Patents by Inventor Yoon Hee Heo

Yoon Hee Heo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100201925
    Abstract: Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.
    Type: Application
    Filed: September 26, 2008
    Publication date: August 12, 2010
    Applicant: LG CHEM LTD.
    Inventors: Han Soo Kim, Sung Hyun Kim, Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Min Young Lim, Geun Young Cha, Yoon Hee Heo, Ji Heum Yoo, Sun Hwa Kim
  • Publication number: 20100196824
    Abstract: An alkali-soluble resin is provided. The alkali-soluble resin is prepared using a polyfunctional thiol compound as a chain transfer agent. The alkali-soluble resin has a lower viscosity than a resin having the same molecular weight. Further provided is a negative-type photosensitive resin composition comprising the alkali-soluble resin as a binder resin. The use of the alkali-soluble resin lowers the overall viscosity of the photosensitive resin composition to effectively reduce the height of a stepped portion of a photoresist pattern using a small amount of the photosensitive resin composition.
    Type: Application
    Filed: October 6, 2008
    Publication date: August 5, 2010
    Applicant: LG CHEM, LTD.
    Inventors: Han Soo Kim, Sung Hyun Kim, Kwang Han Park, Min Young Lim, Yoon Hee Heo, Ji Heum Yoo, Sun Hwa Kim
  • Publication number: 20100168266
    Abstract: Provided are a photosensitive resin and a photosensitive resin composition comprising the photosensitive resin. The photosensitive resin has the structure of Formula 1, which is described in the specification. The photosensitive resin and the photosensitive resin composition have good sensitivity, improved resistance to heat and chemicals, and excellent storage stability. Further provided are a method for preparing the photosensitive resin and a cured product of the photosensitive resin composition.
    Type: Application
    Filed: August 20, 2008
    Publication date: July 1, 2010
    Applicant: LG CHEM, LTD.
    Inventors: Min Young Lim, Sung Hyung Kim, Han Soo Kim, Yoon Hee Heo, Dae Hyun Kim, Ji Heum Yoo, Sun Hwa Kim
  • Publication number: 20100104981
    Abstract: A colored dispersion according to the present invention comprises a resin including monomers of Formulas 1 to 4, as a binder resin. Accordingly, a photoresist composition for a black matrix of a high light shielding property, which has the dispersion stability of the colored dispersion according to the present invention, could be provided, and a black matrix of high sensibility having an uniform process characteristic while maintaining a high light-shielding property could be produced.
    Type: Application
    Filed: November 10, 2008
    Publication date: April 29, 2010
    Inventors: Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Geun Young Cha, Min Young Lim, Sung Hyun Kim, Han soo Kim, Yoon Hee Heo, Ji Heum Yoo
  • Publication number: 20100085518
    Abstract: The present invention relates to a photosensitive resin composition for a black matrix, a black matrix produced by the composition and a liquid crystal display including the black matrix. The resin composition for a black matrix comprising a fluorene-based resin polymer as a resin binder has high sensitivity and optical density, and excellent development adherence.
    Type: Application
    Filed: February 21, 2008
    Publication date: April 8, 2010
    Inventors: Kyung-Soo Choi, Yoon-Hee Heo, Dong-Chang Choi, Ho-Chan Ji, Geun-Young Cha, Dae-Hyun Kim
  • Publication number: 20100081089
    Abstract: The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.
    Type: Application
    Filed: April 11, 2008
    Publication date: April 1, 2010
    Inventors: Han-Soo Kim, Min-Young Lim, Yoon-Hee Heo, Ji-Heum Yoo, Sung-Hyun Kim, Kwang-Han Park
  • Publication number: 20100051883
    Abstract: The present invention relates to a composition for preparing a curable resin, comprising a) a compound represented by Formula 1; b) glycidyl (meth)acrylate; c) acid monoanhydride; and d) a solvent, a curable resin manufactured by the composition, and an ink composition comprising the same. The curable resin has a low viscosity and excellent flow properties, and the ink composition is excellent in terms of storage stability, heat resistance and chemical resistance.
    Type: Application
    Filed: April 11, 2008
    Publication date: March 4, 2010
    Applicant: LG CHEM LTD
    Inventors: Min-Young Lim, Jae-Joon Kim, Mi-Ae Kim, Dae-Hyun Kim, Han-Soo Kim, Yoon-Hee Heo, Ji-Heum Yoo, Sung-Hyun Kim
  • Publication number: 20100029892
    Abstract: The present invention relates to a fluorene-based resin polymer having a repeating unit of Formula 1 and a method for preparing the same. The fluorene-based resin polymer has a high molecular weight and low acid value, and has an excellent developing property, adhesive property, and stability.
    Type: Application
    Filed: January 21, 2008
    Publication date: February 4, 2010
    Inventors: Yoon-Hee Heo, Kyung-Soo Choi, Han-Soo Kim, Min-Young Lim, Ji-Heum Yoo