Abstract: Embodiments of wet processing systems and methods for uniform wet processing are disclosed. A method described in the present disclosure includes measuring one or more wafer characteristics of a wafer using a plurality of detectors and determining a wafer profile of the wafer based on the measured one or more wafer characteristics. The method also includes setting first and second sets of wet processing parameters of a wet processing system for respective first and second wafer regions based on the wafer profile, where a value of at least one wet processing parameter is different between the first and second sets of wet processing parameters. The method further includes performing wet processing on the wafer by dispensing one or more chemicals onto the first and second wafer regions according to the respective first and second sets of wet processing parameters.

Abstract: Embodiments of an etching method for a material layer of a NAND memory device are disclosed. An example method of chemically etching a material layer on one or more substrates includes mixing an etchant solution within a bath and allowing the etchant solution to reach a quiescent state. After the etchant solution has reached the quiescent state, the method includes loading the one or more substrates into the bath. The one or more substrates includes a plurality of openings having the material layer disposed on an inside surface of the plurality of openings. The method also includes allowing the one or more substrates to remain in the bath for a predetermined time period, such that a thickness of the material layer is reduced by the etchant solution.

Abstract: A sliding carpet assembly and a sliding carpet. The sliding carpet assembly comprises multiple roll shaft units. Each roll shaft unit comprises a roll shaft (310), and a fixing catch (210) in contact with and connected to one side of the roll shaft (310). The fixing catch (210) includes a supporting body. The supporting body is provided with a first through hole (213) and a second through hole (214). The axis of the first through hole (213) and the axis of the second through hole (214) are perpendicular to each other and do not intersect with each other. Moreover, the sliding carpet assembly further includes multiple connecting ropes (100). In a first direction, the connecting ropes (100) pass through the first through holes (213) to connect the multiple sequentially arranged roll shaft units in series.

Abstract: Embodiments of an etching method for a material layer of a NAND memory device are disclosed. An example method of chemically etching a material layer on one or more substrates includes mixing an etchant solution within a bath and allowing the etchant solution to reach a quiescent state. After the etchant solution has reached the quiescent state, the method includes loading the one or more substrates into the bath. The one or more substrates includes a plurality of openings having the material layer disposed on an inside surface of the plurality of openings. The method also includes allowing the one or more substrates to remain in the bath for a predetermined time period, such that a thickness of the material layer is reduced by the etchant solution.

Abstract: A ski mat is provided in the present application, comprising a baseplate used for paving a ski field and a plurality of supports mounted on the baseplate to support skiing tools, wherein a mounting base capable of mounting the supports on the baseplate is provided on bottoms of the supports, and a plurality of connectors are provided on a bottom of the mounting base; a plurality of mounting holes capable of clamping the connectors are provided on the baseplate at positions corresponding to the connectors; and, the connectors is clamped into the mounting holes so that the supports are mounted on the baseplate. By clamping the connectors arranged on the supports to the baseplate, it is firmer and difficult to result in a separation of the baseplate and the supports, thus it is safer. The present application also provides a spliced baseplate used for the ski mat.

Abstract: A ski mat is provided in the present application, comprising a baseplate used for paving a ski field and a plurality of supports mounted on the baseplate to support skiing tools, wherein a mounting base capable of mounting the supports on the baseplate is provided on bottoms of the supports, and a plurality of connectors are provided on a bottom of the mounting base; a plurality of mounting holes capable of clamping the connectors are provided on the baseplate at positions corresponding to the connectors; and, the connectors is clamped into the mounting holes so that the supports are mounted on the baseplate. By clamping the connectors arranged on the supports to the baseplate, it is firmer and difficult to result in a separation of the baseplate and the supports, thus it is safer. The present application also provides a spliced baseplate used for the ski mat.