Described are microelectronic devices including an embedded microelectronic package for use as an integrated voltage regulator with a microelectronic system. The microelectronic package can include a substrate and a magnetic foil. The substrate can define at least one layer having one or more of electrically conductive elements separated by a dielectric material. The magnetic foil can have ferromagnetic alloy ribbons and can be embedded within the substrate adjacent to the one or more of electrically conductive elements. The magnetic foil can be positioned to interface with and be spaced from the one or more of electrically conductive element.
    Type: Application
    Filed: April 28, 2022
    Publication date: August 11, 2022
    Inventors: Srinivas Venkata Ramanuja Pietambaram, Kristof Darmawikarta, Gang Duan, Yonggang Li, Sameer Paital
  • Patent number: 11404389
    Abstract: Embodiments include one or more air core inductors (ACIs) and a method of forming the ACIs. The ACI includes a first inductor loop on a substrate. The first inductor loop has a first line and a second line. The first line has a first thickness that is greater than a second thickness of the second line. The ACI also includes a dielectric over the substrate and the first and second lines. The first line has a top surface above a top surface of the second line. The ACI further includes a second inductor loop on the dielectric and the first inductor loop. The second inductor loop has is coupled to the top surface of the first line of the first inductor loop. The first inductor loop may also have a third thickness, where the third thickness is the distance between the top surfaces of the first and second line.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: August 2, 2022
    Assignee: Intel Corporation
    Inventors: Jeremy Ecton, Suddhasattwa Nad, Kristof Darmawikarta, Yonggang Li, Xiaoying Guo
  • Patent number: 11348718
    Abstract: Described are microelectronic devices including an embedded microelectronic package for use as an integrated voltage regulator with a microelectronic system. The microelectronic package can include a substrate and a magnetic foil. The substrate can define at least one layer having one or more of electrically conductive elements separated by a dielectric material. The magnetic foil can have ferromagnetic alloy ribbons and can be embedded within the substrate adjacent to the one or more of electrically conductive elements. The magnetic foil can be positioned to interface with and be spaced from the one or more of electrically conductive element.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: May 31, 2022
    Assignee: Intel Corporation
    Inventors: Srinivas Pietambaram, Kristof Darmawikarta, Gang Duan, Yonggang Li, Sameer Paital
  • Publication number: 20220093520
    Abstract: Conductive routes for an electronic substrate may be fabricated by forming an opening in a material, using existing laser drilling or lithography tools and materials, followed by selectively plating a metal on the sidewalls of the opening. The processes of the present description may result in significantly higher patterning resolution or feature scaling (up to 2× improvement in patterning density/resolution). In addition to improved patterning resolution, the embodiments of the present description may also result in higher aspect ratios of the conductive routes, which can result in improved signaling, reduced latency, and improved yield.
    Type: Application
    Filed: September 21, 2020
    Publication date: March 24, 2022
    Applicant: Intel Corporation
    Inventors: Jeremy D. Ecton, Aleksandar Aleksov, Brandon C. Marin, Yonggang Li, Leonel Arana, Suddhasattwa Nad, Haobo Chen, Tarek Ibrahim
  • Publication number: 20210305668
    Abstract: A method of fabricating an RF filter on a semiconductor package comprises forming a first dielectric buildup film. A second dielectric buildup film is formed over the first dielectric buildup film, the second dielectric buildup film comprising a dielectric material that contains a metallization catalyst, wherein the dielectric material comprises one of an epoxy-polymer blend dielectric material, silicon dioxide and silicon nitride, and a low-k dielectric. A trench is formed in the second dielectric buildup film with laser ablation, wherein the laser ablation selectively activates sidewalls of the trench for electroless metal deposition. A metal selectively is plated to sidewalls of the trench based at least in part on the metallization catalyst and immersion in an electroless solution. A low-loss buildup film is formed over the metal that substantially fills the trench.
    Type: Application
    Filed: June 10, 2021
    Publication date: September 30, 2021
    Inventors: Brandon C. MARIN, Jeremy D. ECTON, Aleksandar ALEKSOV, Kristof DARMAWIKARTA, Yonggang LI, Dilan SENEVIRATNE
  • Patent number: 11081768
    Abstract: A filter structure comprises a first dielectric buildup film. A second dielectric buildup film is over the first dielectric buildup film, the second dielectric buildup film including a metallization catalyst. A trench is in the second dielectric buildup film. A metal is selectively plated to sidewalls of the trench based at least in part on the metallization catalyst. A low-loss buildup film is over the metal that substantially fills the trench.
    Type: Grant
    Filed: May 24, 2019
    Date of Patent: August 3, 2021
    Assignee: Intel Corporation
    Inventors: Brandon C. Marin, Jeremy D. Ecton, Aleksandar Aleksov, Kristof Darmawikarta, Yonggang Li, Dilan Seneviratne
  • Publication number: 20210213694
    Abstract: The light guide film product processing apparatus provided in the present invention relates to the field of light guide film processing, and includes an unwinding device for transmitting a first light guide film, a dot processing device, a cooling device, a cutting device, a waste collecting device, and a product collecting device that are sequentially installed along the transmission direction of the first light guide film, and a linkage controller; the dot processing device transfers dots on both sides of the first light guide film, the cooling device cools the first light guide film after dot processing, the cutting device cuts the cooled first light guide film, the waste collecting device is configured to wind a second light guide film, and the second light guide film is a remaining material after the first light guide film is cut into a light guide film product; and the included angle formed between the winding and transmission direction of the second light guide film and the transmission direction of th
    Type: Application
    Filed: June 10, 2020
    Publication date: July 15, 2021
    Applicant: NANJING BREADY ELECTRONICS CO., LTD.
    Inventors: Yong LIU, Yonggang LI
  • Patent number: 10985080
    Abstract: An electronic package that includes a substrate and an electronic component attached to the substrate. A laminated layer is attached to an upper surface of the substrate such that the laminated layer covers the electronic component. The electronic package may further include a stiffener mounted on the laminated layer where the stiffener is over the electronic component.
    Type: Grant
    Filed: November 24, 2015
    Date of Patent: April 20, 2021
    Assignee: Intel Corporation
    Inventors: Pramod Malatkar, Kyle Yazzie, Naga Sivakumar Yagnamurthy, Richard J. Harries, Dilan Seneviratne, Praneeth Akkinepally, Xuefei Wan, Yonggang Li, Robert L. Sankman
  • Patent number: 10910327
    Abstract: A package for an electronic device may include a first layer. The first layer may include a first dielectric material. The first layer may have a planar first surface. The first layer may have a variable thickness. A second layer may be coupled to the first layer. The second layer may include a second dielectric material and may have a planar second surface. The second layer may have a variable thickness. A seam may be located at an interface between the first layer and the second layer, and the seam may have an undulating profile. The package may include at least one electrical trace, for example located in the first layer or the second layer.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: February 2, 2021
    Assignee: Intel Corporation
    Inventors: Yonggang Li, Brandon C Marin, Vahidreza Parichehreh, Jeremy D Ecton
  • Publication number: 20200373261
    Abstract: A filter structure comprises a first dielectric buildup film. A second dielectric buildup film is over the first dielectric buildup film, the second dielectric buildup film including a metallization catalyst. A trench is in the second dielectric buildup film. A metal is selectively plated to sidewalls of the trench based at least in part on the metallization catalyst. A low-loss buildup film is over the metal that substantially fills the trench.
    Type: Application
    Filed: May 24, 2019
    Publication date: November 26, 2020
    Inventors: Brandon C. MARIN, Jeremy D. ECTON, Aleksandar ALEKSOV, Kristof DARMAWIKARTA, Yonggang LI, Dilan SENEVIRATNE
  • Publication number: 20200312771
    Abstract: A die assembly is disclosed. The die assembly includes a die, one or more die pads on a first surface of the die and a die attach film on the die where the die attach film includes one or more openings that expose the one or more die pads and that extend to one or more edges of the die.
    Type: Application
    Filed: March 27, 2019
    Publication date: October 1, 2020
    Inventors: Bai NIE, Gang DUAN, Srinivas PIETAMBARAM, Jesse JONES, Yosuke KANAOKA, Hongxia FENG, Dingying XU, Rahul MANEPALLI, Sameer PAITAL, Kristof DARMAWIKARTA, Yonggang LI, Meizi JIAO, Chong ZHANG, Matthew TINGEY, Jung Kyu HAN, Haobo CHEN
  • Publication number: 20200312787
    Abstract: A package for an electronic device may include a first layer. The first layer may include a first dielectric material. The first layer may have a planar first surface. The first layer may have a variable thickness. A second layer may be coupled to the first layer. The second layer may include a second dielectric material and may have a planar second surface. The second layer may have a variable thickness. A seam may be located at an interface between the first layer and the second layer, and the seam may have an undulating profile. The package may include at least one electrical trace, for example located in the first layer or the second layer.
    Type: Application
    Filed: March 29, 2019
    Publication date: October 1, 2020
    Inventors: Yonggang Li, Brandon C. Marin, Vahidreza Parichehreh, Jeremy D. Ecton
  • Publication number: 20200176272
    Abstract: Embodiments include methods for selective electroless plating of dielectric layers and devices formed by such processes. According to an embodiment, patterned surfaces are formed in a dielectric layer that includes metallic ceramic fillers. In some embodiments, the patterned surfaces form a line opening and a via opening that exposes a conductive pad. In an embodiment, the metallic ceramic fillers are activated to form activated surfaces over the patterned surfaces. A first metal is then deposited into the via opening with a first electroless solution that is a bottom-up deposition process. Thereafter, embodiments include forming a seed layer over exposed portions of the activated surfaces. In an embodiment, mid-gap states of the activated surfaces have an energy level approximately equal to a reduction potential of metal ions in a second electroless solution. Embodiments may then include depositing a second metal into the via opening with a third electroless solution.
    Type: Application
    Filed: September 30, 2016
    Publication date: June 4, 2020
    Inventors: Vivek RAGHUNATHAN, Yonggang LI
  • Patent number: 10672701
    Abstract: Discussed generally herein are methods and devices for flexible fabrics or that otherwise include thin traces. A device can include a flexible polyimide material, and a first plurality of traces on the flexible polyimide material, wherein the first plurality of traces are patterned on the flexible polyimide material using laser spallation.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: June 2, 2020
    Assignee: Intel Corporation
    Inventors: Vivek Raghunathan, Yonggang Li, Aleksandar Aleksov, Adel A. Elsherbini, Johanna M. Swan
  • Publication number: 20200105685
    Abstract: Embodiments include one or more air core inductors (ACIs) and a method of forming the ACIs. The ACI includes a first inductor loop on a substrate. The first inductor loop has a first line and a second line. The first line has a first thickness that is greater than a second thickness of the second line. The ACI also includes a dielectric over the substrate and the first and second lines. The first line has a top surface above a top surface of the second line. The ACI further includes a second inductor loop on the dielectric and the first inductor loop. The second inductor loop has is coupled to the top surface of the first line of the first inductor loop. The first inductor loop may also have a third thickness, where the third thickness is the distance between the top surfaces of the first and second line.
    Type: Application
    Filed: September 28, 2018
    Publication date: April 2, 2020
    Inventors: Jeremy ECTON, Suddhasattwa NAD, Kristof DARMAWIKARTA, Yonggang LI, Xiaoying GUO
  • Publication number: 20200091053
    Abstract: Disclosed herein are integrated circuit (IC) package supports having inductors with magnetic material therein. For example, in some embodiments, an IC package support may include an inductor including a solenoid, a first portion of a magnetic material in an interior of the solenoid, and a second portion of magnetic material outside the interior of the solenoid.
    Type: Application
    Filed: September 14, 2018
    Publication date: March 19, 2020
    Applicant: Intel Corporation
    Inventors: Sameer Paital, Srinivas V. Pietambaram, Yonggang Li, Kristof Kuwawi Darmawikarta, Gang Duan, Krishna Bharath, Michael James Hill
  • Publication number: 20200083164
    Abstract: Embodiments include package substrates and a method of forming the package substrates. A package substrate includes a dielectric having a cavity that has a footprint, a resistor embedded in the cavity of the dielectric, and a plurality of traces on the resistor, where a plurality of surfaces of the resistor are activated surfaces. The resistor may also have a plurality of sidewalls which may be activated sidewalls and tapered. The dielectric may include metallization particles/ions. The resistor may include resistive materials, such as nickel-phosphorus (NiP), aluminum-nitride (AlN), and/or titanium-nitride (TiN). The package substrate may further include a first resistor embedded adjacently to the resistor. The first resistor may have a first footprint of a first cavity that is different than the footprint of the cavity of the resistor. The resistor may have a resistance value that is thus different than a first resistance value of the first resistor.
    Type: Application
    Filed: September 12, 2018
    Publication date: March 12, 2020
    Inventors: Brandon C. MARIN, Frank TRUONG, Shivasubramanian BALASUBRAMANIAN, Dilan SENEVIRATNE, Yonggang LI, Sameer PAITAL, Darko GRUJICIC, Rengarajan SHANMUGAM, Melissa WETTE, Srinivas PIETAMBARAM